Method and device for a spatially resolved introduction of an intensity pattern comprising electro-magnetic radiation into a photosensitive substance as well as applications thereof
A method for the spatially resolved introduction of an intensity pattern of electro-magnetic radiation by at least one optic display system into a photosensitive substance having properties which can be changed by photon exposure. These properties include a first, liquid and at least one second state, with the electro-magnetic radiation being conducted via the optic display system into the photosensitive substance and here being projected on predetermined spatial coordinates, in order to create at or in an area of these spatial coordinates a change of the properties of the substance. A surface of an objective lens of the optic display system, through which the electro-magnetic radiation 4 is emitted, is immersed in the liquid photosensitive substance 2 . A corresponding device is provided, and the device and method can be used for the creation of micro or nano-scaled structures.
1. A method for a spatially resolved insertion of an intensity pattern comprising electro-magnetic radiation via an optic display system in a photosensitive substance having properties that are modifiable by photon exposure, including a first liquid state and at least one second state, the method comprising:
dipping a surface ( 6 ) of a solid immersion objective lens of the optic display system ( 3 ), from which electro-magnetic radiation ( 4 ) is emitted, directly into contact with the liquid photosensitive substance;
conducting the electro-magnetic radiation ( 4 ) via the optic display system ( 3 ) into the photosensitive substance ( 2 ),
and projecting the intensity pattern ( 5 ) via the optic display system ( 3 ) on predetermined spatial coordinates on an image level ( 8 ) within the photosensitive substance in order to create at the predetermined spatial coordinates or in areas surrounding the predetermined spatial coordinates a change of the properties of the photosensitive substance.
2. The method according to claim 1 , wherein projection of the intensity pattern occurs by focusing the electro-magnetic radiation on the predetermined spatial coordinates.
3. The method according to claim 1 , wherein the liquid photosensitive substance ( 2 ) is spatially modified in at least one of a physical, thermal, or chemical manner by way of photon irradiation.
4. The method according to claim 1 , wherein the change of the properties of the photosensitive substance ( 2 ) is at least one of initiated or cancelled by a one-photon process or a multi-photon process.
5. The method according to claim 1 , wherein a three-dimensional structure is written into the photosensitive substance ( 2 ) with the intensity pattern of the electro-magnetic radiation ( 4 ).
6. The method according to claim 5 , wherein the three-dimensional structure is sequentially or simultaneously written with several patterns of intensities projected and using one or more optic display systems.
7. The method according to claim 1 , wherein the liquid photosensitive substance ( 2 ) is applied on a solid body used as a substrate ( 1 ) and then the surface of the solid immersion objective lens of the optic display system ( 3 ) is dipped into contact with the liquid photosensitive substance ( 2 ).
8. The method according to claim 7 , wherein a transparent, disk-shaped or plate-shaped solid body is used as the substrate ( 1 ) and the liquid photosensitive substance ( 2 ) is applied onto the substrate ( 1 ) on both surfaces.
9. The method according to claim 1 , wherein a laser is used as a source for the electro-magnetic radiation ( 4 ).
10. The method according to claim 9 , wherein the laser is a continuous wave laser or a pulsed laser in the electro-magnetic spectrum of UV, visible light, or near-infrared.
11. The method according to claim 1 , further comprising creating micro or nano-scaled structures.
12. The method according to claim 11 , wherein points or areas of the photosensitive substance ( 2 ) modified by photon exposure are subsequently released or removed by a selective development process.