Method of forming a tantalum-containing layer on a substrate
A method for forming a tantalum-containing layer on a substrate, the method comprising at least the steps of: a) providing a vapor comprising at least one precursor compound of the formula Cp(R 1 ) m Ta(NR 2 2 ) 2 (═NR 3 ) (I): wherein: R 1 is an organic ligand, each one independently selected in the group consisting of H, linear or branched hydrocarbyl radical comprising from 1 to 6 carbon atoms; R 2 is an organic ligand, each one independently selected in the group consisting of H, linear or branched hydrocarbyl radical comprising from 1 to 6 carbon atoms; R 3 is an organic ligand selected in the group consisting of H, linear or branched hydrocarbyl radical comprising from 1 to 6 carbon atoms; b) reacting the vapor comprising the at least one compound of formula (I) with the substrate, according to an atomic layer deposition process, to form a layer of a tantalum-containing complex on at least one surface of said substrate.
1. A method for forming a tantalum-containing layer on a substrate, the method comprising at least the steps of:
a) providing a vapor comprising at least one precursor compound selected from the group consisting of (Cp)Ta(=NtBu)(NEt 2 ) 2 and (Cp)Ta(=NtBu)(NMe 2 ) 2 ;
b) reacting the vapor comprising the at least one precursor compound with the substrate, in an atomic layer deposition process, to form a layer of a tantalum-containing complex on at least one surface of said substrate, wherein the temperature of the substrate is 315° C. to 390° C.;
c) reacting the tantalum-containing complex obtained in step b) with ozone.
2. The method of claim 1 , wherein the vapor provided in step a) further comprises one or more metal (M′)-organic precursor(s) to produce thin films containing tantalum and M′.
3. The method of claim 1 , wherein the precursor compound is (Cp)Ta(=NtBu)(NEt 2 ) 2 .
4. The method of claim 3 , wherein the atomic layer deposition process comprises a process pressure of 0.133 Pa to 133 kPa.
5. The method of claim 3 , wherein the atomic layer deposition process comprises a process pressure below 27 kPa.
6. The method of claim 1 , further comprising the step of purging excess vapor comprising the at least one precursor compound from the substrate with an inert gas selected from the group consisting of hydrogen, nitrogen, helium, argon, and mixtures thereof.
7. A method of manufacturing a semiconductor structure, comprising the steps of the method of claim 1 , wherein the substrate is a semiconductor substrate.
8. The method of claim 1 , wherein the precursor compound is (Cp)Ta(=NtBu)(NMe 2 ) 2 .
9. The method of claim 3 , wherein the atomic layer deposition process does not utilize plasma.
10. The method of claim 8 , wherein the atomic layer deposition process does not utilize plasma.
11. A method for forming a tantalum-containing layer on a substrate, the method comprising at least the steps of:
a) reacting a vapor of a precursor compound selected from the group consisting of (Cp)Ta(=NtBu)(NEt 2 ) 2 and (Cp)Ta(=NtBu)(NMe 2 ) 2 with the substrate, in an atomic layer deposition process, to form a layer of a tantalum-containing complex on at least one surface of said substrate, wherein the temperature of the substrate is 315° C. to 390° C.;
b) reacting the tantalum-containing complex obtained in step b) with ozone, wherein the atomic layer deposition process does not utilize plasma.
12. The method of claim 11 , wherein the vapor provided in step a) further comprises one or more metal (M′)-organic precursor(s) to produce thin films containing tantalum and M′.
13. The method of claim 11 , wherein the precursor compound is (Cp)Ta(=NtBu)(NEt 2 ) 2 .
14. The method of claim 11 , wherein the precursor compound is (Cp)Ta(=NtBu)(NMe 2 ) 2 .
15. The method of claim 11 , wherein the atomic layer deposition process comprises a process pressure of 0.133 Pa to 133 kPa.
16. The method of claim 11 , further comprising the step of purging excess vapor of the precursor compound from the substrate with an inert gas selected from the group consisting of hydrogen, nitrogen, helium, argon, and mixtures thereof.