Nitric oxide-generating skin dressings
A skin dressing is provided comprising a first component including a source of protons, a second component including a nitrite salt, the skin dressing further comprising a non-thiol reductant. The skin dressing is adapted, such that, when the first and second components are brought together and applied to a skin site the nitrite reacts to generate nitric oxide, increasing the pH of the dressing in contact with the skin site from an acidic value to a more neutral value.
1. A skin dressing comprising:
a first component including a source of protons comprising at least one weak acid selected from the group consisting of sorbic acid, acetic acid, and bicarbonic acid;
a second component including a nitrite salt; and
a non-thiol reductant selected from the group consisting of butylated hydroquinone, butylated hydroxyanisole, and butylated hydroxytoluene;
wherein the skin dressing is adapted such that, when the first and second components are brought together and applied to a skin site, the nitrite reacts to generate nitric oxide, increasing a pH of the skin dressing in contact with the skin site from an acidic value to a more neutral value; and
wherein the source of protons includes a buffer with a pK a of from 4.5 to 7.0.
2. The skin dressing of claim 1 , wherein the nitrite is the only component having a pK a of less than 4.5.
3. The skin dressing of claim 1 , wherein the nitrite is the only component having a pK a of from 1 to 4.
4. The skin dressing of claim 1 , wherein a pH of the first component is from 2 to 5.
5. The skin dressing of claim 1 , wherein, as the nitrite reacts to generate nitric oxide or a nitric oxide donor, the pH of the skin dressing in contact with the skin increases from below 5 to above 5.
6. The skin dressing of claim 1 , wherein a pH of the second component is from 5 to 12.
7. The skin dressing of claim 1 , wherein the first and the second components are amorphous.
8. The skin dressing of claim 1 , wherein the first component and/or the second component comprise a polymeric support.
9. The skin dressing of claim 8 , wherein the first component comprises a polymeric support based on polyacrylic acid.
10. A skin dressing comprising:
a first component including:
a) a non-thiol reductant selected from the group consisting of butylated hydroquinone, butylated hydroxyanisole, and butylated hydroxytoluene,
b) at least one weak acid selected from the group consisting of sorbic acid, acetic acid, and bicarbonic acid, and
c) a buffer with a pK a of from 4.5 to 7.0; and
a second component including a nitrite salt;
wherein the skin dressing is adapted, when the first component and the second component are brought together and applied to a skin site, to generate nitric oxide by reacting the nitrite, and to increase a pH of the skin dressing in contact with the skin site from an acidic value to a more neutral value.
11. The skin dressing of claim 10 , wherein the nitrite is the only component having a pK a of from 1 to 4.
12. The skin dressing of claim 10 , wherein a pH of the first component is from 2 to 5.
13. The skin dressing of claim 10 , wherein a pH of the second component is from 5 to 12.
14. The skin dressing of claim 10 , wherein the first and the second components are amorphous.
15. The skin dressing of claim 14 , wherein the first component comprises a polymeric support and the second component comprises a polymeric support.