System and method for data path handling, shot count minimization, and proximity effects correction related to mask writing process

1. A method comprising:

performing a striping of a decorated database in parallel using multiple graphic processors;

performing a first light path simulation for a first stripe for a mask using a first graphic processor;

while performing the first light path simulation, performing a second light path simulation for a second stripe for the mask using a second graphics processor;

using a result of the striping and first and second light path simulations, performing dose adjustment during a mask processing on a pixel of the mask; and

performing one of the following methods, selected from the group consisting of:

a) performing a first resist simulation for the first stripe using a third graphic processor, and

while performing the first resist simulation, performing a second resist simulation for the second stripe using a fourth graphics processor;

b) performing a first etch modeling simulation for the first stripe using the third graphic processor, and

while performing the first etch modeling simulation, performing a second etch modeling simulation for the second stripe using the fourth graphic processor; and

c) performing a first contour generation for the first stripe using the third graphic processor, and

while performing the first contour generation, performing a second contour generation for the second stripe using the fourth graphic processor.

2. A method comprising:

performing a striping of a decorated database in parallel using multiple graphic processors;

performing a first light path simulation for a first stripe for a mask using a first graphic processor;

while performing the first light path simulation, performing a second light path simulation for a second stripe for the mask using a second graphics processor; and

using a result of the striping and first and second light path simulations, performing dose adjustment during a mask processing on a pixel of the mask, wherein the performing a first light path simulation for a first stripe using a first graphic processor comprises:

computing a convolution using truncated Fourier coefficients-based Fast Fourier Transform.

3. The method of claim 2 wherein for a sigma of 20 microns, 25 or fewer Fast Fourier Transform coefficients are used.

4. A method comprising:

performing a striping of a decorated database in parallel using multiple graphic processors;

performing a first light path simulation for a first stripe for a mask using a first graphic processor;

while performing the first light path simulation, performing a second light path simulation for a second stripe for the mask using a second graphics processor; and

using a result of the striping and first and second light path simulations, performing dose adjustment during a mask processing on a pixel of the mask, wherein the performing dose adjustment during a mask processing on a pixel comprises:

representing a rectangle as an integer programming, where for every pixel p at least one rectangle which covers p has to be picked.

5. The method of claim 4 comprising:

computing the integer programming comprises:

rounding up only one fractional variable at a time;

adapting the programming to reflect the rounding; or

solving a modified linear program.

6. The method of claim 4 wherein each rectangle contains more than one selected pixel.