Solid state imaging device that includes a color filter and an interlayer dielectric layer on opposite sides of a semiconductor substrate

1. A solid state imaging device comprising:

a semiconductor substrate having an element isolating layer and a plurality of photoelectric conversion elements each formed in a respective one of a plurality of pixel regions that are isolated from each other by the element isolating layer;

an interlayer dielectric layer that has wires and is formed on a first surface of the semiconductor substrate; and

a color filter layer having pigmented films of a plurality of colors, which are formed on a second surface of the semiconductor substrate that is opposite to the first surface,

wherein the element isolating layer has a part projecting from the second surface, and

wherein at least part of the pigmented films is formed in a space defined by the second surface and the projecting part of the element isolating layer.

2. The solid state imaging device according to claim 1 , wherein

a dimension of the projecting part in a direction perpendicular to the second surface is smaller than a dimension of the pigmented film in a direction perpendicular to the second surface.

3. The solid state imaging device according to claim 1 , wherein the pigmented films each include,

a lower part formed in the space that is formed by the second surface of the semiconductor substrate and the projecting part of the element isolating layer, and

an upper part formed on the lower part and above the element isolating layer.

4. The solid state imaging device according to claim 1 , further comprising:

a plurality of micro-lenses each formed above the color filter for a respective one of the photoelectric conversion elements.

5. The solid state imaging device according to claim 1 , wherein

the element isolating layer comprises a peripheral part that is in contact with the semiconductor substrate and an inner part that is separated from the semiconductor substrate by the peripheral part, and

the material of the peripheral part is different from the material of the inner part.

6. The solid state imaging device according to claim 5 , wherein the peripheral part is comprised of titanium nitride.

7. The solid state imaging device according to claim 5 , wherein

the inner part is comprised of an electrically conductive material.

8. The solid state imaging device according to claim 1 , wherein

the element isolating layer comprises a lower part that is in contact with the interlayer dielectric layer and an upper part that is formed on the lower part, and

the lower part is comprised of a doped semiconductor or an insulating material.

9. The solid state imaging device according to claim 1 , wherein

the element isolating layer has a cavity therein.

10. The solid state imaging device according to claim 1 implemented in a camera as an image sensor that converts light from a subject to electric signals, the camera including:

a lens unit that concentrates the light from the subject to the image sensor;

a signal processing unit that processes signals output from the image sensor;

a memory unit that stores image data provided from the signal processing unit;

a display unit that displays the image data from the signal processing unit and the memory unit; and

a control unit that controls the behavior of the image sensor, the lens unit, the signal processing unit, the memory unit, and the display unit.

11. A solid state imaging device comprising:

a semiconductor substrate having an element isolating layer and a plurality of photoelectric conversion elements each formed in a respective one of a plurality of pixel regions that are isolated from each other by the element isolating layer;

an interlayer dielectric layer that has wires and is formed on a first surface of the semiconductor substrate; and

a color filter layer having pigmented films of a plurality of colors, which are formed on a second surface of the semiconductor substrate that is opposite to the first surface,

wherein the element isolating layer has a projecting part that extends above the second surface of the semiconductor surface, and a dimension of the projecting part in a direction perpendicular to the second surface is smaller than a dimension of the pigmented films in the direction perpendicular to the second surface.

12. The solid state imaging device according to claim 11 , wherein the pigmented films each include,

a lower part formed in the space that is formed by the second surface of the semiconductor substrate and the projecting part of the element isolating layer, and

an upper part formed on the lower part and above the element isolating layer.

13. The solid state imaging device according to claim 11 , further comprising:

a plurality of micro-lenses each formed above the color filter for a respective one of the photoelectric conversion elements.

14. The solid state imaging device according to claim 11 , wherein

the element isolating layer comprises a peripheral part that is in contact with the semiconductor substrate and an inner part that is separated from the semiconductor substrate by the peripheral part, and

the material of the peripheral part is different from the material of the inner part.

15. The solid state imaging device according to claim 11 , wherein

the element isolating layer comprises a lower part that is in contact with the interlayer dielectric layer and an upper part that is formed on the lower part, and

the lower part is comprised of a doped semiconductor or an insulating material.