Microfluidic device and microtube thereof
A micromachined tube (microtube) suitable for microfluidic devices. The microtube is formed by isotropically etching a surface of a first substrate to define therein a channel having an arcuate cross-sectional profile, and forming a substrate structure by bonding the first substrate to a second substrate so that the second substrate overlies and encloses the channel to define a passage having a cross-sectional profile of which at least half is arcuate. The substrate structure is thinned to define the microtube and walls thereof that surround the passage.
1. A microtube of a microfluidic device, the microtube comprising:
a substrate structure comprising first and second substrates bonded together at respective first surfaces thereof, each of the first and second substrates having a corresponding second surface oppositely disposed from the first surface thereof so as to define, respectively, first and second outer surfaces of the substrate structure;
a passage within a first region of the substrate structure, the passage having a cross-sectional profile defined by first and second channels in, respectively, the first surfaces of the first and second substrates, each of the channels having an arcuate cross-sectional profile and being enclosed between the first and second substrates to define the passage; and
side portions within a second region of the substrate structure, the side portions being separated by the passage and by the first region of the substrate structure within which the passage is disposed, each of the side portions having an etched surface at the second outer surface of the substrate structure, the second region of the substrate structure defined by the side portions having a thickness that is less than a thickness of the first region of the substrate structure within which the passage is disposed.
2. The microtube according to claim 1 , wherein the passage is present in a portion of the first region of the substrate structure that protrudes beyond the etched surfaces of the side portions.
3. The microtube according to claim 1 , wherein the second outer surface of the substrate structure has a stepped profile as a result of the thickness of the second region of the substrate structure being less than the thickness of the first region of the substrate structure.
4. The microtube according to claim 1 , wherein the arcuate cross-sectional profiles of the channels are substantially identical.
5. The microtube according to claim 4 , wherein the passage has a circular cross-sectional shape.
6. The microtube according to claim 4 , wherein the passage has an elliptical cross-sectional shape.
7. The microtube according to claim 1 , wherein the first and second substrates are formed of materials chosen from the group consisting of silicon, Ge, SiC, GaAs, Si/Ge, diamond, sapphire, glass, ceramic materials, plastic materials, and metallic materials.
8. The microtube according to claim 1 , wherein the first substrate comprises a buried layer.
9. The microtube according to claim 1 , further comprising a third substrate bonded to the substrate structure such that the first region of the substrate structure containing the passage is spaced apart from a surface of the third substrate and a portion of the microtube projects over the surface of the third substrate so as to be capable of movement relative thereto.
10. The microtube according to claim 9 , wherein the third substrate comprises at least one of a semiconductor, silicon, glass, ceramic, or plastic material.
11. The microtube according to claim 9 , wherein the third substrate comprises a semiconductor material and an insulating layer to which the substrate structure is bonded.
12. The microtube according to claim 9 , further comprising means on the substrate structure and on the third substrate for electrically connecting the microtube to metallization on the third substrate.
13. The microtube according to claim 9 , further comprising a capping wafer bonded to the third substrate and enclosing the microtube.
14. The microtube according to claim 13 , wherein the microtube is vacuum sealed within a cavity defined by and between the third substrate and the capping wafer.
15. The microtube according to claim 9 , further comprising holes in the third substrate that fluidically interconnect opposite ends of the passage of the microtube and define fluid inlet and outlet ports of the microtube.
16. The microtube according to claim 1 , further comprising means for vibrating the microtube perpendicular to a plane containing the microtube.
17. The microtube according to claim 1 , further comprising means for vibrating the microtube within a plane containing the microtube.