Polishing estimation/evaluation device, overpolishing condition calculation device, and computer-readable non-transitory medium thereof
A polishing estimation/evaluation device includes a dividing unit, an overpolished area extracting unit, and a dummy modifying unit. The dividing unit divides a layout of an integrated circuit into a plurality of partial areas. The overpolished area extracting unit refers to an overpolishing condition indicating whether overpolishing occurs in a vicinity of a partial area based on a wiring density in the partial area and a wiring density in surrounding areas of the partial area, and extracts a partial area where the overpolishing occurs from the plurality of partial areas obtained by the division by the dividing unit. The dummy modifying unit modifies dummy wiring in the partial area where the overpolishing occurs extracted by the overpolished area extracting unit and/or dummy wiring in surrounding areas of the partial area to reduce the number of partial areas where the overpolishing occurs.
1. A polishing estimation/evaluation device comprising:
a dividing unit that divides a layout of an integrated circuit, which is to be produced through a deposition process and a polishing process, into a plurality of partial areas;
an overpolished area extracting unit that refers to an overpolishing condition indicating whether or not overpolishing occurs in a vicinity of a partial area based on a wiring density in the partial area and a wiring density in surrounding areas of the partial area, and extracts a partial area where the overpolishing occurs from the plurality of partial areas obtained by division by the dividing unit; and
a dummy modifying unit that modifies dummy wiring in the partial area where the overpolishing occurs extracted by the overpolished area extracting unit and/or dummy wiring in surrounding areas of the partial area to reduce the number of partial areas where the overpolishing occurs, wherein
in the overpolishing condition, an average value of wiring densities of partial areas present within a predetermined distance from the partial area is used as the wiring density in the surrounding areas, wherein
the predetermined distance is determined depending on a position on a test pattern on which the overpolishing occurs, so as to define the surrounding areas of the partial area.
2. The polishing estimation/evaluation device according to claim 1 , wherein
the overpolishing condition is a combination of conditions including any of the wiring density in the partial area, the wiring density in the surrounding areas of the partial area, a lowest value of the wiring density in the surrounding areas, and a difference between the wiring density in the partial area and the wiring density in the surrounding areas.
3. The polishing estimation/evaluation device according to claim 1 , wherein
after the dummy modifying unit modifies the dummy wiring in the partial area where the overpolishing occurs, the overpolished area extracting unit extracts again a partial area where the overpolishing occurs, and
the dummy modifying unit modifies dummy wiring in the partial area where the overpolishing occurs and then modifies dummy wiring in surrounding partial areas of the partial area extracted by the overpolished area extracting unit.
4. A polishing estimation/evaluation device comprising:
a processor configured to execute a procedure, the procedure comprising:
dividing a layout of an integrated circuit, which is to be produced through a deposition process and a polishing process, into a plurality of partial areas;
referring to an overpolishing condition indicating whether or not overpolishing occurs in a vicinity of a partial area based on a wiring density in the partial area and a wiring density in surrounding areas of the partial area, and extracts a partial area where the overpolishing occurs from the plurality of partial areas obtained by the dividing; and
modifying dummy wiring in the partial area where the overpolishing occurs and/or dummy wiring in surrounding areas of the partial area to reduce the number of partial areas where the overpolishing occurs, wherein
in the overpolishing condition, an average value of wiring densities of partial areas present within a predetermined distance from the partial area is used as the wiring density in the surrounding areas, wherein
the predetermined distance is determined depending on a position on a test pattern on which the overpolishing occurs, so as to define the surrounding areas of the partial area.
5. A computer-readable, non-transitory medium stored therein a polishing estimation/evaluation program, the program causing a computer to execute a procedure, the procedure comprising:
dividing a layout of an integrated circuit, which is to be produced through a deposition process and a polishing process, into a plurality of partial areas;
referring to an overpolishing condition indicating whether or not overpolishing occurs in a vicinity of a partial area based on a wiring density in the partial area and a wiring density in surrounding areas of the partial area, and extracts a partial area where the overpolishing occurs from the plurality of partial areas obtained by the dividing; and
modifying dummy wiring in the partial area where the overpolishing occurs and/or dummy wiring in surrounding areas of the partial area to reduce the number of partial areas where the overpolishing occurs, wherein
in the overpolishing condition, an average value of wiring densities of partial areas present within a predetermined distance from the partial area is used as the wiring density in the surrounding areas, wherein
the predetermined distance is determined depending on a position on a test pattern on which the overpolishing occurs, so as to define the surrounding areas of the partial area.