IP Library Granted Patent US 8,831,179
Granted Patent B2
US 8,831,179 · App. 13/066,679 · Granted Sep 9, 2014

X-ray source with selective beam repositioning

Inventors: David L. Adler (San Jose, CA); Wenbing Yun (Walnut Creek, CA); Thomas Anthony Case (Walnut Creek, CA)
Assignee: Carl Zeiss X-Ray Microscopy, Inc.
H01J35/08H01J2235/087H01J35/14H01J2235/186
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Quick Facts
Patent No.
US 8,831,179
App. No.
13/066,679
Granted
Sep 9, 2014
Kind
B2
Abstract

During operation of an x-ray source, an electron source emits a beam of electrons. Moreover, a repositioning mechanism selectively repositions the beam of electrons on a surface of a target based on a feedback parameter, where a location of the beam of electrons on the surface of the target defines a spot size of x-rays output by the x-ray source. In response to receiving the beam of electrons, the target provides a transmission source of the x-rays. Furthermore, a beam-parameter detector provides the feedback parameter based on a physical characteristic associated with the beam of electrons and/or the x-rays output by the x-ray source. This physical characteristic may include: at least a portion of an optical spectrum emitted by the target, secondary electrons emitted by the target based on a cross-sectional shape of the beam of electrons; an intensity of the x-rays output by the target; and/or a current from the target.

Claims (18)

1. An x-ray source, comprising: an electron source configured to emit a beam of electrons; a target, and a repositioning mechanism configured to selectively reposition the beam of electrons on a surface of the target, the target configured to provide a transmission source of the x-rays in response to receiving the beam of electrons; wherein the target has holes in which at least some of the holes have different cross-sectional diameters, different thicknesses or both to facilitate different spot sizes and different intensities of the x-rays output by the x-ray source depending on the location of the beam of electrons on the surface of the target.

2. The x-ray source of claim 1 , further comprising a beam-parameter detector configured to provide a feedback parameter used by the repositioning mechanism during operation of the x-ray source, the feedback parameter being based on a physical characteristic associated with the beam of electrons, the x-rays output by the x-ray source or both, wherein the beam-parameter detector includes at least one of: an optical detector, a secondary electron detector, a backscatter electron detector, an x-ray detector, and a current detector; and wherein the physical characteristic includes at least one of: at least a portion of an infrared spectrum or a visible spectrum emitted by the target when it receives the beam of electrons; secondary electrons emitted by the target based on a cross-sectional shape of the beam of electrons; an intensity of the x-rays output by the target; and a current from the target.

3. The x-ray source of claim 1 , wherein the repositioning mechanism is configured to scan the beam of electrons over the target in response to feedback from an image sensor.

4. The x-ray source of claim 1 , wherein the holes in the target facilitate focusing the beam of electrons to the spot size.

5. The x-ray source of claim 4 , wherein the repositioning mechanism selectively repositions the beam of electrons towards one or more of the holes.

6. The x-ray source of claim 4 , wherein the holes are defined by associated edges, in the target.

7. The x-ray source of claim 6 , wherein the holes are, at least in part, filled with a refractory material that is other than a material of the target surrounding the holes.

8. The x-ray source of claim 1 , wherein a spot size of the x-rays is defined by the target independently of a cross-sectional shape of the beam of electrons received by the target.

9. The x-ray source of claim 1 , wherein the target includes multiple layers.

10. The x-ray source of claim 9 , wherein the multiple layers include a first layer having an atomic number less than a predefined value, a second layer, and a third layer having an atomic number greater than the predefined value.

11. The x-ray source of claim 1 , wherein the x-ray source passively defines a spot size of x-rays output by the x-ray source based on the location of the beam of electrons on the surface of the target.

12. The x-ray source of claim 1 , wherein the repositioning mechanism is configured to selectively vary a focus of the beam of electrons on the target.

13. The x-ray source of claim 1 , wherein the repositioning mechanism is configured to adjust a cross-sectional shape of the beam of electrons.

14. An x-ray comprising: an electron source configured to emit a beam of electrons; a target; and a repositioning mechanism configured to selectively reposition the beam of electrons on a surface of the target, which target is configured to provide a transmission source of the x-rays in response to receiving the beam of electrons and comprises protrusions fabricated in the surface of the target; wherein at least some of the protrusions have different cross-sectional diameters, different thicknesses or both, facilitating different spot sizes and different intensities of the x-rays output by the x-ray source depending on the location of the beam of electrons on the surface of the target.

15. The x-ray source of claim 14 , wherein the protrusions include a refractory material other than a material of the target surrounding the protrusions.

16. An x-ray source, comprising: an electron source configured to emit a beam of electrons; a target; a repositioning mechanism configured to selectively reposition the beam of electrons on a surface of the target based on a feedback parameter, wherein a location of the beam of electrons on the surface of the target defines a spot size of x-rays output by the x-ray source and the target is configured to provide a transmission source of the x-rays in response to receiving the beam of electrons; a beam-parameter detector configured to provide the feedback parameter during operation of the x-ray source based on a physical characteristic associated with the beam of electrons, the x-rays output by the x-ray source or both; and a magnetic focusing lens configured to focus the beam of electrons to a spot, having an initial spot size, on the target; and wherein the feedback parameter corresponds to a difference between a cross-sectional diameter corresponding to the initial spot size of the focused beam of electrons and the cross-sectional diameter of the features so that, when focused by the magnetic focusing lens, the cross-sectional diameter corresponding to the spot size of the x-rays approximately equals the cross-sectional diameter.

17. A system, comprising an x-ray source, wherein the x-ray source includes: an electron source configured to emit a beam of electrons; a target; and a repositioning mechanism configured to selectively reposition the beam of electrons on a surface of the target based on a feedback parameter, wherein a location of the beam of electrons on the surface of the target defines a spot size of x-rays output by the x-ray source; the target configured to provide a transmission source of the x-rays in response to receiving the beam of electrons; and a beam-parameter detector configured to provide the feedback parameter during operation of the x-ray source based on a physical characteristic associated with the beam of electrons, the x-rays output by the x-ray source or both, wherein the target comprises protrusions or holes that have different cross-sectional diameters, different thicknesses or both to facilitate different spot sizes and different intensities of the x-rays output by the x-ray source depending on the location of the beam of electrons on the surface of the target.

18. A method for providing a feedback parameter, the method comprising: emitting a beam of electrons from an electron source; selectively repositioning the beam of electrons to different protrusions or holes that have different cross-sectional diameters, different thicknesses or both to facilitate different spot sizes and different intensities of the x-rays output by the x-ray source depending on the location of the beam of electrons on the surface of the target, the target; in response to receiving the beam of electrons, providing the transmission source of x-rays.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 8, 2014
From: ADLER, DAVID L.; YUN, WENBING; CASE, THOMAS ANTHONY
To: CARL ZEISS X-RAY MICROSCOPY, INC.
Reel/Frame 033256/0943 →
Continuity (1)
Related Publication 20120269324A1 · Oct 25, 2012