Methods and materials for functional polyionic species and deposition thereof
The invention provides materials and methods for forming coatings on substrates. The coatings are durable and resistant to damage from environmental, chemical, thermal, and/or radiative sources. In some embodiments, the coatings comprise bilayers of electrostatically charged materials. The bilayers are created by alternately applying solutions comprising water-soluble, electrostatically charged materials. Durability is imparted to the coatings by the formation of crosslinks that are formed within and between layers after deposition of the coatings.
1. A method for coating a surface, the method comprising
(a) depositing a layer of a first material comprising first reversible bonding moieties and first crosslinkable moieties on the surface, said first crosslinkable moieties being selected from the group consisting of vinyl, alkenes, alkenes, acrylates, methacrylates, hydrolysable silanes or oligomers thereof, titanates, epoxy, alkoxides, metal alkoxy precursors, phosphonates, and combinations thereof; and
(b) depositing a layer of a second material comprising second reversible bonding moieties on the surface,
wherein the second reversible bonding moieties are complementary to the first reversible bonding moieties and are capable of forming a reversible chemical bond, and
wherein the first material and the second material form a bilayer; and
(c) optionally depositing one or more additional bilayers on the surface;
wherein said first material and said second material are bonded by one or more of:
(1) ionic attractive forces;
(2) hydrogen bonding attractive forces; and
(3) covalent bonding.
2. The method of claim 1 , wherein the first reversible bonding moieties are selected from ionic moieties, hydrogen-bonding moieties, ligand-substrate moieties, and antibody-antigen moieties, and wherein the first crosslinkable moieties are chemically attached to the first material.
3. The method of claim 1 , wherein the first material is water soluble and is deposited as part of a first deposition solution, and the second material is water soluble and is part of a second deposition solution.
4. The method of claim 1 , wherein the second material comprises second crosslinkable moieties, and wherein the method comprises crosslinking the first crosslinkable moieties, crosslinking the second crosslinkable moieties, or crosslinking both first and second crosslinking moieties.
5. The method of claim 1 , wherein the first material is a polymer comprising repeat units of formula (I) and repeat units of formula (II)
wherein, in formula (I) and formula (II):
n1 and n2 are independently integers;
R 1 and R 2 are independently selected from H and lower alkyl;
L 1 and L 2 are linker moieties independently selected from a bond or an alkylene, arylene, or alkenylene moiety, any of which may contain one or more heteroatoms and may be unsubstituted or substituted;
wherein each X 1 is one of said first reversible bonding moieties, and is an ionic moiety; and
wherein each Y 1 is one of said first crosslinkable moieties.
6. The method of claim 1 , wherein the first material is a silicon-containing oligomer.