Methods of manufacturing optical filters and methods of manufacturing organic light emitting display devices having optical filters
A method of manufacturing an optical filter includes preparing a substrate having a panel region, a peripheral region, and an alignment region, forming an outer black matrix on the substrate, such that the outer black matrix surrounds the panel region, forming a dummy black matrix on the substrate, such that the dummy black matrix is in the peripheral region while exposing the alignment region, forming a first color photoresist layer on the substrate to cover the outer black matrix and the dummy black matrix, forming a first color pattern in the panel region and an alignment pattern in the alignment region by patterning the first color photoresist layer, forming a second color photoresist layer on the substrate, forming a second color pattern in the panel region by patterning the second color photoresist layer, and forming a third color pattern in the panel region.
1. A method of manufacturing an optical filter, the method comprising:
preparing a substrate having a panel region, a peripheral region, and an alignment region;
forming an outer black matrix on the substrate, such that the outer black matrix surrounds the panel region;
forming a dummy black matrix on the substrate, such that the dummy black matrix is in the peripheral region while exposing the alignment region;
forming a first color photoresist layer on the substrate to cover the outer black matrix and the dummy black matrix;
forming a first color pattern in the panel region and an alignment pattern in the alignment region by patterning the first color photoresist layer;
forming a second color photoresist layer on the substrate to cover the outer black matrix, the dummy black matrix, the first color pattern, and the alignment pattern;
forming a second color pattern in the panel region by patterning the second color photoresist layer; and
forming a third color pattern in the panel region.
2. The method of claim 1 , wherein forming the alignment pattern includes forming an alignment pattern having a higher light transmittance than a light transmittance of the dummy black matrix, and having a thickness of about one to 1.5 times thicker than a thickness of the dummy black matrix.
3. The method of claim 2 , wherein forming the second color pattern includes:
providing an exposure mask opposite the substrate;
aligning the exposure mask with the substrate by using the alignment pattern; and
partially exposing the second color photoresist layer by using the exposure mask.
4. The method of claim 2 , wherein forming the alignment pattern includes using a material identical to a material of the first color pattern.
5. The method of claim 2 , wherein the first color pattern and the alignment pattern exhibit high transmittance of a blue light.
6. The method of claim 2 , wherein forming the alignment pattern includes reducing a step difference between the alignment region and the peripheral region.
7. The method of claim 6 , wherein forming the second color photoresist layer includes a spin coating process.
8. The method of claim 1 , wherein forming the alignment pattern includes forming a pattern having a shape of a cross, a triangle, a circle, or a rectangle, when viewed in a plan view.
9. The method of claim 1 , wherein forming the first color photoresist layer includes using a negative photoresist.
10. The method of claim 1 , wherein forming the dummy black matrix includes depositing the dummy black matrix to a same thickness as the outer black matrix.
11. The method of claim 1 , wherein forming the first color pattern and the alignment pattern is simultaneous, the alignment pattern filling a space between a dummy black matrix and an adjacent outer black matrix.
12. The method of claim 11 , wherein forming the alignment pattern includes forming the alignment pattern to a same thickness as each of the dummy black matrix and outer black matrix.
13. A method of manufacturing an organic light emitting diode display device, the method comprising:
forming a display panel including a switching device, a first electrode, an organic light emitting structure, a second electrode, a plurality of pixel regions arranged in a first direction and a second direction perpendicular to the first direction, and a non-pixel region surrounding the pixel regions; and
forming an optical filter on the display panel, forming the optical filter including:
preparing a substrate having a panel region, a peripheral region, and an alignment region,
forming an outer black matrix on the substrate, such that the outer black matrix surrounds the panel region,
forming a dummy black matrix on the substrate, such that the dummy black matrix is in the peripheral region while exposing the alignment region,
forming a first color photoresist layer on the substrate to cover the outer black matrix and the dummy black matrix,
forming a first color pattern in the panel region and an alignment pattern in the alignment region by patterning the first color photoresist layer,
forming a second color photoresist layer on the substrate to cover the outer black matrix, the dummy black matrix, the first color pattern, and the alignment pattern,
forming a second color pattern in the panel region by patterning the second color photoresist layer, and
forming a third color pattern in the panel region.
14. The method of claim 13 , wherein forming the alignment pattern includes forming an alignment pattern having a higher light transmittance than a light transmittance of the dummy black matrix, and having a thickness of about one to 1.5 times thicker than a thickness of the dummy black matrix.
15. The method of claim 14 , wherein forming the second color pattern includes:
providing an exposure mask opposite the substrate;
aligning the exposure mask with the substrate by using the alignment pattern; and
partially exposing the second color photoresist layer by using the exposure mask.
16. The method of claim 14 , wherein forming the alignment pattern includes reducing a step difference between the alignment region and the peripheral region.
17. The method of claim 13 , wherein forming the second color photoresist layer includes a spin coating process.