Glass substrate for information recording medium, information recording medium and method of manufacturing glass substrate for information recording medium
For the purpose of providing a glass substrate for an information recording medium capable of acquiring a low GA value, provided is the glass substrate for an information recording medium, wherein a surface of the glass substrate has an arithmetic mean undulation Wa of less than 0.6 nm, and a fine undulation having a root-mean-square height Rq of less than 0.01 nm at a measurement wavelength of 80-120μm in a radial direction.
1. A glass substrate for an information recording medium, wherein a surface of the glass substrate has an arithmetic mean undulation Wa that is less than 0.55 nm at a measurement wavelength of 0.1-5 mm, and a fine undulation has a root-mean-square height Rq of less than 0.007 nm at a measurement wavelength of 80-120 μm in a radial direction.
2. An information recording medium comprising:
a glass substrate for an information recording medium, wherein a surface of the glass substrate has an arithmetic mean undulation Wa that is less than 0.55 nm at a measurement wavelength of 0.1-5 mm, and a fine undulation has a root-mean-square height Rq of less than 0.007 nm at a measurement wavelength of 80-120 μm in a radial direction; and
a magnetic film provided on the glass substrate.
3. A method of manufacturing a glass substrate for an information recording medium, comprising :
polishing at not more than 600 kg/m 2 as a load applied to the glass substrate from a platen of a polishing machine and at not more than 10 rpm as the number of rotations of the platen,
wherein an entire surface of the glass substrate after the foregoing polishing has, throughout an entire radial direction of the glass substrate, an arithmetic mean undulation Wa in the radial direction of less than 0.6 nm at a measurement wavelength of 0.1-5 mm, and, throughout the entire radial direction, a fine undulation in the radial direction having a root-mean-square height Rq of less than 0.01 nm at a measurement wavelength of 80-120 μm, wherein the arithmetic mean undulation Wa is less than 0.55 nm, and the fine undulation has a root-mean-square height Rq of less than 0.007 nm.