IP Library › Granted Patent US 9,220,162
Granted Patent B2
US 9,220,162 · App. 13/371,997 · Granted Dec 22, 2015

Plasma generating apparatus and plasma generating method

Inventors: Kazutoshi Takenoshita (Yokohama, JP); Makoto Miyamoto (Yokohama, JP); Seiro Yuge (Yokohama, JP); Yukika Yamada (Yokohama, JP); Yoko Nakayama (Yokohama, JP); Yuki Kumagai (Yokohama, JP)
Assignee: SAMSUNG ELECTRONICS CO., LTD.
H05H1/2406H05H2001/2412H05H2245/1225
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Quick Facts
Patent No.
US 9,220,162
App. No.
13/371,997
Granted
Dec 22, 2015
Kind
B2
Abstract

Generated amount of active species is increased, and dew formation or moisture attachment hardly occurs on a dielectric layer. A plasma generating apparatus including a pair of electrodes, wherein a dielectric layer is arranged on at least one of surfaces of the electrodes facing each other, plasma discharge occurs as a predetermined voltage is applied to the electrodes, and a coating film is arranged on a surface of the dielectric layer.

Claims (49)

1. A plasma generating apparatus comprising:

a pair of electrodes having surfaces facing each other;

a dielectric layer disposed between the pair of electrodes and comprising a first surface and a second surface, the first surface of the dielectric layer being arranged on at least one of the surfaces facing each other; and

a coating film arranged on the second surface of the dielectric layer, the coating film configured to prevent condensation and moisture attachment on the dielectric layer,

wherein plasma discharge occurs as a predetermined voltage is applied to the pair of electrodes.

2. The plasma generating apparatus of claim 1 , wherein the dielectric layer is formed using a thermal spraying method.

3. The plasma generating apparatus of claim 1 , wherein the coating film is water-repellent.

4. The plasma generating apparatus of claim 1 , wherein a thickness of the coating film is from about 0.01 μm to about 100 μm.

5. The plasma generating apparatus of claim 1 , further comprising:

a spacer having a thickness of about 500 μm or less, which is arranged between the pair of electrodes.

6. The plasma generating apparatus of claim 5 , wherein the spacer is formed using a thermal spraying method.

7. The plasma generating apparatus of claim 5 , wherein the coating film is arranged on a surface of the spacer.

8. The plasma generating apparatus of claim 1 , further comprising a heating element arranged at least one of the pair of electrodes or the dielectric layer.

9. The plasma generating apparatus of claim 8 , wherein the heating element is arranged in at least one of the pair of electrodes.

10. The plasma generating apparatus of claim 8 , wherein the heating element is arranged between the electrode and the dielectric layer.

11. The plasma generating apparatus of claim 8 , wherein the heating element is arranged in the dielectric layer.

12. The plasma generating apparatus of claim 8 , wherein the heating element is formed on a portion of at least one of the first surface and the second surface of the dielectric layer.

13. The plasma generating apparatus of claim 8 , wherein a heating temperature of the heating element is about 150° C. or less.

14. The plasma generating apparatus of claim 1 , further comprising: a casing which supports the pair of electrodes, and a heating element for heating the electrode or the dielectric layer is formed at the casing.

15. The plasma generating apparatus of claim 14 , wherein a heating temperature of the heating element is about 1500° C. or less.

16. The plasma generating apparatus of claim 1 , further comprising: a casing supporting the pair of electrodes, the casing opens lateral openings formed between the pair of electrodes at least partially; and a plurality of fluid flowing holes are formed in each of the pair of electrodes, wherein the location of the fluid flowing holes corresponds to each other to penetrate through the electrodes.

17. The plasma generating apparatus of claim 16 , wherein the casing comprises a wall unit facing the lateral opening, and a gas flow path is formed between the lateral opening and the wall unit.

18. The plasma generating apparatus of claim 17 , wherein a penetration hole communicating with the lateral opening is formed in the casing, and the gas flow path is formed by the penetration hole.

19. The plasma generating apparatus of claim 16 , further comprising an air- blowing mechanism, which is arranged at the leading ends or the rear ends of the pair of electrodes to provide air to the lateral opening.

20. A plasma generating apparatus comprising:

a pair of electrodes having surfaces facing each other;

a dielectric layer disposed between the pair of electrodes and comprising a first surface and a second surface, the first surface of the dielectric layer being arranged on at least one of the surfaces facing each other;

a heating element to heat the second surface of the dielectric layer, the heating element arranged to contact the dielectric layer,

wherein plasma discharge occurs as a predetermined voltage is applied at the pair of electrodes, and wherein the heating element is electrically insulated from the pair of electrodes.

21. The plasma generating apparatus of claim 20 , wherein the heating element is arranged in each of the pair of electrodes.

22. The plasma generating apparatus of claim 20 , wherein the heating element is arranged between each of the electrodes and the dielectric layer.

23. The plasma generating apparatus of claim 20 , wherein the heating element is arranged in the dielectric layer.

24. The plasma generating apparatus of claim 20 , wherein the heating element is formed on a portion of surfaces of the dielectric layer.

25. The plasma generating apparatus of claim 20 , wherein a heating temperature of the heating element is about to 150° C. or less.

26. The plasma generating apparatus of claim 20 , wherein a coating film is arranged on a surface of the dielectric layer.

27. The plasma generating apparatus of claim 26 , wherein the coating film is water-repellent.

28. The plasma generating apparatus of claim 26 , wherein a thickness of the coating film is from about 0.01 μm to about 100 μm.

29. The plasma generating apparatus of claim 20 , further comprising a spacer, which is arranged between the pair of electrodes and has a thickness smaller than or equal to 500 μm.

30. A method of generating plasma comprising:

preparing a pair of electrodes having surfaces facing each other, wherein a dielectric layer is disposed between the pair of electrodes and comprises a first surface and a second surface, the first surface of the dielectric layer is arranged on at least one of the surfaces facing each other;

applying a predetermined voltage to the pair of electrodes to occur plasma discharge;

heating the second surface of the dielectric layer by using a heating element, the heating element to contact the dielectric layer,

wherein the heating element is electrically insulated from the pair of electrodes.

31. A method of generating plasma comprising:

preparing a pair of electrodes, wherein a dielectric layer is arranged on at least one of surfaces of the electrodes facing each other;

applying a predetermined voltage to the pair of electrodes to generate the plasma; and

heating the pair of electrodes by applying voltage greater than the predetermined voltage to the pair of electrodes to heat the dielectric layer.

32. The plasma generating apparatus of claim 1 , further comprising a metal mesh acting as an anti-explosion safety mechanism.

33. The plasma generating apparatus of claim 20 , further comprising a metal mesh acting as an anti-explosion safety mechanism.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 14, 2012
From: TAKENOSHITA, KAZUTOSHI; MIYAMOTO, MAKOTO; YUGE, SEIRO; YAMADA, YUKIKA; NAKAYAMA, YOKO; KUMAGAI, YUKII
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 027824/0358 →
Priority Claims (4)
JP 2011-052233 · Mar 9, 2011 · national
JP 2011-052234 · Mar 9, 2011 · national
JP 2011-093103 · Apr 19, 2011 · national
KR 10-2011-0109432 · Oct 25, 2011 · national
Continuity (1)
Related Publication 20120229029A1 · Sep 13, 2012