IP Library › Granted Patent US 8,506,722
Granted Patent B2
US 8,506,722 · App. 13/265,148 · Granted Aug 13, 2013

Method for cleaning filtering membrane

Inventor: Kwang-Jin Lee (Yongin-si, KR)
Assignee: Kolon Industries Inc.
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Quick Facts
Patent No.
US 8,506,722
App. No.
13/265,148
Granted
Aug 13, 2013
Kind
B2
Abstract

A method for cleaning a filtering membrane, contaminated by contaminants including inorganic and organic materials during a fluid-filtering process, is disclosed, the method comprises cleaning the filtering membrane by using a first cleaning solution of pH 6˜9 so as to remove the organic material from the filtering membrane; and cleaning the filtering membrane by using a second acid cleaning solution so as to remove the inorganic material from the filtering membrane, wherein the cleaning method of the present invention uses the first cleaning solution having pH 6˜9 instead of a strong-alkaline cleaning solution so as to prevent the filtering membrane from being damaged, and also uses the cleaning solution maintained at a relatively low temperature instead of hot water so as to improve economical efficiency by reduction of energy consumption.

Claims (17)

1. A method for cleaning a filtering membrane, the filtering membrane being contaminated with inorganic and organic materials during a fluid-filtering process, the method comprising:

cleaning the filtering membrane with a first cleaning solution of pH 6˜9 so as to remove the organic material from the filtering membrane;

cleaning the filtering membrane with a second cleaning solution which is acidic so as to remove the inorganic material from the filtering membrane; and

spraying air to the filtering membrane,

wherein spraying the air to the filtering membrane is carried out simultaneously with at least one of the cleaning the filtering membrane with the first cleaning solution and cleaning the filtering membrane with the second cleaning solution, and

wherein the method further comprises heating the air before the air is sprayed to the filtering membrane.

2. The method according to claim 1 , wherein the second cleaning solution includes HCl, NHO 3 , H 2 SO 4 , or citric acid.

3. The method according to claim 1 , wherein the second cleaning solution has 0.5˜2% by weight of an acid concentration.

4. The method according to claim 1 , wherein the cleaning the filtering membrane with the second cleaning solution is carried out for 3˜9 hours.

5. The method according to claim 1 , wherein the first cleaning solution includes a neutral cleaning agent.

6. The method according to claim 1 , wherein the first cleaning solution includes a neutral cleaning agent with chlorine constituents.

7. The method according to claim 1 , wherein cleaning the filtering membrane with the first cleaning solution is carried at 15˜40° C. for 3˜9 hours.

8. The method according to claim 1 , wherein cleaning the filtering membrane with the first cleaning solution is carried out before cleaning the filtering membrane with the second cleaning solution.

9. The method according to claim 1 , wherein the filtering membrane is a hollow fiber membrane.

10. The method according to claim 1 , wherein the filtering membrane is formed of polyvinylidene fluoride (PVDF).

11. The method according to claim 5 , wherein the neutral cleaning agent is a silicon-based cleaning agent, vegetable-based cleaning agent, or two-phase cleaning agent.

12. The method according to claim 5 , wherein the neutral cleaning agent has a concentration of 0.1˜0.7% by weight.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 30, 2021
From: KOLON INDUSTRIES, INC.
To: HIFIL TECH INC.
Reel/Frame 056109/0090 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 12, 2011
From: LEE, KWANG-JIN
To: KOLON INDUSTRIES INC.
Reel/Frame 027369/0764 →
Priority Claims (1)
KR 10-2009-0034198 · Apr 20, 2009 · national
Continuity (1)
Related Publication 20120090641A1 · Apr 19, 2012