Method of manufacturing solid-state imaging device and solid-state imaging device
According to one embodiment, a method of manufacturing a solid-state imaging device includes a trench forming process, a concave portion forming process, a coating process, and a burying process. In the trench forming process, a trench is formed at the position to isolate a plurality of photoelectric conversion elements. In the concave portion forming process, a concave portion is formed at the position to form a light shielding film of shielding at least part of subject light incident on an adjustment photoelectric conversion element used for an image quality adjustment of an imaged image. In the coating process, inner circumferential surfaces of the trench and the concave portion are coated with an insulating film. In the burying process, a light shielding member is buried inside the trench and the concave portion whose inner circumferential surface are coated with the insulating film.
1. A method of manufacturing a solid-state imaging device, comprising:
forming a trench at a position to isolate a plurality of photoelectric conversion elements including an imaging photoelectric conversion element used for imaging of an image and an adjustment photoelectric conversion element used for an image quality adjustment of an imaged image;
forming a concave portion at a position to form a light shielding film that shields at least part of subject light incident to the adjustment photoelectric conversion element;
coating inner circumferential surfaces of the trench and the concave portion with an insulating film; and
burying a light shielding member inside the trench and the concave portion whose inner circumferential surfaces are coated with the insulating film;
wherein the concave portion is formed such that an
aperture plane is one-sided in a predetermined direction with respect to the light receiving surface of the adjustment photoelectric conversion element used for a focus adjustment by a phase difference detection scheme; and
wherein the concave portion is formed at a position to form a light shielding film that shields diagonal half of the light receiving surface of the adjustment photoelectric conversion element.
2. The method according to claim 1 ,
wherein the concave portion is formed such that a bottom surface of the concave portion is positioned at a subject light incident side rather than a light receiving surface in the adjustment photoelectric conversion element.
3. The method according to claim 1 ,
wherein the trench and the concave portion are simultaneously formed and have the same depth.
4. The method according to claim 1 ,
wherein the insulating film is formed using an ALD (Atomic Layer Deposition) technique.
5. The method according to claim 1 ,
wherein the light shielding member is made of any one of aluminum (Al), tungsten (W), and copper (Cu).
6. The method according to claim 1 ,
wherein the concave portion is formed such that a bottom surface of the concave portion reaches a light receiving surface of the adjustment photoelectric conversion element.
7. The method according to claim 1 ,
wherein the concave portion is formed at a position to form the light shielding film that shields the whole light receiving surface of the adjustment photoelectric conversion element used for an optical black.
8. The method according to claim 1 ,
wherein the solid-state imaging device is a back-illuminated image sensor.