Particle beam system

1. A particle beam system comprising:

a particle beam source configured to generate a particle beam;

a high voltage source; and

a beam blanker system comprising a pair of deflection plates and a control circuit;

wherein a beam path of the particle beam extends between a first deflection plate of the pair of deflection plates and a second deflection plate of the pair of deflection plates;

wherein the control circuit comprises a first switch, a second switch and a first node connected to an output terminal of the high voltage source;

wherein the control circuit provides a first current path between the first deflection plate and the second deflection plate;

wherein the first deflection plate, the first switch, the first node, the second switch and the second deflection plate are arranged in the first current path in this order;

wherein the control circuit further comprises a first switchable voltage source, a second switchable voltage source and a second node connected to the output terminal of the high voltage source;

wherein the control circuit further provides a second current path between the first deflection plate and the second deflection plate; and

wherein the first deflection plate, the first switchable voltage source, the second node, the second switchable voltage source and the second deflection plate are arranged in the second current path in this order.

2. The particle beam system according to claim 1 , wherein the first switchable voltage source comprises a second voltage source and a third switch connected in series, and wherein the second switchable voltage source comprises a third voltage source and a fourth switch connected in series.

3. The particle beam system according to claim 2 , wherein the first switchable voltage source further comprises a first resistor, wherein the second voltage source, the third switch and the first resistor are connected in series, wherein the second switchable voltage source further comprises a second resistor; and wherein the third voltage source, the fourth switch and the second resistor are connected in series.

4. The particle beam system according to claim 3 , wherein the first resistor and the second resistor have equal resistances.

5. The particle beam system according to claim 1 , wherein the first switchable voltage source and the second switchable voltage source each provide equal voltages in their switched on states.

6. The particle beam system according to claim 1 , wherein the control circuit further comprises a third resistor and a fourth resistor, wherein the third resistor is arranged in the first current path between the first deflection plate and the first node, and wherein the fourth resistor is arranged in the first current path between the first node and the second deflection plate.

7. The particle beam system according to claim 6 , wherein the third resistor and the fourth resistor have equal resistances.

8. The particle beam system according to claim 1 , further comprising an aperture plate arranged in the beam path of the particle beam downstream of the pair of deflection plates, and

wherein the aperture plate is configured and arranged to allow the particle beam to traverse the aperture plate in a first operating state of the particle beam system and to intercept the particle beam in a second operating state of the particle beam system.

9. The particle beam system according to claim 2 , wherein the control circuit provides a first operating mode in which the first switch and the second switch are each in a state that closes the first current path and in which the third switch and the fourth switch are each in a state that interrupts the second current path; and

wherein the control circuit provides a second operating mode in which the first switch and the second switch are each in a state that interrupts the first current path and in which the third switch and the fourth switch are each in a state that closes the second current path.

10. The particle beam system according to claim 9 , further comprising an aperture plate arranged in the beam path of the particle beam downstream of the pair of deflection plates,

wherein the particle beam system has a first operating state and a second operating state,

wherein the aperture plate is configured and arranged to allow the particle beam to traverse the aperture plate in the first operating state of the particle beam system and to intercept the particle beam in the second operating state of the particle beam system, and

wherein the particle beam system is configured to operate the control circuit in the first operating mode in the first operating state, and operate the control circuit in the second operating mode in the second operating state.

11. The particle beam system according to claim 1 , further comprising an objective lens configured to focus the particle beam in a sample plane, wherein the objective lens is arranged in the beam path of the particle beam downstream of the pair of deflection plates.

12. The particle beam system according to claim 1 , wherein the high voltage source is a high voltage source configured to supply a high voltage of more than 5 kV relative to ground potential.

13. The particle beam system according to claim 2 , further comprising a beam tube connected to the first voltage source, wherein the beam path of the particle beam traverses the beam tube.

14. The particle beam system according to claim 2 , wherein the particle beam source comprises a cathode and wherein a voltage difference between the cathode and the output terminal of the first voltage source is greater than 5 kV.

15. The particle beam system according to claim 2 , wherein the second voltage source and the third voltage source are configured to produce voltages of more than 10 V.

16. The particle beam system according to claim 2 , wherein the second voltage source and the third voltage source are configured to produce voltages of less than 4 kV.