Dynamic electrode plasma system

1. A system for processing a substrate comprising:

a plasma chamber to generate a plasma therein;

a process chamber to house the substrate, the process chamber adjacent the plasma chamber; and

a rotatable extraction electrode disposed between the plasma chamber and substrate, the rotatable extraction electrode configured to extract an ion beam from the plasma, and configured to scan the ion beam over the substrate without movement of the substrate by rotation about an extraction electrode axis, wherein the rotatable extraction electrode comprises an elongated extraction aperture having a width along a first direction parallel to the rotation axis and a height along a second direction perpendicular to the first direction, the width being larger than the height.

2. The system of claim 1 , wherein the process chamber has a chamber wall defining a chamber wall surface adjacent the plasma chamber, the extraction electrode axis being parallel to the chamber wall surface.

3. The system of claim 1 , wherein the rotatable extraction electrode comprises a cylinder structure.

4. The system of claim 1 further comprising a rotatable substrate stage comprising:

a substrate platen to support the substrate on a first surface;

a radial portion connected to the platen on a second surface;

and a rotation member connected to the radial portion, wherein the rotatable substrate stage is configured to move the substrate from a load position to a process position via rotation of the rotation member.

5. The system of claim 1 , further comprising a substrate platen, a pivot connected to the substrate platen and having a pivot axis parallel to the extraction electrode axis, and a drive coupled to the pivot, the drive configured to generate a tilt of the substrate about the pivot axis.

6. The system of claim 5 , further comprising a rotation synchronizer configured to generate signals to synchronize the tilt of the substrate with rotation of the rotatable extraction electrode, wherein the rotatable extraction electrode is configured during rotation about the extraction electrode axis to scan the ion beam over the substrate without changing an angle of incidence of the ion beam with respect to a surface of the substrate.

7. The system of claim 6 , wherein the ion beam comprises ions having trajectories distributed over a range of angles of incidence with respect to a surface of the substrate, wherein the range of angles of incidence with respect to the surface of the substrate does not vary during the rotation about the extraction electrode axis.

8. The system of claim 5 , wherein the rotatable extraction electrode comprising an elongated extraction aperture having a long direction parallel to the extraction electrode axis, the system further comprising a cam configured to rotate on the extraction electrode axis and coupled to the rotatable extraction electrode, wherein a closest distance between the extraction aperture and substrate is constant during rotation about the extraction electrode axis.

9. The system of claim 1 , wherein the rotatable extraction electrode comprises a plurality of apertures.

10. The system of claim 1 , wherein the rotatable extraction electrode comprises at least one additional elongated extraction aperture.

11. The system of claim 10 , wherein the rotatable extraction electrode comprises a plurality of elongated extraction apertures spaced along the first direction.

12. The system of claim 10 , wherein the rotatable extraction electrode comprises a plurality of elongated extraction apertures spaced along the second direction.