IP Library Granted Patent US 9,072,164
Granted Patent B2
US 9,072,164 · App. 12/620,562 · Granted Jun 30, 2015

Process for fabricating a three dimensional molded feed structure

Inventors: Alberto F. Viscarra (Torrance, CA); David T. Winslow (Culver City, CA); Billy D. Ables (Richardson, TX); Kurt S. Ketola (Los Angeles, CA); Kurt J. Krause (Redondo Beach, CA); Kevin C. Rolston (Playa Del Rey, CA); Rohn Sauer (Encino, CA); James R. Chow (San Gabriel, CA)
Assignee: RAYTHEON COMPANY
H05K3/0014Y10T29/49156Y10T29/49016H01Q21/0087H05K1/0393H05K3/06H05K3/388H05K2201/0129H05K2201/0141H05K2203/0113H05K2203/1105H05K2203/302
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Quick Facts
Patent No.
US 9,072,164
App. No.
12/620,562
Granted
Jun 30, 2015
Kind
B2
Abstract

A process for fabricating a three dimensional molded feed structure is provided. In one embodiment, the invention relates to a process for fabricating a three dimensional radio frequency (RF) antenna structure, the process including providing a flexible circuit substrate, forming a first preselected pattern of channels in the flexible circuit substrate, depositing a conductive layer on the formed flexible substrate, and removing portions of the conductive layer to form a plurality of conductive traces.

Claims (55)

1. A process for fabricating a three dimensional radio frequency (RF) antenna structure, the process comprising:

providing a foldable flexible circuit substrate;

forming a first preselected pattern of channels in the flexible circuit substrate;

depositing a conductive layer on the formed flexible substrate having the first preselected pattern of channels after forming the first preselected pattern of channels in the flexible circuit substrate; and

removing portions of the conductive layer to form a plurality of conductive traces.

2. The process of claim 1 , wherein the removing portions of the conductive layer to form the plurality of conductive traces comprises:

applying a resist layer to the conductive layer;

exposing and developing the resist layer;

etching the conductive layer; and

removing the resist layer.

3. The process of claim 2 :

wherein the applying the resist layer to the conductive layer comprises applying a resist layer having a second preselected pattern to the conductive layer; and

wherein the etching the conductive layer comprises etching the conductive layer in according with the second preselected pattern.

4. The process of claim 2 , wherein the exposing and developing the resist layer is performed using a conductive photoresist process.

5. The process of claim 2 , wherein the exposing and developing the resist layer is performed using a contact printing process.

6. The process of claim 1 , wherein the flexible substrate comprises a liquid crystal polymer (LCP) material.

7. The process of claim 1 , wherein the conductive layer comprises copper.

8. The process of claim 1 , wherein the conductive layer comprises aluminum.

9. The process of claim 1 , wherein the depositing the conductive layer on the formed flexible substrate comprises evaporating a conductive material on the formed substrate.

10. The process of claim 1 , wherein the depositing the conductive layer on the formed flexible substrate comprises sputtering a conductive material on the formed substrate.

11. The process of claim 1 , wherein the depositing the conductive layer on the formed flexible substrate comprises:

depositing a first conductive layer on a top surface of the formed substrate; and

depositing a second conductive layer on a bottom surface of the formed substrate.

12. The process of claim 11 , further comprising:

applying a first resist layer to the top surface of the formed substrate; and

applying a second resist layer to the bottom surface of the formed substrate.

13. The process of claim 12 , further comprising:

etching the first conductive layer; and

etching the second conductive layer.

14. The process of claim 1 , wherein the depositing the conductive layer on the formed flexible substrate comprises depositing an adhesion layer on the formed flexible substrate, and depositing the conductive layer on the adhesion layer.

15. The process of claim 14 , wherein the adhesion layer is comprised of a material selected from the group consisting of Chromium and Titanium-Tungsten.

16. The process of claim 14 , further comprising etching the adhesion layer.

17. The process of claim 1 further comprising, mounting at least one electronic component to the formed flexible substrate.

18. The process of claim 17 , wherein the at least on one electronic component comprises transmit/receive circuitry.

19. The process of claim 1 , wherein the first preselected pattern of channels comprises a pattern of concave shaped channels.

20. The process of claim 1 , wherein at least one of the plurality of conductive traces extends across a channel of the first preselected pattern of channels.

21. The process of claim 1 , wherein each of the channels is configured to radiate RF signals.

22. A process for fabricating a three dimensional radio frequency (RF) antenna structure, the process comprising:

providing a flexible circuit substrate;

forming a first preselected pattern of channels in the flexible circuit substrate;

depositing a conductive layer on the formed flexible substrate; and

removing portions of the conductive layer to form a plurality of conductive traces,

wherein the forming the first preselected pattern of channels in the flexible circuit substrate comprises:

placing the flexible substrate on a precision die comprising the first preselected pattern of channels;

pressing the flexible substrate into the precision die using an elastomeric material thereby sandwiching the flexible substrate between the elastomeric material and the precision die; and

applying heat to the flexible substrate sandwiched between the elastomeric material and the precision die.

23. The process of claim 22 , wherein the elastomeric material comprises silicone in the form of a backer plate shaped to precisely mate with the die.

24. A process for fabricating a three dimensional radio frequency (RF) antenna structure, the process comprising:

providing a flexible circuit substrate;

placing the flexible substrate on a precision die comprising a first preselected pattern of channels;

pressing the flexible substrate into the precision die using an elastomeric material thereby sandwiching the flexible substrate between the elastomeric material and the precision die to form the first preselected pattern of channels in the flexible substrate;

depositing a conductive layer on the formed flexible substrate having the first preselected pattern of channels after forming the first preselected pattern of channels in the flexible circuit substrate; and

removing portions of the conductive layer to form a plurality of conductive traces.

25. The process of claim 24 , wherein the flexible circuit substrate is configured to be folded.

26. The process of claim 24 , wherein each of the channels is configured to radiate RF signals.

Assignments (2)
CONFIRMATORY LICENSE Recorded Jan 11, 2012
From: RAYTHEON COMPANY
To: AFRL/RIJ
Reel/Frame 027519/0088 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 16, 2010
From: VISCARRA, ALBERTO F.; WINSLOW, DAVID T.; ABLES, BILLY D.; KETOLA, KURT S.; KRAUSE, KURT J.; ROLSTON, KEVIN C.; SAUER, ROHN; CHOW, JAMES
To: RAYTHEON COMPANY
Reel/Frame 024089/0350 →
Continuity (1)
Related Publication 20110113619A1 · May 19, 2011