Curable composition for imprint, pattern-forming method and pattern
Provide a curable composition for imprint, which is improved in the surface roughness of the cured film. A curable composition for imprint comprising a polymerizable compound (A), a polymerization initiator (B), and a non-polymerizable compound (C), the non-polymerizable compound (C) comprising at least one species of surfactant (C1) which contains 20% by mass or more of fluorine atom, and, at least one species of polymer (C2) which contains 3% by mass or more and less than 20% by mass of fluorine atom and/or 5% by mass or more and less than 40% by mass of silicon atom, and has a weight-average molecular weight (Mw) of 1,000 to 100,000.
1. A curable composition for imprint comprising a polymerizable compound (A), a polymerization initiator (B), and a non-polymerizable compound (C),
the non-polymerizable compound (C) comprising at least one species of surfactant (C1) which contains 20% by mass or more of fluorine atom, and, at least one species of polymer (C2) which contains 3% by mass or more and less than 20% by mass of fluorine atom and/or 5% by mass or more and less than 40% by mass of silicon atom, and has a weight-average molecular weight of 1,000 to 100,000.
2. The curable composition for imprint of claim 1 , wherein the polymer (C2) contains, at least, 3% by mass or more and less than 20% by mass of fluorine atom.
3. The curable composition for imprint of claim 1 ,
wherein difference between the fluorine atom content of the compound (C1) and the total content of fluorine atom and silicon atom of the polymer (C2) is 3 to 70% by mass.
4. The curable composition for imprint of claim 1 ,
wherein the compound (C1) is a compound having a fluorine atom-containing alkyl group, a fluorine atom-containing cycloalkyl group, or a fluorine atom-containing aryl group.
5. The curable composition for imprint of claim 1 ,
wherein the polymer (C2) is a compound having a fluorine atom-containing alkyl group, a fluorine atom-containing cycloalkyl group, or fluorine atom-containing aryl group.
6. The curable composition for imprint of claim 1 ,
wherein the polymerizable compound (A) is a (meth)acrylate compound.
7. The curable composition for imprint of claim 1 ,
wherein the polymerizable compound (A) is a compound having an aromatic group and/or an alicyclic hydrocarbon group.
8. The curable composition for imprint of claim 1 ,
wherein the compound (C1) has a fluorine atom-containing alkyl group, a fluorine atom-containing cycloalkyl group, or a fluorine atom-containing aryl group, and, the polymer (C2) has a fluorine atom-containing alkyl group, a fluorine atom-containing cycloalkyl group, or a fluorine atom-containing aryl group.
9. The curable composition for imprint of claim 1 ,
wherein difference between the fluorine atom content of the compound (C1), and the total content of fluorine atom and silicon atom of the polymer (C2) is 3 to 70% by mass, and the polymer (C2) contains, at least, 3% by mass or more and less than 20% by mass of fluorine atom.
10. The curable composition for imprint of claim 1 ,
wherein difference between the fluorine atom content of the compound (C1), and, the total content of fluorine atom and silicon atom of the polymer (C2) is 3 to 70% by mass, and the polymer (C2) is a compound having a fluorine atom-containing alkyl group, a fluorine atom-containing cycloalkyl group, or a fluorine atom-containing aryl group.
11. The curable composition for imprint of claim 1 ,
wherein the compound (C1) is a compound having a fluorine atom-containing alkyl group, a fluorine atom-containing cycloalkyl group, or a fluorine atom-containing aryl group, and the polymer (C2) contains, at least, 3% by mass or more and less than 20% by mass of fluorine atom.
12. The curable composition for imprint of claim 1 ,
wherein the polymerizable compound (A) is a (meth)acrylate compound, difference between the fluorine atom content of the compound (C1), and the total content of fluorine atom and silicon atom of the polymer (C2) is 3 to 70% by mass, and the polymer (C2) contains, at least, 3% by mass or more and less than 20% by mass of fluorine atom.
13. The curable composition for imprint of claim 1 ,
wherein the polymerizable compound (A) is a (meth)acrylate compound, the compound (C1) is a compound having a fluorine atom-containing alkyl group, a fluorine atom-containing cycloalkyl group, or a fluorine atom-containing aryl group, and, the polymer (C2) is a compound having a fluorine atom-containing alkyl group, a fluorine atom-containing cycloalkyl group, or a fluorine atom-containing aryl group.
14. The curable composition for imprint of claim 1 ,
wherein the polymerizable compound (A) is a compound having an aromatic group and/or an alicyclic hydrocarbon group, the compound (C1) is a compound having a fluorine atom-containing alkyl group, a fluorine atom-containing cycloalkyl group, or a fluorine atom-containing aryl group, and the polymer (C2) is a compound having a fluorine atom-containing alkyl group, a fluorine atom-containing cycloalkyl group, or a fluorine atom-containing aryl group.
15. A method of forming a pattern, the method comprising:
applying the curable composition for imprint described in claim 1 on a substrate or on a mold having a fine pattern formed thereon, and subjecting the curable composition for imprint to light exposure, while being held between the mold and the substrate.
16. The method of forming a pattern of claim 15 , wherein the curable composition for imprint is applied on the substrate by ink jet process.
17. A pattern formed by the method described in claim 15 .
18. The pattern of claim 17 ,
wherein, when viewed in the thickness-wise direction of the pattern, the fluorine atom content in the 10% range from the substrate surface, the fluorine atom content in the 45 to 55% range from the substrate surface, and the fluorine atom content in the 90 to 100% range from the substrate surface, increase in this order.
19. An electronic device comprising the pattern described in claim 17 .
20. A method of manufacturing an electronic device comprising the method of forming a pattern described in claim 15 .