Thin-film transistor
A thin film transistor ( 1 ) includes a source electrode ( 50 ), a drain electrode ( 60 ), a gate electrode ( 20 ), a gate insulating film ( 30 ), and a channel layer ( 40 ) that is formed of an oxide semiconductor, the channel layer ( 40 ) having an average carrier concentration of 1×10 16 /cm 3 to 5×10 19 /cm 3 , and including a high carrier concentration region ( 42 ) that is situated on the side of the gate insulating film ( 30 ) and has a carrier concentration higher than the average carrier concentration, and the channel layer ( 40 ) having a substantially homogenous composition.
1. A thin film transistor comprising a source electrode, a drain electrode, a gate electrode, a gate insulating film, and a channel layer that is formed of an oxide semiconductor comprising a bixbyite-type crystal structure,
the channel layer having an average carrier concentration of 1×10 16 /cm 3 to 5×10 19 /cm 3 , and comprising a high carrier concentration region that is situated on a side of the gate insulating film and has a carrier concentration higher than the average carrier concentration, and
the channel layer having a substantially homogeneous composition,
wherein a field-effect mobility of the thin film transistor is 40 cm 2 /Vs or more.
2. The thin film transistor according to claim 1 ,
wherein the channel layer has a thickness of 10 nm or more, and the high carrier concentration region has an average carrier concentration of 1×10 18 /cm 3 to 5×10 21 /cm 3 .
3. The thin film transistor according to claim 1 ,
wherein the high carrier concentration region is a region of the channel layer up to a depth of 5 nm from an interface with the gate insulating film.
4. The thin film transistor according to claim 1 ,
wherein the oxide semiconductor is indium oxide, Ga-doped indium oxide, Al-doped indium oxide, Ga—Al-doped indium oxide, Zn-doped indium oxide, or Sn-doped indium oxide.
5. The thin film transistor according to claim 4 ,
wherein the Ga-doped indium oxide has an atomic ratio “Ga/(Ga+In)” of 0.007 to 0.207.
6. The thin film transistor according to claim 4 ,
wherein the Al-doped indium oxide has an atomic ratio “Al/(Al+In)” of 0.003 to 0.125.
7. The thin film transistor according to claim 1 , the thin film transistor having a bottom-gate structure.
8. The thin film transistor according to claim 7 , further comprising a protective layer that is formed on the channel layer.
9. The thin film transistor according to claim 8 ,
wherein the protective layer is an insulating film having oxygen permeability.
10. The thin film transistor according to claim 1 , the thin film transistor having a top-gate structure.