IP Library Granted Patent US 8,552,416
Granted Patent B2
US 8,552,416 · App. 13/115,537 · Granted Oct 8, 2013

Quantum dot light emitting diode device and display device therewith

Inventors: Young-Mi Kim (Seoul, KR); Ho-Cheol Kang (Gyeonggi-do, KR); Ho-Jin Kim (Gyeonggi-do, KR); Chang-Hee Lee (Seoul, KR); Kook-Heon Char (Seoul, KR); Seong-Hoon Lee (Seoul, KR); Jeong-Hun Kwak (Seoul, KR); Wan-Ki Bae (Seoul, KR); Dong-Gu Lee (Gyeongsangnam-do, KR); Jae-Hoon Lim (Seoul, KR)
Assignees: LG Display Co., Ltd.; SNU R&DB Foundation
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Quick Facts
Patent No.
US 8,552,416
App. No.
13/115,537
Granted
Oct 8, 2013
Kind
B2
Abstract

The present invention relates to a quantum dot light emitting diode device in which a hole transportation layer is formed after forming a quantum dot light emitting layer by a solution process by applying an inverted type quantum dot light emitting diode device for making free selection of a hole transportation layer material that enables easy injection of a hole to the quantum dot light emitting layer; and display device and method therewith.

Claims (47)

1. A quantum dot light emitting diode device comprising:

a cathode formed on a substrate, wherein the cathode is connected to a thin film transistor on the substrate;

an electron transport layer on the cathode, wherein the electron transport layer has a cross linkable structure;

a quantum dot light emitting layer formed on the electron transport layer, wherein the quantum dot light emitting layer is formed by a solution process;

a hole transport layer on the quantum dot light emitting layer; and

an anode formed on the hole transport layer.

2. The device as claimed in claim 1 , wherein the quantum dot light emitting layer includes a 2 group-6 group pair or 3 group-5 group pair nano-semiconductor compound.

3. The device as claimed in claim 2 , wherein the nano-semiconductor compound is any one selected from CdSe, CdS, CdTe, ZnSe, ZnTe, ZnS, HgTe, InAs, InP, and GaAs.

4. The device as claimed in claim 2 , wherein the electron transport layer further comprises any one selected from ZnO, TiO 2 , WO 3 , and SnO 2 .

5. The device as claimed in claim 2 , wherein the electron transport layer further comprises TPBI or TAZ.

6. The device as claimed in claim 1 , wherein the hole transport layer is formed of any one selected from CBP, α-NPD, TCTA and DNTPD.

7. The device as claimed in claim 1 , wherein the hole transport layer is formed of NiO, or MoO 3 .

8. A display device comprising:

a transparent cathode formed on a substrate;

an electron transport layer on the transparent cathode, wherein the electron transport layer has a cross linkable structure;

a quantum dot light emitting layer formed on the electron transport layer to include quantum dots, wherein the quantum dot light emitting layer is formed by a solution process;

a hole transport layer on the quantum dot light emitting layer;

an anode formed on the hole transport layer; and

a thin film transistor connected to the cathode.

9. A display device comprising:

a cathode formed on a substrate;

an electron transport layer on the cathode, wherein the electron transport layer has a cross linkable structure;

a quantum dot light emitting layer formed on the electron transport layer to include quantum dots, wherein the quantum dot light emitting layer is formed by a solution process;

a hole transport layer on the quantum dot light emitting layer;

a transparent anode formed on the hole transport layer; and

a thin film transistor connected to the cathode.

10. A display device comprising:

a cathode formed on a first substrate;

an electron transport layer on the cathode, wherein the electron transport layer has a cross linkable structure;

a quantum dot light emitting layer formed on the electron transport layer to include quantum dots, wherein the quantum dot light emitting layer is formed by a solution process;

a hole transport layer on the quantum dot light emitting layer;

a transparent anode formed on the hole transport layer;

a thin film transistor formed on the first substrate connected to the cathode; and

a second substrate opposite to the first substrate, the second substrate having a color filter layer.

11. A method for fabricating a quantum dot light emitting diode device comprising the steps of:

forming a cathode on a substrate, wherein the cathode is connected to a thin film transistor on the substrate;

forming an electron transport layer on the cathode, wherein the electron transport layer has a cross linkable structure;

forming a quantum dot light emitting layer on the electron transport layer by a solution process;

forming a hole transport layer on the quantum dot light emitting layer; and

forming an anode on the hole transport layer.

12. A method for fabricating a display device comprising the steps of:

forming a thin film transistor on a substrate;

forming a cathode on the substrate, connected to the thin film transistor;

forming an electron transport layer on the cathode, wherein the electron transport layer has a cross linkable structure;

forming a quantum dot light emitting layer filled with a plurality of quantum dots on the electron transport layer by a solution process;

forming a hole transport layer on the quantum dot light emitting layer; and

forming an anode on the hole transport layer.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 1, 2011
From: KIM, YOUNG-MI; KANG, HO-CHEOL; KIM, HO-JIN; LEE, CHANG-HEE; CHAR, KOOK-HEON; LEE, SEONG-HOON; KWAK, JEONG-HUN; BAE, WAN-KI; LEE, DONG-GU; LIM, JAE-HOON
To: LG DISPLAY CO., LTD.; SNU R&DB FOUNDATION
Reel/Frame 026680/0091 →
Priority Claims (1)
KR 10-2010-0048569 · May 25, 2010 · national
Continuity (1)
Related Publication 20110291071A1 · Dec 1, 2011