Method of manufacturing a semiconductor integrated circuit device
The TSV technology has been popular as one of stacking technologies of a plurality of semiconductor chips. It has however been revealed by the present inventors that when TSV is formed using a so-called first via process, via middle process, front-via via last process, or the like, there is a possibility of defects such as gate breakdown occurring due to electrostatic breakdown in the subsequent process. In order to overcome the above problem, the present invention provides a method of manufacturing a semiconductor integrated circuit device, in which a through via electrode is formed by forming a hole in a semiconductor substrate, forming an insulating member in the hole, and burying a conductive member in the resulting hole while covering a portion of the hole except for the bottom portion with the insulating member.
1. A method of manufacturing a semiconductor integrated circuit device comprising:
preparing a semiconductor wafer having a device main surface and back surface;
forming, from the device main surface of the semiconductor wafer to a semiconductor surface region of the semiconductor wafer, a plurality of holes reaching the inside thereof;
forming an insulating film on the inner surface of the holes including the sides and the bottom portion of the holes; removing the insulating film at the bottom portion of the holes;
burying a conductive member in the holes while covering, with the insulating film, the inner surface of the holes except for the bottom portion thereof, and thereby forming a plurality of through via electrodes; and
after the operation of burying the conductive member in the holes but during a wafer process process, irradiating electron beams to the device main surface of the semiconductor wafer to test a conduction state of the through via electrodes.
2. The method of manufacturing a semiconductor integrated circuit device according to claim 1 , further comprising:
in the wafer process, electrically coupling at least one of the through via electrodes to a gate electrode.
3. The method of manufacturing a semiconductor integrated circuit device according to claim 2 ,
wherein the through via electrodes are formed using a via middle process.
4. The method of manufacturing a semiconductor integrated circuit device according to claim 3 ,
wherein the through via electrodes are buried in a step of forming a first-level wiring but at a timing different from that of burying the first-level wiring.
5. The method of manufacturing a semiconductor integrated circuit device according to claim 3 ,
wherein the through via electrodes are buried simultaneously with burying of a first-level wiring.
6. The method of manufacturing a semiconductor integrated circuit device according to claim 2 ,
wherein the through via electrodes are formed using a via last process.
7. The method of manufacturing a semiconductor integrated circuit device according to claim 6 ,
wherein the through via electrodes are formed during a step of forming uppermost-level wirings except for a pad layer.
8. The method of manufacturing a semiconductor integrated circuit device according to claim 7 ,
wherein at least one of the through via electrodes is electrically coupled to a pad through a wiring belonging to the pad layer.
9. The method of manufacturing a semiconductor integrated circuit device according to claim 2 ,
wherein the through via electrodes are formed using a via first process.
10. The method of manufacturing a semiconductor integrated circuit device according to claim 9 ,
wherein the burying of the through via electrodes is conducted in a gate electrode forming step but at a timing different from that of forming a gate electrode film.
11. The method of manufacturing a semiconductor integrated circuit device according to claim 9 ,
wherein the burying of the through via electrodes is conducted simultaneously with the formation of a gate electrode film.
12. The method of manufacturing a semiconductor integrated circuit device according to claim 9 ,
wherein the burying of the through via electrodes is conducted in a contact forming step but at a timing different from that of forming a contact plug.
13. The method of manufacturing a semiconductor integrated circuit device according to claim 9 ,
wherein the burying of the through via electrodes is conducted simultaneously with the formation of a contact plug.
14. The method of manufacturing a semiconductor integrated circuit device according to claim 2 ,
wherein the lower end of each of the through via electrodes and a semiconductor region in the vicinity thereof have therebetween a metal silicide layer.
15. The method of manufacturing a semiconductor integrated circuit device according to claim 2 , further comprising:
after the operation of burying the conductive member in the holes, subjecting the semiconductor wafer to film thinning treatment from the back surface side of the semiconductor wafer to expose the through via electrodes on the back surface side of the semiconductor wafer.
16. The method of manufacturing a semiconductor integrated circuit device according to claim 15 , further comprising :
after the operation of burying the conductive member in the holes, coupling the through via electrodes to a bump electrode provided on another semiconductor substrate.
17. A method of manufacturing a semiconductor integrated circuit device comprising the steps of:
(a) preparing a semiconductor wafer having a device main surface and back surface;
(b) forming, from the device main surface of the semiconductor wafer to a semiconductor surface region of the semiconductor wafer, a plurality of holes reaching the inside thereof;
(c) forming an insulating film on the inner surface of the holes;
(d) after the step (c), burying a conductive member in the holes while covering, with the insulating film, the inner surface of the holes except for the bottom portion thereof, and thereby forming a plurality of through via electrodes; and
(e) in a wafer process, electrically coupling at least one of the through via electrodes to a gate electrode,
wherein at least after the step (d), the semiconductor region in the vicinity of the lower end of each of the through via electrodes has a heavily doped region having the same conductivity type as that of a semiconductor region therearound and having a high impurity concentration.
18. A method of manufacturing a semiconductor integrated circuit device comprising the steps of:
(a) preparing a semiconductor wafer having a device main surface and back surface;
(b) forming, from the device main surface of the semiconductor wafer to a semiconductor surface region of the semiconductor wafer, a plurality of holes reaching the inside thereof;
(c) forming an insulating film on the inner surface of the holes;
(d) after the step (c), burying a conductive member in the holes while covering, with the insulating film, the inner surface of the holes except for the bottom portion thereof, and thereby forming a plurality of through via electrodes; and
(e) in a wafer process, electrically coupling at least one of the through via electrodes to a gate electrode,
wherein the through via electrodes have a barrier metal structure mainly with a titanium film as an outer layer and a titanium nitride film as an inner layer.