IP Library › Granted Patent US 9,276,195
Granted Patent B2
US 9,276,195 · App. 13/965,149 · Granted Mar 1, 2016

Magnetic random access memory

Inventors: Hiroyuki Kanaya (Seoul, KR); Kuniaki Sugiura (Seoul, KR)
H01L43/02H01L43/08H01L27/228
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Quick Facts
Patent No.
US 9,276,195
App. No.
13/965,149
Granted
Mar 1, 2016
Kind
B2
Abstract

According to one embodiment, a magnetic random access memory includes a magnetoresistive element, a contact arranged under the magnetoresistive element and connected to the magnetoresistive element, and an insulating film continuously formed from a periphery of the contact to a side surface of the magnetoresistive element and including a protective portion covering the side surface of the magnetoresistive element.

Claims (14)

1. A magnetic random access memory comprising:

a magnetoresistive element;

a contact portion arranged under the magnetoresistive element and connected to the magnetoresistive element;

a first insulating film formed at a periphery of the contact portion;

a second insulating film including a protective portion covering a side surface of the magnetoresistive element and including a material that is included in the first insulating film;

a third insulating film which contacts the first and second insulating films; and

a fourth insulating film which surrounds the side surface of the magnetoresistive element via the protective portion and the third insulating film.

2. The memory according to claim 1 , wherein the contact portion includes a contact and a lower electrode formed between the contact and the magnetoresistive element, and

wherein the lower electrode includes one of Ta, Zr, Hf, Al, and B.

3. The memory according to claim 1 , wherein the first insulating film includes one of an oxide and a nitride.

4. The memory according to claim 1 , wherein the first insulating film includes one of SiO2, SiN, SiON, AIN, and BN.

5. The memory according to claim 1 , wherein the third insulating film includes silicon nitride.

6. The memory according to claim 1 , the first and fourth insulating films include a same material.

7. The memory according to claim 6 , wherein the same material is silicon oxide.

Assignments (5)
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 055669/0401 →
MERGER Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: K.K. PANGEA
Reel/Frame 055659/0471 →
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 055669/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 24, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043709/0035 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 23, 2016
From: KANAYA, HIROYUKI; SUGIURA, KUNIAKI
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 037802/0081 →
Continuity (2)
Provisional Application 61804586 · Mar 22, 2013
Related Publication 20140284734A1 · Sep 25, 2014