Method for producing an ionized vapor deposition coating
A method of depositing a coating by vapor deposition. The method including ionizing a process gas, generating a metal vapor and creating a metal flow having a metal atom flow density in the range of 1E14 m −3 to 1E24 m −3 . The method also includes providing a thermionic emission from a thermionic ionizing grid including thermionic filaments, wherein said ionizing filament grid is at least partially located within said region having a metal atom flow density in the range of 1E14 m −3 to 1E24 m −3 , and coating a substrate with the metal vapor.
1. A method of depositing a coating by vapor deposition comprising:
providing a substrate on a worktable;
biasing said worktable;
ionizing a process gas, generating a metal vapour, and creating a metal flow;
providing a thermionic emission from a thermionic ionizing grid including thermionic filaments, wherein said thermionic ionizing grid is at least partially located within said metal flow in a region having a density in the range of 1E14 m −3 to 1E24 m −3 and said thermionic emission ionizes said metal flow; and
coating said substrate with said metal vapor.
2. The method of claim 1 , wherein said metal vapor is generated by a magnetron.
3. The method of claim 1 , further comprising providing a secondary emission from said thermionic ionizing grid due to bombardment of said thermionic filaments.
4. The method of claim 1 , providing a negative bias to said thermionic ionizing grid relative to an anode.
5. The method of claim 4 , wherein said anode is a process chamber.
6. The method of claim 4 , wherein said anode comprises a filament grid.
7. The method of claim 1 , wherein said substrate is pre-heated prior to coating.
8. The method of claim 1 , wherein said substrate is cleaned prior to coating.