Semiconductor device and method for manufacturing the same
View Patent ↗Many of the physical properties of a silicon semiconductor have already been understood, whereas many of the physical properties of an oxide semiconductor have been still unclear. In particular, an adverse effect of an impurity on an oxide semiconductor has been still unclear. In view of the above, a structure is disclosed in which an impurity that influences electrical characteristics of a semiconductor device including an oxide semiconductor layer is prevented or is eliminated. A semiconductor device which includes a gate electrode, an oxide semiconductor layer, and a gate insulating layer provided between the gate electrode and the oxide semiconductor layer and in which the nitrogen concentration in the oxide semiconductor layer is 1×10 20 atoms/cm 3 or less is provided.
1. A method for manufacturing a semiconductor device comprising a gate electrode, an oxide semiconductor layer, a gate insulating layer provided between the gate electrode and the oxide semiconductor layer, and an insulating layer in contact with the oxide semiconductor layer, the method comprising the steps of:
performing a first heat treatment on the oxide semiconductor layer having a nitrogen concentration of 1×10 20 atoms/cm 3 or less at 350° C. or higher for 1 hour or more, and
performing a second heat treatment on the oxide semiconductor layer so that oxygen in the insulating layer is supplied to the oxide semiconductor layer.
2. The method for manufacturing a semiconductor device according to claim 1 , wherein the oxide semiconductor layer comprises indium, gallium, and zinc.
3. The method for manufacturing a semiconductor device according to claim 1 , wherein the first heat treatment is performed under an atmosphere containing nitrogen.
4. The method for manufacturing a semiconductor device according to claim 1 , wherein the second heat treatment is performed at higher than or equal to 150° C. and lower than or equal to 500° C.
5. A method for manufacturing a semiconductor device comprising a gate electrode, an oxide semiconductor layer, a gate insulating layer provided between the gate electrode and the oxide semiconductor layer, and an insulating layer in contact with the oxide semiconductor layer, the method comprising the steps of:
performing a first heat treatment on the oxide semiconductor layer having a nitrogen concentration of 1×10 20 atoms/cm 3 or less at 450° C. or higher for 1 hour or more, and
performing a second heat treatment on the oxide semiconductor layer so that oxygen in the insulating layer is supplied to the oxide semiconductor layer.
6. The method for manufacturing a semiconductor device according to claim 5 , wherein the oxide semiconductor layer comprises indium, gallium, and zinc.
7. The method for manufacturing a semiconductor device according to claim 5 , wherein the first heat treatment is performed under an atmosphere containing nitrogen.
8. The method for manufacturing a semiconductor device according to claim 5 , wherein the second heat treatment is performed at higher than or equal to 150° C. and lower than or equal to 500° C.
9. A method for manufacturing a semiconductor device comprising a gate electrode, an oxide semiconductor layer, a gate insulating layer provided between the gate electrode and the oxide semiconductor layer, and an insulating layer in contact with the oxide semiconductor layer, the method comprising the steps of:
performing a first heat treatment on the oxide semiconductor layer having a nitrogen concentration of 1×10 20 atoms/cm 3 or less at 550° C. or higher for 1 hour or more, and
performing a second heat treatment on the oxide semiconductor layer so that oxygen in the insulating layer is supplied to the oxide semiconductor layer.
10. The method for manufacturing a semiconductor device according to claim 9 , wherein the oxide semiconductor layer comprises indium, gallium, and zinc.
11. The method for manufacturing a semiconductor device according to claim 9 , wherein the first heat treatment is performed under an atmosphere containing nitrogen.
12. The method for manufacturing a semiconductor device according to claim 9 , wherein the second heat treatment is performed at higher than or equal to 150° C. and lower than or equal to 500° C.
13. A method for manufacturing a semiconductor device comprising a gate electrode, an oxide semiconductor layer, a gate insulating layer provided between the gate electrode and the oxide semiconductor layer, and an insulating layer in contact with the oxide semiconductor layer, the method comprising the steps of:
performing a first heat treatment on the oxide semiconductor layer having a nitrogen concentration of 1×10 20 atoms/cm 3 or less at 650° C. or higher for 3 minutes or more, and
performing a second heat treatment on the oxide semiconductor layer so that oxygen in the insulating layer is supplied to the oxide semiconductor layer.
14. The method for manufacturing a semiconductor device according to claim 13 , wherein the oxide semiconductor layer comprises indium, gallium, and zinc.
15. The method for manufacturing a semiconductor device according to claim 13 , wherein the first heat treatment is performed under an atmosphere containing nitrogen.
16. The method for manufacturing a semiconductor device according to claim 13 , wherein the second heat treatment is performed at higher than or equal to 150° C. and lower than or equal to 500° C.