IP Library Granted Patent US 8,628,686
Granted Patent B2
US 8,628,686 · App. 13/036,410 · Granted Jan 14, 2014

Process for production of fluorescent substance

Inventors: Naotoshi Matsuda (Chigasaki, JP); Yumi Fukuda (Tokyo, JP); Masahiro Kato (Kanagawa-Ken, JP)
Assignee: Kabushiki Kaisha Toshiba
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Quick Facts
Patent No.
US 8,628,686
App. No.
13/036,410
Granted
Jan 14, 2014
Kind
B2
Abstract

The embodiment provides a process for production of an oxynitride fluorescent substance. In the process, a compound represented by the formula: (Sr,Eu) 2 Si 5 N 8 , silicon nitride and aluminum nitride are mixed and then fired in a nitrogen atmosphere under high pressure.

Claims (4)

1. A process for production of an oxynitride fluorescent substance, comprising a step in which a mixture containing first-phase crystals having the same crystal structure as Sr 2 Al 2 Si 10 O 4 N 14 and second-phase crystals having the same crystal structure as Sr 2 Al 3 Si 7 ON 13 is fired in a nitrogen atmosphere under high pressure.

2. The process according to claim 1 , wherein the firing temperature is 1700° C. or more.

3. The process according to claim 1 , comprising pre-firing components of the mixture in an atmosphere containing hydrogen and nitrogen before firing.

4. The process according to claim 3 , wherein the pre-firing temperature is in the range of 1400 to 1650° C.

Assignments (2)
NUNC PRO TUNC ASSIGNMENT Recorded Feb 19, 2026
From: KABUSHIKI KAISHA TOSHIBA
To: NITERRA MATERIALS CO., LTD.
Reel/Frame 073843/0532 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 3, 2011
From: MATSUDA, NAOTOSHI; FUKUDA, YUMI; KATO, MASAHIRO
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 026218/0762 →
Priority Claims (2)
JP 2010-193789 · Aug 31, 2010 · national
JP 2011-21727 · Feb 3, 2011 · national
Continuity (1)
Related Publication 20120049115A1 · Mar 1, 2012