IP Library Granted Patent US 8,686,376
Granted Patent B2
US 8,686,376 · App. 12/999,639 · Granted Apr 1, 2014

Microarray characterization system and method

Inventors: Reinhold Wimberger-Friedl (Eindhoven, NL); Peter Dirksen (Eindhoven, NL); Marius Iosif Boamfa (Eindhoven, NL); Erik Martinus Hubertus Petrus Van Dijk (Eindhoven, NL)
Assignee: Koninklijke Philips N.V.
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 8,686,376
App. No.
12/999,639
Granted
Apr 1, 2014
Kind
B2
Abstract

A system for detecting a plurality of analytes in a sample includes an aperture array and a lens array for generating and focusing a plurality of excitation sub-beams on different sub-regions of a substrate. These sub-regions can be provided with different binding sites for binding different analytes in the sample. By detecting the different luminescent responses in a detector, the presence or amount of different analytes can be determined simultaneously. Alternatively or in addition, collection of the luminescence radiation can be performed using the lens array for directly collecting the luminescence response and for guiding the collected luminescence response to corresponding apertures. The excitation sub-beams may be focused at the side of the substrate opposite of the lens array, and an immersion fluid is provided between the lens array and the substrate to increase the collection efficiency of the luminescence radiation.

Claims (27)

1. A system comprising a characterization system and a substrate for use with a detector for detecting a luminescence response from each of a plurality of sub-regions of the substrate and for characterizing a plurality of analytes in a sample contacted with the substrate, the characterization system comprising:

an aperture array comprising a plurality of apertures adapted for limiting at least one of a plurality of excitation radiation sub-beams and luminescence radiation sub-beams; and

a lens array comprising a plurality of lenses corresponding with the plurality of apertures, the lens array being at a first substrate surface and being adapted for focusing excitation radiation sub-beams on a second substrate surface at the opposite side of the first substrate surface, the second side of the substrate being adapted for being contacted with the sample, each lens of said lens array being configured to:

receive an excitation radiation sub-beam from a corresponding aperture of said aperture array and for directly focusing the excitation radiation sub-beam onto a sub-region of the substrate, and

directly collect a luminescence radiation sub-beam from a sub-region of the substrate and guiding the luminescence radiation sub-beam to a corresponding aperture of said aperture array,

wherein the characterization system further comprises:

a sample holder configured to provide the substrate in proximity of the lens array and an immersion fluid configured to guide the excitation sub-beams from the lenses in the lens array to said sub-regions of the substrate or to collect the luminescence radiation sub-beams from the sub-regions of the substrate to the lenses in the lens array, wherein the immersion fluid is confined to be in front of the lenses and in front of the first substrate surface so as not to interfere with the sample; and

wherein the characterization system furthermore comprises a scanner configured to provide a relative movement between the excitation radiation sub-beams and the substrate for providing a relative scanning movement of each diffraction limited spot within a corresponding sub-region on the substrate.

2. The system according to claim 1 , wherein the apertures of the aperture array are aligned with the lenses of the lens array.

3. The system according to claim 1 , wherein the characterization system is configured to both guide the excitation radiation sub-beams and collect the luminescence radiation sub-beams via said lens array and said aperture array.

4. The system according to claim 1 , wherein the detector is a multi pixel detector and the characterization system is configured to substantially separately to detect luminescence responses from different sub-regions on the substrate.

5. The system according to claim 1 , wherein the system further comprises a focusing device configured to tune a focus point of the lens array on the substrate.

6. The system according to claim 1 , wherein the system further comprising an aligner configured to align a sample cartridge comprising the substrate.

7. The system according to claim 1 , wherein the system further comprising a processor configured to analyze the detected luminescence responses from the different sub-regions on the substrate.

8. The system according to claim 7 , wherein the aperture array is configured to receive an excitation radiation beam and generate said excitation radiation sub-beams.

9. The system according to claim 1 wherein the focusing by each lens of said lens array is onto a diffraction limited spot.

10. A method for characterizing a sample contacted with a substrate, the method comprising the acts of:

limiting at least one of a plurality of excitation radiation sub-beams and luminescence radiation sub-beams simultaneously using an aperture array;

receiving excitation radiation sub-beams from a corresponding aperture of the aperture array in corresponding lenses of the lens array and directly focusing each of the plurality of excitation sub-beams on a sub-region of the substrate, the lens array being at a first substrate surface and focusing the excitation radiation sub-beams onto a spot on a second substrate surface at the opposite side of the first substrate surface, the second side of the substrate being contacted by the sample, and directly collecting luminescence radiation sub-beams from sub-regions of the substrate and guiding the luminescence radiation sub-beams to corresponding apertures of the aperture array;

guiding the excitation sub-beams through an immersion fluid from the lenses in the lens array to said sub-regions of the substrate, wherein the immersion fluid is confined to be in front of the lenses and in front of the first substrate surface so as not to interfere with the sample;

collecting the luminescence radiation sub-beams from the sub-regions of the substrate to the lenses in the lens array through the immersion fluid; and

using a scanner to provide a relative movement between the excitation radiation sub-beams and the substrate to provide a relative scanning movement of each spot within a corresponding sub-region on the substrate.

11. The method according to claim 10 , wherein the focusing by the lens array is onto a diffraction limited spot.

12. A controller for implementing a method for characterizing a sample contacted with a substrate, the method comprising the acts of:

limiting at least one of a plurality of excitation radiation sub-beams and luminescence radiation sub-beams simultaneously using an aperture array, and receiving excitation radiation sub-beams from a corresponding aperture of the aperture array in corresponding lenses of the lens array and directly focusing each of the plurality of excitation sub-beams on a sub-region of the substrate, the lens array being at a first substrate surface and focusing the excitation radiation sub-beams onto a spot on a second substrate surface at the opposite side of the first substrate surface, the second side of the substrate being contacted by the sample, and directly collecting luminescence radiation sub-beams from sub-regions of the substrate and guiding the luminescence radiation sub-beams to corresponding apertures of the aperture array,

wherein the excitation sub-beams are guided through an immersion fluid from the lenses in the lens array to said sub-regions of the substrate and the luminescence radiation sub-beams are collected from the sub-regions of the substrate to the lenses in the lens array through the immersion fluid, and wherein the immersion fluid is confined to be in front of the lenses and in front of the first substrate surface so as not to interfere with the sample,

wherein the method further comprises using a scanner to provide a relative movement between the excitation radiation sub-beams and the substrate to provide a relative scanning movement of each spot within a corresponding sub-region on the substrate.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 17, 2010
From: WIMBERGER-FRIEDL, REINHOLD; DIRKSEN, PETER; BOAMFA, MARIUS IOSIF; VAN DIJK, ERIK MARTINUS HUBERTUS PETRUS
To: KONINKLIJKE PHILIPS ELECTRONICS N V
Reel/Frame 025516/0305 →
Priority Claims (2)
EP 08158863 · Jun 24, 2008 · regional
EP 09159979 · May 12, 2009 · regional
Continuity (1)
Related Publication 20110101243A1 · May 5, 2011