RF-driven ion source with a back-streaming electron dump
View Patent ↗A novel ion source is described having an improved lifetime. The ion source, in one embodiment, is a proton source, including an external RF antenna mounted to an RF window. To prevent backstreaming electrons formed in the beam column from striking the RF window, a back streaming electron dump is provided, which in one embodiment is formed of a cylindrical tube, open at one end to the ion source chamber and capped at its other end by a metal plug. The plug, maintained at the same electrical potential as the source, captures these backstreaming electrons, and thus prevents localized heating of the window, which due to said heating, might otherwise cause window damage.
1. A Radio Frequency (RF) driven ion source including:
an ion source chamber defining a cavity, the ion source chamber including an RF window at a first end of the ion source chamber and an extraction plate at a second end of the ion source chamber, the extraction plate defining an extraction opening, and the RF window defining an open region;
an RF antenna disposed external to the cavity of the ion source chamber and proximate the RF window; and
an electron beam dump attached to the RF window proximate the open region in the RF window, the electron beam dump comprising a tube, a first end of the tube attached to the RF window, and a second end of the tube comprising a metal plug.
2. The RF driven ion source of claim 1 wherein the metal plug comprises copper, aluminum, stainless steel, or molybdenum.
3. The RF driven ion source of claim 1 wherein the electron beam dump is positioned opposite the extraction opening in the extraction plate.
4. The RF driven ion source of claim 1 wherein a surface area of the metal plug of the electron beam dump is at least as large as a footprint of a backstreaming electron beam generated when the RF driven ion source is in operation.
5. The RF driven source of claim 1 wherein the open region in the RF window is positioned at a center of the RF window.
6. The RF driven ion source of claim 1 wherein the electron beam dump is fused to the RF window.
7. The RF driven ion source of claim 1 wherein the ion source chamber further defines a gas feed configured to admit one or more gases to the cavity of the ion source chamber.
8. The RF driven ion source of claim 1 wherein the RF antenna is a flat coiled antenna.
9. The RF driven ion source of claim 8 wherein the flat coiled antenna is attached to the RF window with a thermally conductive epoxy.
10. The RF driven ion source of claim 1 wherein the RF window comprises a dielectric material.
11. The RF driven ion source of claim 10 wherein the dielectric material is selected from the group consisting of quartz, aluminum oxide, and aluminum nitride.
12. The RF driven ion source of claim 1 wherein the metal plug is maintained at a same electrical potential as the ion source chamber when the RF driven ion source is in operation.
13. The RF driven ion source of claim 1 further including:
magnets external to the cavity of the ion source chamber positioned to create a multicusp magnet configuration.
14. The RF driven ion source of claim 1 wherein the first end of the ion source chamber is opposite the second end of the ion source chamber.