Lithographic apparatus and device manufacturing method
Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.
1. A lithographic apparatus, comprising:
a substrate table configured to hold a substrate;
a projection system configured to project a patterned beam onto a target portion of the substrate;
a liquid supply system configured to at least partly.fill a space between the projection system and the substrate with a liquid;
a liquid confinement structure located above the substrate table and with respect to which the substrate table is movable, the liquid confinement structure configured to define, at least in part, the space between the projection system and the substrate; and
a cover separate from the liquid confinement structure, the cover configured to cover at least part of the projection system to prevent humid gas associated with the liquid in the space from entering the projection system or a remainder of the lithographic apparatus.
2. The apparatus according to claim 1 , further comprising an underpressure inlet configured to remove humid gas.
3. The apparatus according to claim 2 , wherein the underpressure inlet removes gas in contact with the liquid in a volume above the liquid.
4. The apparatus according to claim 2 , wherein the underpressure inlet has an annular shape, the projection system being arranged at the center of the annular shape.
5. The apparatus according to claim 2 , wherein the underpressure inlet is independent of the projection system and the liquid confinement structure.
6. The apparatus according to claim 1 , further comprising a gas flow port configured to supply gas toward or adjacent the liquid in the space.
7. The apparatus according to claim 6 , wherein the gas flow port is arranged so that the flow of gas is at least partly between the liquid confinement structure and the projection system.
8. The apparatus according to claim 6 , wherein the supplied gas is clean and dry gas.
9. The apparatus according to claim 1 , wherein the cover is sealed to the projection system by a seal.
10. The apparatus according to claim 9 , wherein the seal is flexible.
11. The apparatus according to claim 1 , wherein the liquid confinement structure further comprises an outlet, on a bottom surface of the liquid confinement structure, configured to remove liquid.
12. The apparatus according to claim 11 , wherein the liquid confinement structure is movable in Z, Rx and Ry directions.
13. The apparatus according to claim 1 , wherein the cover is located above the liquid confinement structure and extends laterally from a part of the projection system.
14. The apparatus according to claim 1 , further comprising a passage between the liquid confinement structure and the cover.
15. The apparatus according to claim 1 , further comprising a passage formed at least partly by, and between, the projection system and the liquid confinement structure, the passage fluidly connected to the space.
16. A device manufacturing method, comprising:
providing a liquid to a space between a projection system of a lithographic apparatus and .a substrate;
confining the liquid in the space at least in part by a liquid confinement structure of the lithographic apparatus located above the substrate and with respect to which the substrate is movable;
covering at least part of the projection system with a cover separate from the liquid confinement structure, the cover preventing humid gas associated with the liquid in the space from entering the projection system or a remainder of the lithographic apparatus; and
projecting a patterned beam of radiation using the projection system onto a target portion of the substrate through the liquid.
17. The method according to claim 16 , further comprising flowing a gas through a passage, the passage formed at least partly by the projection system and the liquid confinement structure.
18. A lithographic apparatus, comprising:
a substrate table configured to hold a substrate;
a projection system configured to project a patterned beam onto a target portion of the substrate;
a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid;
a liquid confinement structure located above the substrate table, the liquid confinement structure configured to define, at least in part, the space between the projection system and the substrate, and the liquid confinement structure comprising an outlet on a bottom surface of the liquid confinement structure, the outlet configured to remove liquid from the space;
a passage formed at least partly by, and between, the projection system and the liquid confinement structure, the passage fluidly connected to the space; and
a cover configured to cover at least part of the projection system, the cover located above the liquid confinement structure and extending laterally from a part of the projection system.
19. The apparatus according to claim 18 , further comprising a gas flow port configured to provide a gas flow in a volume around and in contact with the liquid.
20. The apparatus according to claim 19 , wherein the gas flow port is configured to supply gas to at least partly confine humid gas in the volume.
21. The apparatus according to claim 18 , further comprising a passage between the liquid confinement structure and the cover.
22. The apparatus according to claim 18 , wherein the cover is separate from the liquid confinement structure.