Spin treatment apparatus
A spin treatment apparatus according to an embodiment performs a treatment while rotating a substrate and includes: at least three clamp pins configured to contact an outer peripheral surface of the substrate and clamp the substrate; rotatable pin rotators provided for the respective clamp pins and each configured to retain the corresponding clamp pin at a position offset from a rotation axis of the pin rotator parallel with a rotation axis of the substrate; magnet gears provided for the respective pin rotators around outer peripheral surfaces thereof and each having a magnetic-pole part formed spirally about the rotation axis of the pin rotator; rotation magnets provided for the respective magnet gears and positioned to attract and be attracted by the magnetic-pole part of the corresponding magnet gear; and a movement mechanism configured to move the rotation magnets along the rotation axes of the pin rotators.
1. A spin treatment apparatus that performs a treatment while rotating a substrate, the spin treatment apparatus comprising:
at least three clamp pins configured to come into contact with an outer peripheral surface of the substrate and clamp the substrate;
a plurality of rotatable pin rotators provided for respective clamp pins and each configured to retain a corresponding clamp pin at a position offset from a rotation axis of the pin rotator which is parallel with a rotation axis of the substrate;
a plurality of magnet gears provided for respective pin rotators around outer peripheral surfaces thereof and each having a magnetic-pole part formed spirally along the rotation axis of the pin rotator;
a plurality of rotation magnets provided for respective magnet gears and positioned so as to attract and be attracted by the magnetic-pole part of a corresponding magnet gear; and
a movement mechanism configured to move the plurality of rotation magnets in a direction of the rotation axes of the pin rotators.
2. The spin treatment apparatus according to claim 1 , wherein
the movement mechanism includes
a retainer configured to retain the plurality of rotation magnets and to move in the direction of the rotation axes of the pin rotators, and
an up-and-down mechanism configured to move the retainer in the direction of the rotation axes of the pin rotators.
3. The spin treatment apparatus according to claim 2 , wherein
the movement mechanism positions and stops the retainer.
4. The spin treatment apparatus according to claim 3 , wherein
six clamp pins are provided as the clamp pins, and alternate three of the six clamp pins in a peripheral direction of the substrate form one set,
the plurality of rotation magnets are provided in groups for the respective sets of the clamp pins, and
the movement mechanism moves the plurality of rotation magnets for the sets of the clamp pins on a set-by-set basis in the direction of the rotation axes of the pin rotators.
5. The spin treatment apparatus according to claim 4 , wherein
during treatment of the substrate, the movement mechanism moves the plurality of rotation magnets for the sets of clamp pins alternately on the set-by-set basis in the direction of the rotation axes of the pin rotators.
6. The spin treatment apparatus according to claim 2 , wherein
six clamp pins are provided as the clamp pins, and alternate three of the six clamp pins in a peripheral direction of the substrate form one set,
the plurality of rotation magnets are provided in groups for the respective sets of the clamp pins, and
the movement mechanism moves the plurality of rotation magnets for the sets of the clamp pins on a set-by-set basis in the direction of the rotation axes of the pin rotators.
7. The spin treatment apparatus according to claim 6 , wherein
during treatment of the substrate, the movement mechanism moves the plurality of rotation magnets for the sets of clamp pins alternately on the set-by-set basis in the direction of the rotation axes of the pin rotators.
8. The spin treatment apparatus according to claim 1 , wherein
six clamp pins are provided as the clamp pins, and alternate three of the six clamp pins in a peripheral direction of the substrate form one set,
the plurality of rotation magnets are provided in groups for the respective sets of the clamp pins, and
the movement mechanism moves the plurality of rotation magnets for the sets of the clamp pins on a set-by-set basis in the direction of the rotation axes of the pin rotators.
9. The spin treatment apparatus according to claim 8 , wherein
during treatment of the substrate, the movement mechanism moves the plurality of rotation magnets for the sets of clamp pins alternately on the set-by-set basis in the direction of the rotation axes of the pin rotators.