Cleaning methods for improved photovoltaic module efficiency

1. A method of processing a substrate having a transparent conductive oxide disposed thereon, comprising:

exposing the substrate to a first cleaning solution comprising hydrogen peroxide and ammonium citrate;

exposing the substrate to a second cleaning solution having a pH within a range from about 6 to about 7, the second cleaning solution different than the first cleaning solution;

agitating the second cleaning solution; and

depositing a silicon-containing film on the transparent conductive oxide.

2. The method of claim 1 , further comprising scribing the surface of the substrate with a laser prior to the exposing the substrate to a second cleaning solution.

3. The method of claim 2 , wherein the agitating the second cleaning solution comprises removing particles of transparent conductive oxide from a surface of the substrate.

4. The method of claim 3 , wherein the agitating the second cleaning solution utilizes an ultrasonic mixer.

5. The method of claim 4 , wherein the second cleaning solution contains one or more compounds selected from the group consisting of potassium hydroxide, ammonium hydroxide, and hydrochloric acid.

6. The method of claim 1 , further comprising exposing the substrate to a first rinse solution after the exposing the substrate to a first cleaning solution and before the exposing the substrate to a second cleaning solution.

7. The method of claim 6 , wherein the rinse solution is deionized water.

8. The method of claim 7 , further comprising exposing the substrate a second rinse solution after agitating the second cleaning solution.