Multi-position batch load lock apparatus and systems and methods including same
Various embodiments of batch load lock apparatus are disclosed. The batch load lock apparatus includes a load lock body including first and second load lock openings, a lift assembly within the load lock body, the lift assembly including multiple wafer stations, each of the multiple wafer stations adapted to provide access to wafers through the first and second load lock openings, wherein the batch load lock apparatus includes temperature control capability (e.g., heating or cooling). Batch load lock apparatus is capable of transferring batches of wafers into and out of various processing chambers. Systems including the batch load lock apparatus and methods of operating the batch load lock apparatus are also provided, as are numerous other aspects.
1. A batch load lock apparatus, comprising:
load lock body forming a load lock chamber, the load lock body including first and second load lock openings;
a lift assembly adapted to move within the load lock chamber, the lift assembly comprising a base within the load lock body, and a support stack including a stack riser and multiple wafer stations provided at spaced vertical intervals along and attached to the stack riser, the support stack moveably coupled to the base, each of the multiple wafer stations adapted to provide access to wafers through the first and second load lock openings; and
a temperature control stack coupled to the base and including multiple temperature control platforms provided at spaced intervals on a distribution riser to provide wafer temperature control capability within the load lock chamber wherein the multiple wafer stations are moveable in unison relative to the base to move wafers in unison towards and away from the multiple temperature control platforms, wherein the multiple temperature control platforms include either 1) active heating capability, or 2) active cooling capability.
2. The batch load lock apparatus of claim 1 , wherein the lift assembly comprises:
a primary actuator operable to raise and lower the base.
3. The batch load lock apparatus of claim 1 , wherein a number of the wafer stations comprises three or more.
4. The batch load lock apparatus of claim 1 , wherein a number of the multiple wafer stations is greater than or equal to a number of processing chambers in a wafer processing system serviced by the batch load lock apparatus.
5. The batch load lock apparatus of claim 1 , wherein the batch load lock apparatus includes heating.
6. The batch load lock apparatus of claim 1 , wherein the batch load lock apparatus includes cooling.
7. The batch load lock apparatus of claim 1 , comprising the multiple wafer supports being configured to support a wafer on fingers thereof.
8. The batch load lock apparatus of claim 1 , comprising a secondary actuator coupled to the base and operable to provide motion of the support stack relative to the base.
9. A method of operating a load lock apparatus, comprising:
providing a batch load lock apparatus including a load lock body with first and second load lock openings, a lift assembly adapted to move within the load lock body, the lift assembly comprising a base within the load lock body, and a support stack within the load lock body including a stack riser and multiple wafer stations provided at spaced vertical intervals along and attached to the stack riser, the support stack moveably coupled to the base;
providing a temperature control stack coupled to the base and including multiple temperature control platforms provided at spaced intervals on a distribution riser, wherein the multiple temperature control platforms include either 1) active heating capability, or 2) active cooling capability;
moving the lift assembly;
receiving a batch of wafers at the multiple wafer stations within the lift assembly through one of the first and second load lock openings;
moving the multiple wafer stations in unison relative to the base to move the wafers in unison towards the multiple temperature control platforms; and
changing temperature of the wafers.
10. The method of claim 9 , wherein the changing temperature comprises active heating the wafers.
11. The method of claim 9 , wherein the changing temperature comprises active cooling the wafers.
12. The method of claim 9 , wherein the moving the lift assembly comprises moving the base with a primary actuator operable to raise and lower the base to align the multiple wafer stations with one of the first and second load lock openings.
13. The method of claim 9 , wherein the moving the lift assembly comprises:
moving the support stack to align each of the multiple wafers stations with one of the first and second load lock openings;
receiving the wafers in the support stack; and
bringing the wafers into thermal contact with temperature control platforms.
14. The method of claim 9 , comprising:
opening a first slit valve door;
moving a support stack of the lift assembly to align the multiple wafers stations with one of the first and second load lock openings;
loading the wafers into the support stack;
moving the support stack in unison relative to temperature control platforms to bring the wafers into thermal contact with the multiple temperature control platforms;
heating or cooling the wafers;
moving the support stack relative to the temperature control platforms to separate the wafers from the multiple temperature control platforms;
opening a second slit valve door; and
unloading the wafers.