IP Library Granted Patent US 8,995,622
Granted Patent B2
US 8,995,622 · App. 13/373,554 · Granted Mar 31, 2015

X-ray source with increased operating life

Inventors: David L. Adler (San Jose, CA); Wenbing Yun (Walnut Creek, CA); Thomas Anthony Case (Walnut Creek, CA)
Assignee: Carl Zeiss X-ray Microscopy, Inc.
H01J35/08H01J2235/087H05G1/52H01J35/14H01J2235/186
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Quick Facts
Patent No.
US 8,995,622
App. No.
13/373,554
Granted
Mar 31, 2015
Kind
B2
Abstract

An x-ray source is described. During operation of the x-ray source, an electron source emits a beam of electrons. This beam of electrons is focused to a spot on a target by a magnetic focusing lens. In response to receiving the beam of focused electrons, the target provides a transmission source of x-rays. Moreover, a repositioning mechanism selectively repositions the beam of focused electrons to different locations on a surface of the target based on a feedback parameter associated with operation of the x-ray source. This feedback parameter may be based on: an intensity of the x-rays output by the x-ray source; a position of the x-rays output by the x-ray source; an elapsed time during operation of the x-ray source; a cross-sectional shape of the x-rays output by the x-ray source; and/or a spot size of the x-rays output by the x-ray source.

Claims (44)

1. An x-ray source, comprising:

an electron source configured to emit a beam of electrons;

a magnetic focusing lens configured to focus the beam of electrons to a spot, having a spot size, on a target;

the target configured to provide a transmission source of x-rays in response to receiving the beam of focused electrons;

a repositioning mechanism configured to selectively reposition the beam of focused electrons to different locations on a surface of the target based on a feedback parameter associated with operation of the x-ray source; and

an electrostatic lens between the electron source and the magnetic focusing lens that is configured to collimate the beam of electrons.

2. The x-ray source of claim 1 , further comprising

a beam-parameter detector to determine the feedback parameter that includes at least one of: an optical detector and an x-ray detector.

3. The x-ray source of claim 1 , wherein the feedback parameter is based on an intensity of the x-rays output by the x-ray source.

4. The x-ray source of claim 1 , wherein the feedback parameter is based on a position of the x-rays output by the x-ray source.

5. The x-ray source of claim 1 , wherein the feedback parameter is based on a cross-sectional shape of the x-rays output by the x-ray source.

6. The x-ray source of claim 1 , wherein the feedback parameter is based on a spot size of the x-rays out put by the x-ray source.

7. The x-ray source of claim 1 , wherein selectively repositioning the beam of focused electrons extends an operating life of the x-ray source relative to another x-ray source in which the beam of focused electrons is approximately at a static location on the surface of the target during operation of the other x-ray source.

8. The x-ray source of claim 1 , wherein the feedback parameter includes an elapsed time, during operation of the x-ray source, since the location on the surface of the target was last changed.

9. The x-ray source of claim 1 , wherein the feedback parameter includes when the x-ray source is transitioned from a low-power mode to an operating mode.

10. The x-ray source of claim 1 , wherein the feedback parameter includes a cumulative evaporation of the target at one or more locations on the surface of the target based on an energy density of the beam of focused electrons and an elapsed time, during operation of the x-ray source, since a position of the focused beam of electrons on the surface of the target was last changed.

11. The x-ray source of claim 1 , wherein the x-ray source further includes a tube that has a surface that defines an interior of the tube;

wherein the electron source and the target are included in the interior of the tube; and

wherein the tube is sealed and the interior of the tube has a pressure that is less than atmospheric pressure.

12. The x-ray source of claim 11 , wherein the pressure in the interior of the tube is less than or equal to high vacuum.

13. The x-ray source of claim 11 , wherein the target includes a thin-film deposited on the surface of the tube.

14. The x-ray source of claim 11 , is, at least in part, included in the tube or is attached to the tube.

15. The x-ray source of claim 1 , wherein the target includes: tungsten, tantalum, molybdenum, rhenium, copper or compounds that include two or more of these elements.

16. The x-ray source of claim 1 , wherein a focal length of the electrostatic lens is between 0.5 and 50 mm.

17. An x-ray source, comprising:

an electron source configured to emit a beam of electrons;

a magnetic focusing lens configured to focus the beam of electrons to a spot, having a spot size, on a target;

the target configured to provide a transmission source of x-rays in response to receiving the beam of focused electrons; and

a repositioning mechanism configured to selectively reposition the beam of focused electrons to different locations on a surface of the target based on a feedback parameter associated with operation of the x-ray source;

wherein the feedback parameter includes a user input that specifies a different location on the surface of the target or that indicates a change in the location on the surface of the target.

18. The x-ray source of claim 17 , wherein the locations on the surface of the target are predefined.

19. A method for selectively repositioning a beam of focused electrons, the method comprising:

emitting a beam of electrons from an electron source;

focusing, using a magnetic focusing lens, the beam of electrons to a spot, having a spot size, on a target;

in response to receiving the beam of focused electrons at the target, providing the transmission source of x-rays; and

selectively repositioning the beam of focused electrons to different locations on a surface of the target using a repositioning mechanism, the repositioning being based on a feedback parameter that includes a user input that specifies a different location on the surface of the target or that indicates a change in the location on the surface of the target.

20. A method for selectively repositioning a beam of focused electrons, the method comprising:

emitting a beam of electrons from an electron source;

collimating the beam of electrons with an electrostatic lens;

focusing, using a magnetic focusing lens, the collimated beam of electrons to a spot, having a spot size, on a target;

in response to receiving the beam of focused electrons at the target, providing the transmission source of x-rays; and

selectively repositioning the beam of focused electrons to different locations on a surface of the target using a repositioning mechanism based on a feedback parameter associated with operation of the x-ray source.

21. The method of claim 20 , further comprising:

determining the feedback parameter using at least one of: an optical detector and an x-ray detector.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 3, 2014
From: ADLER, DAVID L.; CASE, THOMAS ANTHONY; YUN, WENBING
To: CARL ZEISS X-RAY MICROSCOPY, INC.
Reel/Frame 033013/0976 →
Continuity (2)
Continuation 13066679 · Apr 21, 2011
Related Publication 20120269325A1 · Oct 25, 2012