Apparatus for processing substrate and method of maintaining the apparatus
Provided is an apparatus for processing a substrate. The apparatus includes a chamber, a process unit, and an exhaust member. The chamber has an inner space. The process unit is disposed at the inner space of the chamber and is movable outward from the chamber through a side of the chamber. The process unit includes an exhaust line. The exhaust member is disposed at the chamber. The exhaust member is connected to the exhaust line, and the exhaust member includes a movable exhaust port configured to be moved according to a movement of the process unit.
1. An apparatus for processing a substrate, comprising:
a chamber comprising an inner space;
a process vessel disposed at the inner space of the chamber and movable outward from the chamber through a side of the chamber, the process vessel comprising an exhaust line; and
an exhaust member disposed at the chamber,
wherein the exhaust member comprises a movable exhaust port that is connected to the exhaust line,
wherein a joint point between the movable exhaust port and the exhaust line moves according to a movement of the process vessel, and
wherein the exhaust member and the exhaust line are continuously connected to each other when the process vessel is taken out from the chamber and during maintenance work of the apparatus.
2. The apparatus of claim 1 , wherein the exhaust member further comprises an exhaust duct comprising a slit-shaped opening, and the movable exhaust port is movable along the slit-shaped opening.
3. The apparatus of claim 2 , wherein the exhaust member further comprises a sealing belt configured to move together with the movable exhaust port and seal the slit-shaped opening.
4. The apparatus of claim 3 , wherein the exhaust member further comprises guide rollers configured to guide a movement of the sealing belt along the slit-shaped opening.
5. The apparatus of claim 2 , wherein the exhaust duct is disposed at a side of the chamber, and a length direction of the exhaust duct is parallel with a moving direction of the process vessel.
6. The apparatus of claim 1 ,
wherein the process vessel further comprises a substrate supporting member comprising a spin head configured to receive a substrate thereon, and
wherein the process vessel surrounds the spin head to collect a process fluid floating from the substrate.
7. The apparatus of claim 1 , wherein the chamber further comprises:
a guide rail disposed along a moving direction of the process vessel; and
a movable base configured to move along the guide rail,
wherein the process vessel is disposed at the movable base.
8. The apparatus of claim 1 , wherein the chamber further comprises:
a first side comprising a substrate port;
a second side opposite to the first side; and
third and fourth sides connecting the first and second sides,
wherein the second side is configured to be opened by moving a door to provide an opening for moving the process vessel outward through the opening.
9. The apparatus of claim 1 , wherein the exhaust member continuously creates the exhaust pressure to the inside of the process vessel when the process vessel is taken out from the chamber and during maintenance work of the apparatus.