Planar diffractive optical element lens and method for producing same
A planar diffractive optical element (DOE) lens is described herein. The planar DOE lens includes a substrate. The planar DOE lens further includes a first layer, the first layer being formed upon the substrate. The planar DOE lens further includes a diffractive optical element, the diffractive optical element being formed upon the first layer. The planar DOE lens further includes a second layer, the second layer being formed upon the first layer. The second layer is also formed over the diffractive optical element. The second layer encloses the diffractive optical element between the first layer and the second layer. The second layer includes a planar surface.
1. An optical sensor, comprising:
an array of photodiodes;
a substrate disposed over the array of photodiodes;
a first layer, the first layer being formed upon the substrate;
a diffractive optical element, the diffractive optical element being formed upon the first layer; and
a second layer formed of a dielectric material, the second layer being formed directly upon the first layer, the second layer being formed over the diffractive optical element, the second layer including a planar surface,
wherein the second layer encloses the diffractive optical element between the first layer and the second layer, and wherein the first layer and the second layer include material with indexes of refraction selected to achieve an appropriate focus.
2. The optical sensor as claimed in claim 1 , wherein the substrate is light transmissive or light absorptive.
3. The optical sensor as claimed in claim 1 , wherein the substrate is a silicon wafer.
4. The optical sensor as claimed in claim 1 , wherein the substrate is formed of: quartz, sodium borosilicate glass, sapphire, or fuse silica.
5. The optical sensor as claimed in claim 1 , wherein the first layer is formed of a light transparent material.
6. The optical sensor as claimed in claim 1 , wherein the first layer is formed of an anti-reflective material.
7. The optical sensor as claimed in claim 1 , wherein the first layer is formed of a dielectric material.
8. The optical sensor as claimed in claim 1 , wherein the first layer is formed of titanium dioxide.
9. The optical sensor as claimed in claim 1 , wherein the second layer is formed of silicon dioxide.
10. The optical sensor as claimed in claim 1 , wherein the planar surface is an air interface surface.
11. An optical sensor, comprising:
an array of photodiodes;
a light transmissive substrate disposed over the array of photodiodes;
a first layer, the first layer being formed upon the substrate, the first layer being formed of a light transparent material;
a diffractive optical element, the diffractive optical element being formed upon the first layer; and
a second layer formed of a dielectric material, the second layer being formed directly upon the first layer, the second layer being formed over the diffractive optical element, the second layer including a planar surface, the planar surface being an air interface surface,
wherein the second layer encloses the diffractive optical element between the first layer and the second layer, and wherein the first layer and the second layer include materials with indexes of refraction selected to achieve an appropriate focus.
12. The optical sensor as claimed in claim 11 , wherein the substrate is a silicon wafer.
13. The optical sensor as claimed in claim 11 , wherein the first layer is formed of an anti-reflective material.
14. The optical sensor as claimed in claim 11 , wherein the first layer is formed of a dielectric material.
15. The optical sensor as claimed in claim 11 , wherein the first layer is formed of titanium dioxide.
16. A method for fabricating an optical sensor, the method comprising:
providing a substrate;
depositing a first layer on the substrate;
forming a diffractive optical element on the first layer;
depositing a second layer formed of a dielectric material on the first layer and over the diffractive optical element, the second layer being placed directly upon the first layer to enclose the diffractive optical element between the first layer and the second layer, the first layer and the second layer including materials with indexes of refraction selected to achieve an appropriate focus;
planarizing a surface of the second layer; and
disposing the substrate over an array of photodiodes.
17. The method as claimed in claim 16 , wherein forming the diffractive optical element on the first layer comprises:
forming a plurality of diffractive optical element layers on the first layer.
18. The method as claimed in claim 17 , wherein forming the diffractive optical element on the first layer further comprises:
masking the plurality of diffractive optical element layers with a photoresist.
19. The method as claimed in claim 18 , wherein forming the diffractive optical element on the first layer further comprises:
etching the plurality of diffractive optical element layers.