Semiconductor light emitting device
There is provided a semiconductor light emitting device including a first conductivity-type semiconductor base layer and a plurality of light emitting nanostructures disposed to be spaced apart from one another on the first conductivity-type semiconductor base layer, each light emitting nanostructure including a first conductivity-type semiconductor core, an active layer, an electric charge blocking layer, and a second conductivity-type semiconductor layer, respectively, wherein the first conductivity-type semiconductor core has different first and second crystal planes in crystallographic directions.
1. A semiconductor light emitting device comprising:
a first conductivity-type semiconductor base layer; and
a plurality of light emitting nanostructures disposed spaced apart from one another on the first conductivity-type semiconductor base layer and including a first conductivity-type semiconductor core, an electric charge blocking layer, and a second conductivity-type semiconductor layer, respectively,
wherein the electric charge blocking layer has different thicknesses and impurity concentrations on first and second crystal planes of the first conductivity-type semiconductor core and includes an impurity having a first concentration, the second conductivity-type semiconductor layer includes the impurity having a second concentration, and the first concentration is half or less of the second concentration, wherein a thickness of the electric charge blocking layer is less than a thickness of the second conductivity-type semiconductor layer, and wherein the first conductivity-type semiconductor core is in direct contact with an active layer.
2. The semiconductor light emitting device of claim 1 , wherein the first concentration comprises an impurity concentration in a region of at least one of a first or a second crystal plane of the electric charge blocking layer.
3. The semiconductor light emitting device of claim 1 , wherein the electric charge blocking layer has an impurity concentration greater in a region on the first crystal planes than in a region on the second crystal planes.
4. The semiconductor light emitting device of claim 1 , wherein the electric charge blocking layer has a thickness ranging from approximately 20 nm to 50 nm on the first crystal planes.
5. The semiconductor light emitting device of claim 1 , wherein the electric charge blocking layer has a thickness greater on the first crystal planes than on the second crystal planes.
6. The semiconductor light emitting device of claim 1 , wherein the impurity comprises a p-type impurity.
7. The semiconductor light emitting device of claim 6 , wherein the impurity comprises magnesium (Mg).
8. The semiconductor light emitting device of claim 1 , wherein the electric charge blocking layer includes AlGaN or AlInGaN.
9. The semiconductor light emitting device of claim 1 , wherein the first crystal planes comprise non-polar planes, and the second crystal planes comprise polar planes or semi-polar planes.
10. The semiconductor light emitting device of claim 9 , wherein the first crystal planes comprise m planes and the second crystal planes comprise r planes.
11. The semiconductor light emitting device of claim 1 , wherein the plurality of light emitting nanostructures further include a transparent electrode layer positioned on the second conductivity-type semiconductor layer.
12. A semiconductor light emitting device comprising:
a first conductivity-type semiconductor base layer; and
a plurality of light emitting nanostructures disposed spaced apart from one another on the first conductivity-type semiconductor base layer and including a first conductivity-type semiconductor core, an active layer, an electric charge blocking layer, and a second conductivity-type semiconductor layer, respectively,
wherein the first conductivity-type semiconductor core has different first and second crystal planes in crystallographic directions, and
wherein the electric charge blocking layer has different thicknesses and impurity concentrations on the first and second crystal planes, and
a thickness of the electric charge blocking layer is less than a thickness of the second conductivity-type semiconductor layer.
13. The semiconductor light emitting device of claim 12 , wherein the electric charge blocking layer includes an impurity having a first concentration, the second conductivity-type semiconductor layer has the impurity having a second concentration, and the first concentration is half or less of the second concentration, and wherein the first conductivity-type semiconductor core is in direct contact with the active layer.
14. The semiconductor light emitting device of claim 13 , wherein the impurity comprises magnesium (Mg).