Oxide semiconductor element and semiconductor device
View Patent ↗A semiconductor element having high mobility, which includes an oxide semiconductor layer having crystallinity, is provided. The oxide semiconductor layer includes a stacked-layer structure of a first oxide semiconductor film and a second oxide semiconductor film having a wider band gap than the first oxide semiconductor film, which is in contact with the first oxide semiconductor film. Thus, a channel region is formed in part of the first oxide semiconductor film (that is, in an oxide semiconductor film having a smaller band gap) which is in the vicinity of an interface with the second oxide semiconductor film. Further, dangling bonds in the first oxide semiconductor film and the second oxide semiconductor film are bonded to each other at the interface therebetween. Accordingly, a decrease in mobility resulting from an electron trap or the like due to dangling bonds can be reduced in the channel region.
1. A semiconductor device comprising:
an oxide semiconductor layer on an insulating surface;
a gate insulating layer over the oxide semiconductor layer; and
a gate electrode over the oxide semiconductor layer with the gate insulating layer provided therebetween,
wherein the oxide semiconductor layer has a stacked-layer structure comprising a first oxide semiconductor film including indium and zinc and a second oxide semiconductor film including indium and zinc,
wherein the second oxide semiconductor film is sandwiched between the gate insulating layer and the first oxide semiconductor film,
wherein a value of a band gap of the first oxide semiconductor film is smaller than a value of a band gap of the second oxide semiconductor film,
wherein the first oxide semiconductor film comprises a first non-single-crystal region,
wherein the second oxide semiconductor film comprises a second non-single-crystal region,
wherein the first non-single-crystal region and the second non-single-crystal region are in contact with each other, and
wherein a c-axis of the first non-single-crystal region is in the same direction as a c-axis of the second non-single-crystal region, in a vicinity of an interface between the first non-single-crystal region and the second non-single-crystal region.
2. The semiconductor device according to claim 1 , wherein the value of a band gap of the second oxide semiconductor film is larger by 0.2 eV or more than the value of a band gap of the first oxide semiconductor film.
3. The semiconductor device according to claim 1 ,
wherein the first oxide semiconductor film is crystallized in the thickness direction 3 nm or more from an interface between the first oxide semiconductor film and the second oxide semiconductor film, and
wherein the second oxide semiconductor film is crystallized in the thickness direction 3 nm or more from the interface.
4. The semiconductor device according to claim 1 , wherein the first oxide semiconductor film contains at least nitrogen or phosphorus.
5. The semiconductor device according to claim 1 , wherein the second oxide semiconductor film contains at least boron or aluminum.
6. The semiconductor device according to claim 1 , wherein a conduction band level of the first oxide semiconductor film is lower than a conduction band level of the second oxide semiconductor film.
7. The semiconductor device according to claim 1 , further comprising:
a source electrode layer and a drain electrode layer,
wherein the first oxide semiconductor film is between the source electrode layer and the drain electrode layer, and
wherein the second oxide semiconductor film is between the source electrode layer and the drain electrode layer.
8. A semiconductor device comprising:
a gate electrode on an insulating surface;
a gate insulating layer over the gate electrode; and
an oxide semiconductor layer over the gate insulating layer,
wherein the gate electrode and the oxide semiconductor layer overlap with each other with the gate insulating layer provided therebetween,
wherein the oxide semiconductor layer has a stacked-layer structure comprising a first oxide semiconductor film and a second oxide semiconductor film,
wherein the second oxide semiconductor film is sandwiched between the gate insulating layer and the first oxide semiconductor film,
wherein a value of a band gap of the first oxide semiconductor film is smaller than a value of a band gap of the second oxide semiconductor film,
wherein the first oxide semiconductor film comprises a first non-single-crystal region,
wherein the second oxide semiconductor film comprises a second non-single-crystal region,
wherein the first non-single-crystal region and the second non-single-crystal region are in contact with each other, and
wherein a c-axis of the first non-single-crystal region is in the same direction as a c-axis of the second non-single-crystal region, in a vicinity of an interface between the first non-single-crystal region and the second non-single-crystal region.
9. The semiconductor device according to claim 8 , wherein the value of a band gap of the second oxide semiconductor film is larger by 0.2 eV or more than the value of a band gap of the first oxide semiconductor film.
10. The semiconductor device according to claim 8 ,
wherein the first oxide semiconductor film is crystallized in the thickness direction 3 nm or more from an interface between the first oxide semiconductor film and the second oxide semiconductor film, and
wherein the second oxide semiconductor film is crystallized in the thickness direction 3 nm or more from the interface.
11. The semiconductor device according to claim 8 , wherein the first oxide semiconductor film contains at least nitrogen or phosphorus.
12. The semiconductor device according to claim 8 , wherein the second oxide semiconductor film contains at least boron or aluminum.
13. The semiconductor device according to claim 8 , wherein a conduction band level of the first oxide semiconductor film is lower than a conduction band level of the second oxide semiconductor film.
14. A semiconductor device comprising:
an oxide semiconductor layer, one surface of the oxide semiconductor layer being in contact with an insulating surface;
a pair of low-resistance regions with the oxide semiconductor layer interposed therebetween, wherein one surface of each of the pair of low-resistance regions is in contact with the insulating surface;
a gate insulating layer in contact with the other surface of the oxide semiconductor layer;
a gate electrode over the oxide semiconductor layer with the gate insulating layer provided therebetween; and
a pair of source and drain electrodes, each of the pair of source and drain electrodes being electrically connected to one of the pair of low-resistance regions,
wherein the other surface of the oxide semiconductor layer and the other surface of each of the pair of low-resistance regions are coplanar,
wherein the oxide semiconductor layer has a stacked-layer structure comprising a first oxide semiconductor film and a second oxide semiconductor film,
wherein the second oxide semiconductor film is sandwiched between the gate insulating layer and the first oxide semiconductor film,
wherein a value of a band gap of the first oxide semiconductor film is smaller than a value of a band gap of the second oxide semiconductor film,
wherein resistivity of each of the pair of low-resistance regions is lower than resistivity of the oxide semiconductor layer, and
wherein resistivity of each of the pair of low-resistance regions is higher than or equal to 1×10 4 Ω·cm and lower than or equal to 3Ω·cm.
15. The semiconductor device according to claim 14 , wherein the gate insulating layer is in contact with the other surface of each of the pair of low-resistance regions.
16. The semiconductor device according to claim 14 , wherein the value of a band gap of the second oxide semiconductor film is larger by 0.2 eV or more than the value of a band gap of the first oxide semiconductor film.
17. The semiconductor device according to claim 14 ,
wherein the first oxide semiconductor film comprises a first non-single-crystal region, and
wherein the second oxide semiconductor film comprises a second non-single-crystal region.
18. The semiconductor device according to claim 14 ,
wherein the first oxide semiconductor film is crystallized in the thickness direction 3 nm or more from an interface between the first oxide semiconductor film and the second oxide semiconductor film, and
wherein the second oxide semiconductor film is crystallized in the thickness direction 3 nm or more from the interface.
19. The semiconductor device according to claim 14 , wherein the first oxide semiconductor film contains at least nitrogen or phosphorus.
20. The semiconductor device according to claim 14 , wherein the second oxide semiconductor film contains at least boron or aluminum.
21. The semiconductor device according to claim 14 , wherein a conduction band level of the first oxide semiconductor film is lower than a conduction band level of the second oxide semiconductor film.
22. The semiconductor device according to claim 17 ,
wherein the first non-single-crystal region and the second non-single-crystal region are in contact with each other, and
wherein a c-axis of the first non-single-crystal region is in the same direction as a c-axis of the second non-single-crystal region, in a vicinity of an interface between the first non-single-crystal region and the second non-single-crystal region.
23. A semiconductor device comprising:
an oxide semiconductor layer over an insulating surface;
a gate insulating layer over the insulating surface; and
a gate electrode over the insulating surface, the oxide semiconductor layer and the gate electrode being stacked with each other with the gate insulating layer provided therebetween,
wherein the oxide semiconductor layer has a stacked-layer structure comprising a first oxide semiconductor film including indium and zinc and a second oxide semiconductor film including indium and zinc,
wherein the second oxide semiconductor film is sandwiched between the gate insulating layer and the first oxide semiconductor film,
wherein a value of a band gap of the first oxide semiconductor film is smaller than a value of a band gap of the second oxide semiconductor film,
wherein the first oxide semiconductor film comprises a first non-single-crystal region,
wherein the second oxide semiconductor film comprises a second non-single-crystal region,
wherein the first non-single-crystal region and the second non-single-crystal region are in contact with each other, and
wherein a c-axis of the first non-single-crystal region is in the same direction as a c-axis of the second non-single-crystal region, in a vicinity of an interface between the first non-single-crystal region and the second non-single-crystal region.