IP Library Granted Patent US 8,637,416
Granted Patent B2
US 8,637,416 · App. 12/966,023 · Granted Jan 28, 2014

Method for manufacturing zeolite membrane, and zeolite membrane

Inventors: Shuji Himeno (Nagaoka, JP); Teruaki Takeuchi (Nagaoka, JP); Shuichi Yoshida (Nagoya, JP); Kiyoshi Araki (Nagoya, JP); Toshihiro Tomita (Nagoya, JP)
Assignees: NGK Insulators, Ltd.; Nagaoka University of Technology
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 8,637,416
App. No.
12/966,023
Granted
Jan 28, 2014
Kind
B2
Abstract

There is provided a zeolite membrane which is thinner than a conventional membrane and which has improved permeability and a method for manufacturing the zeolite membrane. The method includes a surface layer forming step for forming a surface layer by attaching a low polar polymer on a first surface of a porous substrate to cover the surface, a filling step for filling a masking polymer into pores in the porous substrate from a surface different from the first surface of the porous substrate up to the surface layer by impregnating the porous substrate with the masking polymer and solidifying the masking polymer, and a surface layer removing step for removing the surface layer. After the surface layer removing step, a zeolite membrane is formed on the first surface of the porous substrate.

Claims (22)

1. A method for manufacturing a zeolite membrane comprising:

a surface layer forming step for forming a surface layer by attaching a low polar polymer having a solubility parameter (SP value) of 8.0 (cal/cm 3 ) 1/2 or less to a first surface of a porous substrate to cover the surface,

a filling step for filling a high polar polymer having low compatibility with the low polar polymer and a SP value of above 8.0 (cal/cm 3 ) 1/2 as a masking polymer into pores in the porous substrate from a surface different from the first surface of the porous substrate up to the surface layer by impregnating the porous substrate with the high polar polymer and solidifying the high polar polymer,

a surface layer removing step for removing the surface layer,

a seed crystal attaching step for attaching a seed crystal functioning as a seed for forming a zeolite membrane on the first surface of the porous substrate where the surface layer has been removed,

a membrane forming step for forming a dense zeolite membrane containing a structure directing agent on the first surface of the porous substrate by growing the seed crystal, and

a removing step for removing the structure directing agent from the dense zeolite membrane and removing the masking polymer from the porous substrate.

2. The method for manufacturing a zeolite membrane according to claim 1 , wherein the surface layer has a thickness of 1 to 2 μm with a part thereof being formed in the porous substrate and the rest being formed on the first surface of the porous substrate.

3. The method for manufacturing a zeolite membrane according to claim 1 , wherein the low polar polymer is at least one kind selected from the group consisting of paraffin wax, polyisobutylene, polyethylene, and polypropylene.

4. The method for manufacturing a zeolite membrane according to claim 2 , wherein the low polar polymer is at least one kind selected from the group consisting of paraffin wax, polyisobutylene, polyethylene, and polypropylene.

5. The method for manufacturing a zeolite membrane according to claim 1 , wherein the masking polymer has a melting point higher than zeolite membrane forming temperature in the membrane forming step.

6. The method for manufacturing a zeolite membrane according to claim 2 , wherein the masking polymer has a melting point higher than zeolite membrane forming temperature in the membrane forming step.

7. The method for manufacturing a zeolite membrane according to claim 3 , wherein the masking polymer has a melting point higher than zeolite membrane forming temperature in the membrane forming step.

8. The method for manufacturing a zeolite membrane according to claim 4 , wherein the masking polymer has a melting point higher than zeolite membrane forming temperature in the membrane forming step.

9. The method for manufacturing a zeolite membrane according to claim 1 , wherein the seed crystal attaching step employs a dipping method where the porous substrate is immersed in a sol for seeding.

10. The method for manufacturing a zeolite membrane according to claim 2 , wherein the seed crystal attaching step employs a dipping method where the porous substrate is immersed in a sol for seeding.

11. The method for manufacturing a zeolite membrane according to claim 3 , wherein the seed crystal attaching step employs a dipping method where the porous substrate is immersed in a sol for seeding.

12. The method for manufacturing a zeolite membrane according to claim 4 , wherein the seed crystal attaching step employs a dipping method where the porous substrate is immersed in a sol for seeding.

13. The method for manufacturing a zeolite membrane according to claim 5 , wherein the seed crystal attaching step employs a dipping method where the porous substrate is immersed in a sol for seeding.

14. The method for manufacturing a zeolite membrane according to claim 6 , wherein the seed crystal attaching step employs a dipping method where the porous substrate is immersed in a sol for seeding.

15. The method for manufacturing a zeolite membrane according to claim 7 , wherein the seed crystal attaching step employs a dipping method where the porous substrate is immersed in a sol for seeding.

16. The method for manufacturing a zeolite membrane according to claim 8 , wherein the seed crystal attaching step employs a dipping method where the porous substrate is immersed in a sol for seeding.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 13, 2010
From: HIMENO, SHUJI; TAKEUCHI, TERUAKI; YOSHIDA, SHUICHI; ARAKI, KIYOSHI; TOMITA, TOSHIHIRO
To: NGK INSULATORS, LTD.; NAGAOKA UNIVERSITY OF TECHNOLOGY
Reel/Frame 025474/0404 →
Priority Claims (1)
JP 2009-293738 · Dec 25, 2009 · national
Continuity (1)
Related Publication 20110160039A1 · Jun 30, 2011