IP Library Granted Patent US 9,437,836
Granted Patent B2
US 9,437,836 · App. 14/155,026 · Granted Sep 6, 2016

Method for improving the reflectivity of aluminum in OLED structure

Inventors: Chenghsien Wang (Shanghai, CN); Chihhong Liu (Shanghai, CN)
Assignee: EVERDISPLAY OPTRONICS (SHANGHAI) LIMITED
H01L51/5218
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Quick Facts
Patent No.
US 9,437,836
App. No.
14/155,026
Granted
Sep 6, 2016
Kind
B2
Abstract

The present disclosure discloses a method for improving the reflectivity of aluminum in OLED structure. The OLED structure includes a top ITO layer, a middle reflective layer made by aluminum and a bottom ITO layer. The method comprises; forming a bottom ITO layer; coating the aluminous reflective layer on the surface of the bottom ITO layer and forming an aluminum oxide layer on the surface of the aluminous reflective layer uniformly by introducing plenty of oxygen gas simultaneously; adjusting the velocity of coating the aluminous reflective until the aluminum oxide layer is formed; and forming an top ITO layer on the surface of the aluminum oxide layer. The present disclosure can repair and cover the defects on the surface of the metal aluminum film and can reduce the concavities and hillocks on the surface of the metal aluminum film. Consequently, the reflectivity of aluminum in OLED structure is improved.

Claims (22)

1. A method for improving the reflectivity of aluminum in OLED structure, comprising:

(a) forming a bottom ITO layer;

(b) coating an aluminous reflective layer on a surface of the bottom ITO layer and forming an aluminum oxide layer on a surface of the aluminous reflective layer uniformly by introducing oxygen gas simultaneously; and

(c) forming a top ITO layer on a surface of the aluminum oxide layer;

wherein, the aluminum oxide layer has a thickness ranging from 5 nm to 50 nm.

2. The method as claimed in claim 1 , wherein coating velocity and refractive index of the aluminum oxide layer of the aluminum oxide layer are adjusted by adjusting power, temperature and flow velocity of the oxygen gas simultaneously.

3. The method as claimed in claim 2 , wherein the coating velocity of the aluminum oxide layer ranges from 5 Å/s to 10 Å/s.

4. The method as claimed in claim 2 , wherein the refractive index of the aluminum oxide layer ranges from 1.7 to 1.8.

5. The method as claimed in claim 4 , wherein thickness of the aluminous reflective layer is 2000 Å.

6. The method as claimed in claim 1 , wherein the coating velocity and refractive index of the aluminum oxide layer are adjusted by adjusting power and temperature simultaneously.

7. The method as claimed in claim 6 , wherein the coating velocity of the aluminum oxide layer ranges from 5 Å/s to 10 Å/s.

8. The method as claimed in claim 6 , wherein the refractive index of the aluminum oxide layer ranges from 1.7 to 1.8.

9. The method as claimed in claim 8 , wherein thickness of the aluminous reflective layer is 2000 Å.

10. The method as claimed in claim 1 , wherein the coating velocity and refractive index of the aluminum oxide layer are adjusted by adjusting power and flow velocity of the oxygen gas simultaneously.

11. The method as claimed in claim 10 , wherein the coating velocity of the aluminum oxide layer ranges from 5 Å/s to 10Å/s.

12. The method as claimed in claim 10 , wherein the refractive index of the aluminum oxide layer ranges from 1.7 to 1.8.

13. The method as claimed in claim 12 , wherein thickness of the aluminous reflective layer is 2000 Å.

14. The method as claimed in Claim 1 , wherein the coating velocity and refractive index of the aluminum oxide layer are adjusted by adjusting temperature and flow velocity of the oxygen gas simultaneously.

15. The method as claimed in claim 14 , wherein the coating velocity of the aluminum oxide layer ranges from 5 Å/s to 10 Å/s.

16. The method as claimed in claim 14 , wherein the refractive index of the aluminum oxide layer ranges from 1.7 to 1.8.

17. The method as claimed in claim 16 , wherein thickness of the aluminous reflective layer is 2000 Å.

18. The method as claimed in claim 1 , wherein sputter coating is adopted in the process of coating.

Assignments (2)
CHANGE OF NAME Recorded Aug 4, 2020
From: EVERDISPLAY OPTRONICS (SHANGHAI) LIMITED
To: EVERDISPLAY OPTRONICS (SHANGHAI) CO., LTD.
Reel/Frame 053395/0865 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 14, 2014
From: WANG, CHENGHSIEN; LIU, CHIHHONG
To: EVERDISPLAY OPTRONICS (SHANGHAI) LIMITED
Reel/Frame 031966/0573 →
Priority Claims (1)
CN 2013 1 0103197 · Mar 27, 2013 · national
Continuity (1)
Related Publication 20140295596A1 · Oct 2, 2014