Semiconductor package and fabrication method thereof
A semiconductor package is provided. The semiconductor package includes a semiconductor chip having opposite first and second surfaces; an RDL structure formed on the first surface of the semiconductor chip and having opposite third and fourth surfaces and a plurality of first conductive through holes penetrating the third and fourth surfaces thereof, wherein the RDL structure is formed on the semiconductor chip through the fourth surface thereof and electrically connected to the semiconductor chip through a plurality of first conductive elements, and the third surface of the RDL structure has a redistribution layer formed thereon; a plurality of conductive bumps formed on the redistribution layer; and an encapsulant formed on the first surface of the semiconductor chip for encapsulating the RDL structure, wherein the conductive bumps are embedded in and exposed from the encapsulant. The invention effectively prevents warpage of the semiconductor package and improves the electrical connection significantly.
1. A semiconductor package, comprising:
a semiconductor chip having a first surface and a second surface opposite to the first surface;
an RDL (redistribution layer) structure formed on the first surface of the semiconductor chip and having opposite third and fourth surfaces and a plurality of first conductive through holes penetrating the third and fourth surfaces thereof, wherein the RDL structure is formed on the semiconductor chip through the fourth surface thereof and electrically connected to the semiconductor chip through a plurality of first conductive elements, and the third surface of the RDL structure has a redistribution layer formed thereon;
a plurality of conductive bumps formed on the redistribution layer; and
an encapsulant formed on the first surface of the semiconductor chip for encapsulating the RDL structure, wherein the conductive bumps are embedded in and exposed from the encapsulant.
2. The semiconductor package of claim 1 , further comprising a connection unit or stacked connection units formed between the fourth surface of the RDL structure and the first surface of the semiconductor chip, the connection unit or each of the stacked connection units has a plurality of second conductive through holes penetrating therethrough, the connection unit or stacked connection units are electrically connected to the RDL structure through the first conductive elements and electrically connected to the semiconductor chip through the second conductive elements, and the connection unit or stacked connection units are encapsulated by the encapsulant.
3. The semiconductor package of claim 2 , wherein the connection unit or stacked connection units include active component chips or passive component chips.
4. The semiconductor package of claim 2 , wherein the first and the second conductive elements are respectively conductive posts, conductive balls or conductive bumps.
5. The semiconductor package of claim 1 , further comprising a package substrate, wherein the redistribution layer is electrically connected to the package substrate through the conductive bumps, and an underfill is filled between the package substrate and the redistribution layer.
6. The semiconductor package of claim 5 , further comprising a plurality of solder balls formed on a surface of the redistribution layer opposite to the package substrate and electrically connected therebetween.
7. The semiconductor package of claim 1 , wherein each of the conductive bumps is exposed from and flush with a surface of the encapsulant.
8. The semiconductor package of claim 1 , wherein the encapsulant is flush with the semiconductor chip at sides.
9. The semiconductor package of claim 8 , wherein each of the conductive bumps is exposed from and flush with a surface of the encapsulant.
10. The semiconductor package of claim 2 , wherein the RDL structure and the connection unit or stacked connection units are made of Si, SiC, GaAs, SiO 2 or Al 2 O 3 .
11. The semiconductor package of claim 1 , wherein the first conductive through holes of the RDL structure are electrically connected to the redistribution layer.