Devices for monolithic data conversion interface protection and methods of forming the same

1. An apparatus comprising:

a substrate;

a first semiconductor region of a first doping type in the substrate, wherein the first semiconductor region comprises a first well region;

a second semiconductor region of a second doping type in the substrate, wherein the second semiconductor region comprises a second well region;

a third semiconductor region of the first doping type in the substrate, wherein the third semiconductor region comprises a third well region, wherein the second semiconductor region is positioned between the first and third semiconductor regions;

a fourth semiconductor region of the second doping type in the substrate, wherein the fourth semiconductor region comprises a fourth well region, wherein the third semiconductor region is positioned between the second and fourth semiconductor regions;

a fifth well region of the first doping type in the substrate, wherein the fourth well region is positioned between the third and fifth well regions;

a first diffusion region of the second type in the first semiconductor region;

a first gate region adjacent the first semiconductor region;

a second diffusion region of the first type in the second semiconductor region;

a third diffusion region of the first type in the second semiconductor region;

a fourth diffusion region of the second type in the third semiconductor region;

a fifth diffusion region of the first type in the fourth semiconductor region; and

a second gate region adjacent the fourth semiconductor region;

a signal node electrically connected to the first and fifth diffusion regions;

a first power supply node electrically connected to the second and third diffusion regions; and

a second power supply node electrically connected to the fourth diffusion region;

wherein the second diffusion region, the second semiconductor region, the first semiconductor region, and the first diffusion region are configured as a first silicon controlled rectifier (SCR);

wherein the third diffusion region, the second semiconductor region, the third semiconductor region, and the fourth diffusion region are configured as a second SCR;

wherein the fifth diffusion region, the fourth semiconductor region, the third semiconductor region and the fourth diffusion region are configured as a third SCR;

wherein a junction between the first well region and the first diffusion region is configured as a first diode;

wherein a junction between the fifth diffusion region and the fourth well region is configured a second diode; and

wherein a junction between the fifth well region and the fourth well region is configured as a third diode.

2. The apparatus of claim 1 , further comprising:

a third gate region adjacent a boundary between the first and second well regions;

a fourth gate region adjacent a boundary between the second and third well regions; and

a fifth gate region adjacent a boundary between the third and fourth well regions.

3. The apparatus of claim 2 , wherein the third gate region comprises metal associated with the first type, the fourth gate region comprises metal associated with the second type, and the fifth gate region comprises metal associated with the second type.

4. The apparatus of claim 3 , wherein the third gate region is electrically connected to the first power supply node, wherein the fourth gate region is electrically connected to the second power supply node, and wherein the fifth gate region is electrically connected to the second power supply node.

5. The apparatus of claim 3 , further comprising:

a first resist protection oxide (RPO) region, wherein at least a portion of the first RPO region is positioned between the first diffusion region and the third gate region;

a second RPO region, wherein at least a portion of the second RPO region is positioned between the third diffusion region and the fourth gate region; and

a third RPO region, wherein at least a portion of the third RPO region is positioned between the fifth diffusion region and the fifth gate region.

6. The apparatus of claim 1 , further comprising:

a sixth diffusion region of the first type in the first well region and electrically connected to the second power supply node;

a seventh diffusion region of the second type in the second well region and electrically connected to the first power supply node;

an eighth diffusion region of the second type in the fourth well region and electrically connected to the first power supply node; and

a ninth diffusion region of the first type in the fifth well region and electrically connected to the second power supply node.

7. The apparatus of claim 6 ,

wherein the first gate region is positioned between the first and sixth diffusion regions; and

wherein the second gate region is positioned between the fifth and eighth diffusion regions.

8. The apparatus of claim 7 , wherein the first gate region comprises metal associated with the second type and the second gate region comprises metal associated with the first type.

9. The apparatus of claim 7 , wherein the first and second gate regions are electrically floating.

10. The apparatus of claim 6 , further comprising an explicit resistor electrically connected between the seventh diffusion region and the first power supply node.

11. The apparatus of claim 2 , wherein the third gate region comprises metal associated with the second type, the fourth gate region comprises metal associated with p-type, and the fifth gate region comprises metal associated with the first type.

12. The apparatus of claim 11 , wherein the third gate region is electrically connected to the second power supply node, and wherein the fifth gate region is electrically connected to the first power supply node.

13. The apparatus of claim 12 , further comprising:

a first RPO region, wherein at least a portion of the first RPO region is positioned between the second diffusion region and the third gate region;

a second RPO region, wherein at least a portion of the second RPO region is positioned between the fourth diffusion region and the fifth gate region.

14. The apparatus of claim 13 , wherein the fourth gate region is electrically connected to a power high supply node.

15. The apparatus of claim 13 , wherein the first type is n-type and the second type is p-type, wherein the apparatus further comprises a third RPO region, wherein at least a portion of the third RPO region is positioned between the fourth diffusion region and the fourth gate region, wherein the fourth gate region is electrically connected to a power low supply node.

16. The apparatus of claim 13 , wherein the first type is p-type and the second type is n-type, wherein the apparatus further comprises a third RPO region, wherein at least a portion of the third RPO region is positioned between the third diffusion region and the fourth gate region, wherein the fourth gate region is electrically connected to a power low supply node.

17. The apparatus of claim 1 , wherein the first type is p-type and the second type is n-type.

18. The apparatus of claim 1 , wherein the first type is n-type and the second type is p-type, wherein the apparatus further comprises:

a deep well region of the first type disposed beneath the second well region, the third well region, the fourth well region, and at least a portion of the first and fifth well regions.

19. The apparatus of claim 1 , wherein the first semiconductor region comprises a first native region, wherein the second semiconductor region comprises a first well region, wherein the third semiconductor region comprises a second native region, and wherein the fourth semiconductor region comprises a fourth well region.

20. A method of manufacturing a protection device, the method comprising:

forming a first semiconductor region of a first doping type in a substrate, wherein the first semiconductor region comprises a first well region;

forming a second semiconductor region of a second doping type in the substrate, wherein the second semiconductor region comprises a second well region;

forming a third semiconductor region of the first doping type in the substrate, wherein the third semiconductor region comprises a third well region, wherein the second semiconductor region is positioned between the first and third semiconductor regions;

forming a fourth semiconductor region of the second doping type in the substrate, wherein the fourth semiconductor region comprises a fourth well region, wherein the third semiconductor region is positioned between the second and fourth semiconductor regions;

forming a fifth well region of the first doping type in the substrate, wherein the fourth well region is positioned between the third and fifth well regions;

forming a first diffusion region of the second type in the first semiconductor region;

forming a first gate region adjacent the first semiconductor region;

forming a second diffusion region of the first type in the second semiconductor region;

forming a third diffusion region of the first type in the second semiconductor region;

forming a fourth diffusion region of the second type in the third semiconductor region;

forming a fifth diffusion region of the first type in the fourth semiconductor region;

forming a second gate region adjacent the fourth semiconductor region;

forming a signal node electrically connected to the first and fifth diffusion regions;

forming a first power supply node electrically connected to the second and third diffusion regions; and

forming a second power supply node electrically connected to the fourth diffusion region;

wherein the second diffusion region, the second semiconductor region, the first semiconductor region and the first diffusion region are configured as a first silicon controlled rectifier (SCR);

wherein the third diffusion region, the second semiconductor region, the third semiconductor region, and the fourth diffusion region are configured as a second SCR;

wherein the fifth diffusion region, the fourth semiconductor region, the third semiconductor region and the fourth diffusion region are configured as a third SCR;

wherein a junction between the first well region and the first diffusion region is configured as a first diode;

wherein a junction between the fifth diffusion region and the fourth well region is configured as a second diode; and

wherein a junction between the fifth well region and the fourth well region is configured as a third diode.