IP Library Granted Patent US 9,268,126
Granted Patent B2
US 9,268,126 · App. 13/395,636 · Granted Feb 23, 2016

Observation and analysis unit

Inventors: Martin Edelmann (Aalen, DE); Christian Thomas (Ellwangen, DE)
Assignee: Carl Zeiss Microscopy GmbH
G02B21/367G01N23/2252H01J37/228H01J37/165
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Quick Facts
Patent No.
US 9,268,126
App. No.
13/395,636
Granted
Feb 23, 2016
Kind
B2
Abstract

An observation and analysis unit that magnifies an image of a sample and further accomplishes the evaluation and analysis thereof. The observation and analysis unit includes a light-microscopic device designed for the magnified imaging and optical evaluation of the sample and a sample analyzer that analyzes selected regions of the sample. The sample analyzer includes an electron source from which an electron beam can be directed to a region of the sample selected by use of the light-microscopic device. The sample analyzer further includes an X-ray detector designed to detect X-ray radiation generated by the interaction of the electron beam with the sample material. The unit further includes an actuation and evaluation unit that generates control commands for the light-microscopic device and the electron source and spectrally analyzes the X-ray radiation.

Claims (33)

1. An observation and analysis unit, comprising:

a light-microscopical device, designed for magnified imaging and optical evaluation of a sample;

an analyzer that analyzes selected regions of the sample including:

an electron beam source that directs an electron beam to a region of the sample selected by application of the light-microscopical device;

an X-ray detector, that detects X-ray radiation generated by interaction of the electron beam with material of the sample;

an actuation and evaluation unit, that generates control commands for the light-microscopical device, the electron source and/or a sample positioning structure, and that spectrally analyzes the X-ray radiation;

a shielding that prevents propagation of the X-ray radiation that is hazardous to persons, wherein the shielding encloses the electron beam source, the X-ray detector, and the sample;

a structure for feeding a non-air gas to a space between the sample and the electron beam source within the shielding;

wherein the sample is surrounded by a gas below or near atmospheric pressure, during analysis by application of the electron beam source and the X-ray detector; and

the light-microscopical unit further comprising a revolving objective nosepiece, wherein the electron source is integrated into the revolving objective nosepiece.

2. The observation and analysis unit as claimed in claim 1 , further comprising a control device that moves the sample relative to an observation ray path of the light-microscopical unit, the electron beam and/or the X-ray detector.

3. The observation and analysis unit as claimed in claim 2 , in which the control device is operably connected with the actuation and evaluation unit.

4. The observation and analysis unit as claimed in claim 1 , wherein the non-air gas comprises helium.

5. The observation and analysis unit as claimed in claim 1 wherein the shielding is gas-tight.

6. The observation and analysis unit as claimed in claim 5 , wherein the non-air gas comprises helium.

7. The observation and analysis unit as claimed in claim 1 , further comprising an electron beam focuser that focuses the electron beam on the selected region of the sample.

8. The observation and analysis unit as claimed in claim 1 , further comprising a tubule between the electron beam source and the sample, through which tubule the electron beam is directed to the sample.

9. The observation and analysis unit as claimed in claim 8 , further comprising structure that varies a distance between the sample and an electron beam outlet port at the tubule.

10. The observation and analysis unit as claimed in claim 1 , further comprising a shutter or filter, which, at least when the electron beam source is switched on, blocks a ray path of the light-microscopical unit to X-ray radiation, so that danger from the X-ray radiation during visual observation of the sample is inhibited.

11. The observation and analysis unit as claimed in claim 1 , further comprising an electron beam aligner that aligns the electron beam relative to the sample by directing a light beam in a visible wavelength range directed substantially parallel to a direction of the electron beam.

12. The observation and analysis unit as claimed in claim 11 , wherein the light beam comprises a laser beam.

13. The observation and analysis unit as claimed in claim 1 , further comprising an exchanger holding at least one microscope objective allocatable to the light-microscopical unit, the electron source, the X-ray detector or both the electron source and the X-ray detector.

14. The observation and analysis unit as claimed in claim 1 , wherein an area for visual observation of the sample with the light-microscopical unit and an area for analysis of the sample with the electron beam and the X-ray detector are located separately from one another.

15. The observation and analysis unit as claimed in claim 14 , wherein the X-ray detector is fitted in a revolving objective nosepiece.

16. The light microscope as claimed in claim 1 , wherein the X-ray detector is fitted in the revolving objective nosepiece.

17. A light microscope, comprising:

an electron beam source from which, in addition to or as an alternative to an illumination ray path coming from a light microscope objective, an electron beam is directed at a sample;

an X-ray detector which receives X-ray radiation generated by interaction of the electron beam with the sample;

an evaluation device that is operably coupled to the X-ray detector and spectrally analyzes the X-ray radiation;

a shielding that prevents propagation of the X-ray radiation that is hazardous to person, wherein the shielding encloses the electron beam source, the X-ray detector, and the sample;

a structure for feeding a non-air gas to a space between the sample and the electron beam source within the shielding; and

a revolving objective nosepiece, wherein the electron source is integrated into the revolving objective nosepiece;

wherein the sample is surrounded by a gas below or near atmospheric pressure, during analysis by application of the electron beam source and the X-ray detector.

Assignments (2)
CHANGE OF NAME Recorded Jun 18, 2013
From: CARL ZEISS MICROIMAGING GMBH
To: CARL ZEISS MICROSCOPY GMBH
Reel/Frame 030629/0113 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 14, 2012
From: EDELMANN, MARTIN; THOMAS, CHRISTIAN
To: CARL ZEISS MICROIMAGING GMBH
Reel/Frame 028205/0195 →
Priority Claims (1)
DE 10 2009 041 993 · Sep 18, 2009 · national
Continuity (1)
Related Publication 20120168623A1 · Jul 5, 2012