Electromechanical transducer and method of producing the same
An electromechanical transducer includes a substrate, a first electrode disposed on the substrate, and a vibration film including a membrane disposed on the first electrode with a space therebetween and a second electrode disposed on the membrane so as to oppose the first electrode. The first electrode has a surface roughness value of 6 nm RMS or less.
1. An electromechanical transducer comprising:
a substrate;
a first electrode disposed on the substrate; and
a vibration film including a membrane disposed on the first electrode with a space therebetween and a second electrode disposed on the membrane so as to oppose the first electrode, wherein
the first electrode has a surface roughness value of 6 nm RMS (root-mean-square) or less.
2. The electromechanical transducer according to claim 1 , wherein the first electrode is disposed on the substrate with a first insulating film therebetween.
3. The electromechanical transducer according to claim 1 , further comprising:
a second insulating film on the first electrode, wherein
the space is formed between the second insulating film and the first membrane.
4. The electromechanical transducer according to claim 1 , wherein
the membrane is composed of a first membrane and a second membrane, wherein the first membrane is disposed on the second electrode on the space side, and the second membrane is disposed on the second electrode on the opposite side of the space; and
the vibration film is constituted of the first membrane, the second electrode, and the second membrane.
5. The electromechanical transducer according to claim 1 , wherein the first electrode comprises titanium or an alloy containing titanium.
6. The electromechanical transducer according to claim 1 , wherein the first electrode has a thickness of 10 nm or more and 100 nm or less.
7. The electromechanical transducer according to claim 1 , wherein the space is formed by etching a sacrificial layer formed on the first electrode, after formation of the membrane.
8. The electromechanical transducer according to claim 3 , wherein the space is formed by etching a sacrificial layer formed on the second insulating film, after formation of the membrane.
9. The electromechanical transducer according to claim 1 , wherein the first electrode comprises tungsten.
10. The electromechanical transducer according to claim 1 , wherein the substrate comprises a silicon substrate.
11. The electromechanical transducer according to claim 1 , wherein the first insulating film comprises silicon oxide.
12. The electromechanical transducer according to claim 1 , wherein the second insulating film comprises silicon oxide.
13. The electromechanical transducer according to claim 1 , further comprising a element including a plurality of cell structures, wherein each of the plurality of cell structures comprises the first electrode and the vibration film.
14. The electromechanical transducer according to claim 13 , further comprising a plurality of the elements, wherein an electrical signal from the first or second electrode is output separately for each of the elements.
15. An apparatus comprising the electromechanical transducer according to claim 1 and a voltage applying unit, wherein the voltage applying unit applies a voltage between the first and second electrodes so that the electromechanical transducer receives an ultrasonic wave and output a current.
16. An apparatus comprising the electromechanical transducer according to claim 1 and a voltage applying unit, wherein the voltage applying unit applies a DC voltage to the first electrode and applies an AC voltage to the second electrode so that the electromechanical transducer transmits an ultrasonic wave.
17. An apparatus comprising the electromechanical transducer according to claim 1 and a voltage applying unit, wherein the voltage applying unit applies a DC voltage to the second electrode and applies an AC voltage to the first electrode so that the electromechanical transducer transmits an ultrasonic wave.