Semiconductor device with silicon layer containing carbon
A semiconductor device having an n channel MISFET formed on an SOI substrate including a support substrate, an insulating layer formed on the support substrate and a silicon layer formed on the insulating layer has the following structure. An impurity region for threshold adjustment is provided in the support substrate of a gate electrode so that the silicon layer contains carbon. The threshold value can be adjusted by the semiconductor region for threshold adjustment in this manner. Further, by providing the silicon layer containing carbon, even when the impurity of the semiconductor region for threshold adjustment is diffused to the silicon layer across the insulating layer, the impurity is inactivated by the carbon implanted into the silicon layer. As a result, the fluctuation of the transistor characteristics, for example, the fluctuation of the threshold voltage of the MISFET can be reduced.
1. A semiconductor device comprising:
a substrate having a semiconductor substrate, an insulating layer formed on the semiconductor substrate, and a semiconductor layer formed on the insulating layer and containing carbon;
a field effect transistor having a gate electrode formed on the semiconductor layer via a gate insulating film, source and drain regions formed in the semiconductor layer on both sides of the gate electrode, and a channel region formed in the semiconductor layer between the source and drain regions and containing carbon; and
a semiconductor region disposed in the semiconductor substrate below the gate electrode via the semiconductor layer and the insulating layer, the semiconductor region being below the insulating layer,
wherein an impurity concentration profile of a p type or n type impurity extends from the semiconductor region through the insulating layer and into the semiconductor layer, the impurity concentration profile having a maximum in the semiconductor region, and the p type or n type impurity in the semiconductor layer is inactivated by the carbon in the semiconductor layer.
2. The semiconductor device according to claim 1 ,
wherein the source and drain regions include an epitaxial layer formed on the semiconductor layer.
3. The semiconductor device according to claim 1 ,
wherein the source and drain regions are n type semiconductor regions.
4. The semiconductor device according to claim 1 ,
wherein the source and drain regions are p type semiconductor regions.