Method for spatially modulating X-ray pulses using MEMS-based X-ray optics
A method and apparatus are provided for spatially modulating X-rays or X-ray pulses using microelectromechanical systems (MEMS) based X-ray optics. A torsionally-oscillating MEMS micromirror and a method of leveraging the grazing-angle reflection property are provided to modulate X-ray pulses with a high-degree of controllability.
1. A method for spatially modulating X-rays or X-ray pulses using MicroElectroMechanical systems (MEMS) X-ray optics comprising:
providing a MEMS micromirror surface;
providing incident X-rays on the MEMS micromirror surface at a set angle of incidence includes providing a pulse train dispersion including incident temporally dispersed X-ray pulses on the MEMS micromirror surface;
providing a mirror frequency for controllably modulating the incident X-rays; and
providing an area detector receiving spatially separated X-ray pulse positions from controllably modulating the incident X-ray pulses.
2. The method as recited in claim 1 wherein providing incident X-rays on the MEMS micromirror surface at said set angle of incidence includes providing said set angle of incidence for reflecting the incident X-rays.
3. The method as recited in claim 1 wherein providing incident X-rays on the MEMS micromirror surface at said set angle of incidence includes providing said set angle of incidence less than a critical angle θ c said critical angle θ c based upon a given X-ray wavelength and a MEMS micromirror surface material.
4. The method as recited in claim 1 wherein providing said MEMS micromirror surface includes providing a torsional mirror.
5. The method as recited in claim 1 wherein providing said MEMS micromirror surface includes providing said MEMS micromirror being fabricated on a single-crystal-silicon (SCS) device layer of a Silicon-On-Insulator (SOI) wafer.
6. The method as recited in claim 1 wherein providing said MEMS micromirror surface includes providing said MEMS micromirror including a respective pair of torsional hinges.
7. The method as recited in claim 1 wherein providing said MEMS micromirror surface includes providing said MEMS micromirror including a respective pair of comb-drive actuators.
8. The method as recited in claim 1 wherein providing said mirror frequency for controllably modulating the incident X-rays includes changing pulse intensity and duration by providing a selected mirror frequency.
9. The method as recited in claim 1 wherein providing incident X-rays on the MEMS micromirror surface at said set angle of incidence includes changing pulse intensity and duration by providing a selected angle of incidence.
10. A method for spatially modulating X-rays or X-ray pulses using MicroElectroMechanical systems (MEMS) X-ray optics comprising:
providing a MEMS micromirror surface;
providing incident X-rays on the MEMS micromirror surface at a set angle of incidence includes providing a short pulse dispersion including a single X-ray pulse on the MEMS micromirror surface;
providing a mirror frequency for controllably modulating the incident X-rays; and
providing an area detector receiving a spatially spread X-ray pulse position from controllably modulating the incident short X-ray pulse.
11. The method as recited in claim 10 wherein said single X-ray pulse includes a pulse duration of approximately 100 picosecond (ps).
12. An apparatus for spatially modulating X-rays or X-ray pulses using MicroElectroMechanical systems (MEMS) X-ray optics comprising:
a MEMS micromirror including a MEMS micromirror surface;
an X-ray source providing incident X-rays on the MEMS micromirror surface at a set angle of incidence; and
said MEMS micromirror including a mirror frequency, said set angle of incidence of the incident X-rays and said mirror frequency being provided for controllably modulating the incident X-rays; and
said micromirror providing a pulse train dispersion, wherein said X-ray source providing incident temporally dispersed X-ray pulses on the MEMS micromirror surface; and an area detector receiving spatially separated X-ray pulse positions from controllably modulating the incident X-ray pulses.
13. The apparatus as recited in claim 12 wherein said MEMS micromirror is fabricated on a single-crystal-silicon (SCS) device layer of a Silicon-On-Insulator (SOI) wafer.
14. The apparatus as recited in claim 12 wherein said MEMS micromirror includes a respective pair of torsional hinges.
15. The apparatus as recited in claim 12 wherein said MEMS micromirror includes a respective pair of comb-drive actuators.
16. The apparatus as recited in claim 12 wherein said set angle of incidence includes a set angle of incidence less than a critical angle θ c and said critical angle θ c being based upon a given X-ray wavelength and a MEMS micromirror surface material.
17. The apparatus as recited in claim 12 wherein said MEMS micromirror includes a torsional oscillating mirror.
18. An apparatus for spatially modulating X-rays or X-ray pulses using MicroElectroMechanical systems (MEMS) X-ray optics comprising:
a MEMS micromirror including a MEMS micromirror surface;
an X-ray source providing incident X-rays on the MEMS micromirror surface at a set angle of incidence;
said MEMS micromirror including a mirror frequency, said set angle of incidence of the incident X-rays and said mirror frequency being provided for controllably modulating the incident X-rays; and
said micromirror providing a short pulse dispersion, wherein said X-ray source providing a single X-ray pulse on the MEMS micromirror surface; and an area detector receiving a spatially spread X-ray pulse position from controllably modulating the incident short X-ray pulse.