Low-VOC cleaning substrates and compositions consisting of a solvent mixture
A cleaning composition for sanitizing and/or disinfecting hard surfaces, comprising: a cationic biocide, surfactant and low levels of VOC solvents. The cleaning composition is adapted to clean a variety of hard surfaces without leaving behind a visible residue and creates low levels of streaking and filming on the treated surface. The cleaning composition contains less than 5% by weight of VOCs. The cleaning composition may be used alone as a liquid or spray formulation or in combination with a substrate, for example, a pre-loaded cleaning wipe.
1. A cleaning substrate comprising:
a. a substrate;
b. a cleaning composition, loaded onto said substrate, consisting of:
i. about 0.05-5% by weight of one or more cationic biocides,
ii. about 0.01-5% by weight of one or more surfactants selected form the group consisting of: anionic surfactants and zwitterionic surfactants and any combinations thereof,
iii. a first solvent comprising a glycol ether,
iv. a second solvent selected form the group consisting of: methanol, ethanol, isopropanol, propanol, butyl alcohol, sec-butyl alcohol, isobutyl alcohol, tert-butyl alcohol, pentyl alcohol, tert-pentyl alcohol, 2-pentanol, 3-pentanol, neopentyl alcohol, allyl, crotyl, methylvinyl-carbinol, ethyl ether, -propyl ether, isopropyl ether, -butyl ether, vinyl ether, allyl ether, polyalkylene glycols, short chain carboxylic acids, short chain esters, water, and any mixtures or combinations thereof; and
v. optionally, one or more adjuncts selected from the group consisting of: buffers, fragrances, solvents, perfumes, builders, stabilizers, defoamers, thickeners, hydrotropes, biocide release agents, anti-microbial compounds, enzymes, bleaching agents, cloud point modifiers, and preservatives.
2. The cleaning substrate as defined in claim 1 , wherein the composition comprises a preservative.
3. The cleaning substrate as defined in claim 1 , wherein said one or more cationic biocides includes a quaternary ammonium compound.
4. The cleaning substrate as defined in claim 3 , wherein said quaternary ammonium compound is selected from the group consisting of: benzethonium chloride, benzalkonium chloride, methylbenzethonium chloride, and any combinations or mixtures thereof.
5. The cleaning substrate as defined in claim 1 , wherein said second solvent comprises a polyalkylene glycol.
6. The cleaning substrate as defined in claim 1 , wherein said one or more surfactants is selected from the group consisting of: alkylbenzene sulfonates, olefin sulfonates, paraffin sulfonates, alcohol and alcohol ether sulfates, alkyl sulfates, alkyl ether sulfates, sarcosinates, sulfoacetates, sulfosuccinates, phenol poly ether sulfates, napthosulfonates, carboxylic acid salts, salts of higher alkyl substituted imadazolinium dicarboxylic acids, alkylamine ethoxylates, ethylenediamine alkoxylates, betaines, sulfobetaines, imidazolines, and any mixtures or combinations thereof.
7. The cleaning substrate as defined in claim 1 , wherein said first solvent comprises a C3-24 alkylene glycol ether.
8. The cleaning substrate as defined in claim 1 , wherein said second solvent is selected from the group consisting of: ethanol, isopropanol, n-propanol, butanol, and any mixtures or combinations thereof.
9. A cleaning substrate comprising:
a. a substrate;
b. a cleaning composition, loaded onto said substrate, consisting of:
i. about 0.05-5% by weight of one or more quaternary ammonium compounds,
ii. about 0.01-5% by weight of one or more surfactants selected form the group consisting of: anionic surfactants and zwitterionic surfactants and any combinations thereof, and
iii. about 0.05-5% by weight of a first solvent comprising a glycol ether,
iv. a second solvent selected form the group consisting of: ethanol, isopropanol, n-propanol, butanol, polyalkylene glycols, short chain carboxylic acid, water, and any mixtures or combinations thereof; and
v. optionally, one or more adjuncts selected from the group consisting of: fragrances, perfumes, buffers, solvents, builders, stabilizers, defoamers, thickeners, hydrotropes, biocide release agents, water, anti-microbial compounds, enzymes, bleaching agents, cloud point modifiers, and preservatives.
10. The cleaning substrate as defined in claim 9 , wherein the composition comprises a preservative.
11. The cleaning substrate as defined in claim 9 , wherein said one or more quaternary ammonium compounds is selected from the group consisting of: benzethonium chloride, benzalkonium chloride, methylbenzethonium chloride, and any combinations or mixtures thereof.
12. The cleaning substrate as defined in claim 9 , wherein said one or more surfactants is selected from the group consisting of: lauryl sulfate, lauryl ether sulfate, betaines, and any combinations or mixtures thereof.
13. The cleaning composition as defined in claim 9 , wherein said second solvent is selected from the group consisting of: ethanol, isopropanol, n-propanol, butanol, and any mixtures or combinations thereof.
14. The cleaning composition as defined in claim 9 , wherein said second solvent comprises propylene glycol.
15. A cleaning composition consisting of:
i. about 0.05-5% by weight of one or more cationic biocides,
ii. about 0.01-5% by weight of one or more surfactants selected form the group consisting of: anionic surfactants and zwitterionic surfactants and any combinations thereof,
iii. about 0.05-5% by weight of a first solvent comprising a glycol ether,
iv. about 0.01-2% by weight of a second solvent selected form the group consisting of: ethanol, isopropanol, n-propanol, butanol, polyalkylene glycols, short chain carboxylic acids and any mixtures or combinations thereof;
v. at least about 70% by weight of water; and
vi. optionally, one or more adjuncts selected from the group consisting of: fragrances, perfumes, builders, stabilizers, solvents, defoamers, thickeners, hydrotropes, biocide release agents, anti-microbial compounds, enzymes, bleaching agents, cloud point modifiers, and preservatives.
16. The cleaning composition as defined in claim 15 , wherein said one or more cationic biocides includes a quaternary ammonium compound.
17. The cleaning composition as defined in claim 15 , wherein said one or more surfactants is selected from the group consisting of: alcohol and alcohol ether sulfates, alkyl sulfates, alkyl ether sulfates, phenol poly ether sulfates, betaines, sulfobetaines and any mixtures or combinations thereof.
18. The cleaning composition as defined in claim 15 , wherein said one or more surfactants comprises a betaine.
19. The cleaning composition as defined in claim 15 , wherein said one or more surfactants is selected from the group consisting of: lauryl sulfate, lauryl ether sulfate, cocamidopropylbetaine, and any mixtures or combinations thereof.
20. The cleaning composition as defined in claim 15 , wherein said first solvent is selected from the group consisting of: diethyleneglycol methylether, diethyleneglycol ethylether, diethyleneglycol propylether, diethyleneglycol butylether, and any mixtures or combinations thereof.