IP Library Granted Patent US 9,040,939
Granted Patent B2
US 9,040,939 · App. 12/529,429 · Granted May 26, 2015

Membrane supports with reinforcement features

Inventors: John Damiano, Jr. (Apex, NC); Stephen E. Mick (Apex, NC); David P. Nackashi (Raleigh, NC)
Assignee: PROTOCHIPS, INC.
G02B21/34B01L3/508G01N1/312G01N1/36G01N1/42H01J37/20B01L2300/0851H01J2237/2003
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Quick Facts
Patent No.
US 9,040,939
App. No.
12/529,429
Granted
May 26, 2015
Kind
B2
Abstract

A sample support structure with integrated support features and methods of making and using the reinforced membrane. The sample support structures are useful for supporting samples for analysis using microscopic techniques, such as electron microscopy, optical microscopy, x-ray microscopy, UV-VIS spectroscopy and nuclear magnetic resonance (NMR) techniques.

Claims (24)

1. A reinforced sample support structure comprising (a) an array comprising more than one viewing region, wherein the viewing regions are supported by and divided by reinforcement regions, and the reinforcement regions and the viewing regions consist of the same material, the reinforcement regions are thicker than the viewing regions, and the viewing regions are electron transparent, and (b) a framing region surrounding the array, wherein the framing region runs substantially along an outer edge of the reinforced sample support structure, wherein the reinforcement regions are positioned above the viewing regions and the framing region is positioned below the viewing regions.

2. The reinforced sample support structure of claim 1 wherein the viewing regions and the reinforcement regions consist of material selected from the group consisting of monocrystalline silicon, polycrystalline silicon, amorphous silicon, alumina, quartz, fused silica, boron nitride, silicon carbide, metals, ceramics, silicon nitride, aluminum nitride, gallium nitride, graphene, graphite, aluminum, titanium, copper, tungsten, diamond, aluminum oxide, conducting oxides, and combinations thereof.

3. The reinforced sample support structure of claim 1 wherein the viewing regions and reinforcement regions consist of silicon nitride.

4. The reinforced sample support structure of claim 1 , wherein the viewing regions and the reinforcement regions are monolithic.

5. The reinforced sample support structure of claim 1 wherein the framing region comprises a material selected from the group consisting of monocrystalline silicon, polycrystalline silicon, amorphous silicon, alumina, quartz, fused silica, boron nitride, silicon carbide, metals, ceramics, silicon nitride, aluminum nitride, gallium nitride, graphene, graphite, aluminum, titanium, copper, tungsten, diamond, aluminum oxide, conducting oxides, and combinations thereof.

6. A method of making a reinforced sample support structure, the sample support structure comprising (a) an array comprising more than one viewing region, wherein the viewing regions are supported by and divided by reinforcement regions and (b) a framing region surrounding the array, wherein the reinforcement regions and the viewing regions consist of the same material, said method comprising the following steps:

providing a substrate having a first surface and a second surface;

depositing a first support layer on the first surface of the substrate;

depositing a second support layer on the second surface of the substrate;

removing a portion of the first support layer to expose the substrate;

removing a portion of the substrate to yield the framing region;

thinning at least one region of the second support layer to provide the array comprising viewing regions supported by and divided by reinforcement regions, the reinforcement regions are thicker than the viewing regions, and wherein the reinforcement regions are positioned above the viewing regions and the framing region is positioned below the viewing regions,

wherein the framing region runs substantially along an outer edge of the reinforced sample support structure.

7. The method of claim 6 wherein the substrate comprises a material selected from the group consisting of monocrystalline silicon, polycrystalline silicon, amorphous silicon, alumina, quartz, fused silica, boron nitride, silicon carbide, metals, ceramics, silicon nitride, aluminum nitride, gallium nitride, graphene, graphite, aluminum, titanium, copper, tungsten, diamond, aluminum oxide, conducting oxides, and combinations thereof.

8. The method of claim 6 wherein the substrate has a thickness ranging from about 2 to about 1000 μm.

9. The method of claim 6 wherein the first support layer comprises a material selected from the group consisting of monocrystalline silicon, polycrystalline silicon, amorphous silicon, alumina, quartz, fused silica, boron nitride, silicon carbide, metals, ceramics, silicon nitride, aluminum nitride, gallium nitride, graphene, graphite, aluminum, titanium, copper, tungsten, diamond, aluminum oxide, conducting oxides, and combinations thereof.

10. The method of claim 6 wherein the second support layer has a thickness ranging from about 1 to about 1000 nm, which corresponds to the thickness of the reinforcement regions, and wherein the thickness of the viewing regions is less than the thickness of the reinforcement regions.

11. The method of claim 6 wherein the second support layer consists of a material selected from the group consisting of monocrystalline silicon, polycrystalline silicon, amorphous silicon, alumina, quartz, fused silica, boron nitride, silicon carbide, metals, ceramics, silicon nitride, aluminum nitride, gallium nitride, graphene, graphite, aluminum, titanium, copper, tungsten, diamond, aluminum oxide, conducting oxides, and combinations thereof.

12. The method of claim 6 , wherein the second support layer consists of silicon nitride.

13. The method of claim 6 , wherein the thinning is done by etching the second support layer.

14. The reinforced sample support structure of claim 1 , wherein the reinforcement regions frame rectangular, circular, elliptical, or polygonal viewing regions.

15. The reinforced sample support structure of claim 1 , wherein the imaging occurs through the viewing regions.

16. The reinforced sample support structure of claim 1 , wherein the reinforcement regions frame the viewing regions.

17. The reinforced sample support structure of claim 1 , wherein the thickness of the framing region is in a range from about 100 μm to about 750 μm, the thickness of the reinforcement regions is in a range from about 25 nm to 1000 nm, and the thickness of the viewing regions is less than the thickness of the reinforcement regions.

Assignments (2)
SECURITY INTEREST Recorded Sep 21, 2016
From: PROTOCHIPS, INC.
To: SALEM INVESTMENT PARTNERS IV, LIMITED PARTNERSHIP
Reel/Frame 039813/0270 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 25, 2015
From: DAMIANO, JOHN, JR.; MICK, STEPHEN E.; NACKASHI, DAVID P.
To: PROTOCHIPS, INC.
Reel/Frame 035283/0124 →
Continuity (2)
Provisional Application 60892677 · Mar 2, 2007
Related Publication 20100140497A1 · Jun 10, 2010