Substrate structure including functional region and method for transferring functional region
According to a method for transferring a functional region, at least part of functional regions on separation layers arranged on a first substrate is transferred onto a second substrate, the separation layers being capable of being brought into a separable state by treatment. In a first bonding step, the first substrate is bonded to the second substrate with a dry film resist arranged between the second substrate and the at least part of the functional regions above the first substrate. In an exposure step, at least part of the dry film resist is exposed. In a patterning step, the exposed dry film resist is patterned.
1. A method for transferring at least part of a functional region arranged on a separation layer on a first substrate onto a second substrate, the separation layer being capable of being brought into a separable state by treatment, the method comprising:
a forming step of forming a dry film resist on the at least part of the functional region;
an exposure step of exposing at least part of the dry film resist so as to form an underexposed portion in a surface layer due to an exposure of the surface layer to an oxygen atmosphere;
a first bonding step of bonding the first substrate to the second substrate such that the surface layer of the dry film resist contacts the second substrate and a developing step of developing the exposed dry film resist by feeding a first developing solution through separation grooves formed through the second substrate, wherein the underexposed portion is sufficiently resistant to the first developing solution.
2. The method according to claim 1 , further comprising:
a first separation step of separating the first substrate from the second substrate at the separation layer by feeding a second developing solution through the separation grooves;
after the first separation step, a second bonding step of bonding a transfer region of a third substrate to at least part of the functional region that has been transferred to the second substrate; and
a second separation step of separating the second substrate from the third substrate at a predetermined portion of the dry film resist by irradiating the predetermined portion of the dry film resist with light having a predetermined wavelength from the second substrate side.
3. The method according to claim 1 , wherein the second substrate is formed of substrate segments, in the first bonding step, the plural substrate segments are arranged on the dry film resist or the resist so as to be separated from each other.
4. The method according to claim 1 , wherein the functional region is previously patterned to the forming step.