Nonvolatile semiconductor memory device with protective resistance film
A nonvolatile semiconductor memory device according to an embodiment includes a memory cell block that includes a memory cell array, the memory cell array including: a plurality of first lines; a plurality of second lines intersecting the plurality of first lines; and a memory cell that is provided at each of intersections of the plurality of first lines and the plurality of second lines and includes a variable resistance element, the memory cell array further including a protective resistance film that is provided respectively at each of the intersections of the plurality of first lines and the plurality of second lines and that is connected in series with the memory cell and ohmically contacts the memory cell, and the protective resistance film being configured from a material having a resistivity of 1˜100 Ω·cm.
1. A nonvolatile semiconductor memory device, comprising:
a memory cell array including: a plurality of first lines; a plurality of second lines; and a plurality of memory cells disposed at intersections of the first lines and the second lines and having a variable resistance element,
the memory cell array further including a protective resistance film, the protective resistance film
being disposed at the intersections of the first lines and the second lines,
being disposed between the memory cells and the second lines,
being continuously disposed along the second lines in an extending direction of the second lines,
being connected in series with the memory cells and ohmically contacting the memory cells, and
being configured from a material having a resistivity of 1˜100 Ω·cm.
2. The nonvolatile semiconductor memory device according to claim 1 , wherein
the first lines and the second lines are configured from a material having a resistivity of 0.1˜100 μΩ·cm.
3. The nonvolatile semiconductor memory device according to claim 1 , wherein
the protective resistance film adopts, as a material thereof, SiN, TaN, TiON, HfN, ZrN, AlN, TiSiN, TaSiN, HfSiN, AlSiN, ZrSiN, TiAlN, or doped poly silicon.
4. The nonvolatile semiconductor memory device according to claim 1 , wherein
a resistance value of the protective resistance film is based on the number of the memory cells simultaneously accessed.
5. The nonvolatile semiconductor memory device according to claim 1 , wherein
the protective resistance film directly contacts one of the second lines.
6. The nonvolatile semiconductor memory device according to claim 1 , wherein
the memory cells include electrodes disposed at a side of the second lines, and
the protective resistance film ohmically contacts the electrodes.
7. The nonvolatile semiconductor memory device according to claim 6 , wherein
the electrodes are configured from a material including TiN.
8. A nonvolatile semiconductor memory device, comprising:
a memory cell block configured having a first memory cell array and a second memory cell array stacked therein, the first memory cell array including: a plurality of first lines; a plurality of second lines; and a plurality of first memory cells disposed at intersections of the first lines and the second lines and having a variable resistance element, and the second memory cell array sharing the second lines with the first memory cell array and including: a plurality of third lines extending in the same direction as the first lines; and a plurality of second memory cells disposed at intersections of the second lines and the third lines and having a variable resistance element,
the first memory cell array further including a first protective resistance film, the first protective resistance film
being disposed at the intersections of the first lines and the second lines,
being disposed between the first memory cells and the second lines, and
being continuously disposed along the second lines in an extending direction of the second lines, and
the second memory cell array further including a second protective resistance film, the second protective resistance film
being disposed at the intersections of the second lines and the third lines,
being disposed between the second memory cells and the third lines, and
being continuously disposed along the third lines in an extending direction of the third lines.
9. The nonvolatile semiconductor memory device according to claim 8 , wherein
the first memory cells include first electrodes disposed at a side of the second lines, and
the first protective resistance film ohmically contacts the first electrodes.
10. The nonvolatile semiconductor memory device according to claim 8 , wherein
the second memory cells include second electrodes disposed at a side of the third lines, and
the second protective resistance film ohmically contacts the second electrodes.
11. The nonvolatile semiconductor memory device according to claim 8 , wherein
the first protective resistance film and the second protective resistance film are configured from a material having a resistivity of 1˜100 Ω·cm.
12. The nonvolatile semiconductor memory device according to claim 8 , wherein
the first lines, the second lines, and the third lines are configured from a material having a resistivity of 0.1˜100 Ω·cm.
13. The nonvolatile semiconductor memory device according to claim 8 , wherein
the first protective resistance film and the second protective resistance film adopt, as a material thereof, SiN, TaN, TiON, HfN, ZrN, AlN, TiSiN, TaSiN, HfSiN, AlSiN, ZrSiN, TiAlN, TaAlN, or doped poly silicon.
14. The nonvolatile semiconductor memory device according to claim 1 , wherein
the protective resistance film has a step provided between the memory cells, and
a depth of the step is less than or equal to a depth of a step provided at a hook-up portion of the second lines positioned outside of a placement region of the memory cells.
15. The nonvolatile semiconductor memory device according to claim 14 , wherein
the memory cells include electrodes disposed at a side of the second lines, and
the protective resistance film ohmically contacts the electrodes.
16. The nonvolatile semiconductor memory device according to claim 14 , wherein
the protective resistance film directly contacts one of the second lines.