IP Library › Granted Patent US 9,472,545
Granted Patent B2
US 9,472,545 · App. 14/169,621 · Granted Oct 18, 2016

Semiconductor arrangement with electrostatic discharge (ESD) protection

Inventors: Chia-Hui Chen (Hsinchu, TW); Wei Yu Ma (Taitung, TW); Kuo-Ji Chen (Wu-Ku, TW)
Assignee: Taiwan Semiconductor Manufacturing Company Limited
H01L27/0629H01L23/5226H01L23/60H01L25/0657H01L27/0251H01L27/0688H01L27/092H01L23/481H01L2225/06541H01L2924/0002
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Quick Facts
Patent No.
US 9,472,545
App. No.
14/169,621
Granted
Oct 18, 2016
Kind
B2
Abstract

One or more semiconductor arrangements having a stacked configuration and electrostatic discharge (ESD) protection are provided. The semiconductor arrangements include a first substrate, a second substrate, an ESD pad, an ESD device and a first interlayer via connecting the first substrate and the second substrate. The first substrate includes a first PMOS device and a first device and the second substrate includes a first NMOS device and a second device. Alternatively, the first substrate includes a first PMOS device and a first NMOS device and the second substrate includes a first device and a second device.

Claims (49)

1. A semiconductor arrangement comprising:

a first substrate comprising:

a first PMOS device comprising a first source/drain region coupled to a first power supply supplying a first voltage; and

a first NMOS device comprising a first source/drain region coupled to a second power supply supplying a second voltage different than the first voltage;

a second substrate comprising:

a first device coupled to a second source/drain region of the first PMOS device; and

a second device coupled to a second source/drain region of the first NMOS device;

an electrostatic discharge (ESD) pad coupled between the first device and the second device, wherein there is no current path between the ESD pad and a gate of the first PMOS device or a gate of the first NMOS device; and

a first interlayer via coupling the first substrate and the second substrate.

2. The semiconductor arrangement of claim 1 , wherein the first interlayer via couples the first PMOS device to the first device.

3. The semiconductor arrangement of claim 1 , wherein at least one of the first device or the second device is at least one of a second PMOS device, a second NMOS device, a first resistor or a second resistor.

4. The semiconductor arrangement of claim 1 , wherein the first device is a second PMOS device and the second device is a second NMOS device.

5. The semiconductor arrangement of claim 1 , wherein the first device is a first resistor and the second device is a second resistor.

6. The semiconductor arrangement of claim 1 , the first power supply corresponding to a positive voltage power supply and the second power supply corresponding to at least one of a negative voltage power supply or ground.

7. The semiconductor arrangement of claim 1 , comprising:

an ESD device coupled to the ESD pad.

8. The semiconductor arrangement of claim 1 , wherein the first substrate and the second substrate are in a stacked configuration.

9. A semiconductor arrangement comprising:

a first substrate comprising:

a first PMOS device comprising a first source/drain region coupled to a first power supply supplying a first voltage; and

a first device coupled to a second source/drain region of the first PMOS device;

a second substrate comprising:

a first NMOS device comprising a first source/drain region coupled to a second power supply supplying a second voltage different than the first voltage; and

a second device coupled to a second source/drain region of the first NMOS device;

an electrostatic discharge (ESD) pad coupled between the first device and the second device, wherein there is no current path between the ESD pad and a gate of the first PMOS device or a gate of the first NMOS device; and

a first interlayer via coupling the first substrate and the second substrate.

10. The semiconductor arrangement of claim 9 , wherein the first interlayer via couples the first device to the second device.

11. The semiconductor arrangement of claim 9 , wherein at least one of the first device or the second device is at least one of a second PMOS device, a second NMOS device, a first resistor or a second resistor.

12. The semiconductor arrangement of claim 9 , wherein the first device is a second PMOS device and the second device is a second NMOS device.

13. The semiconductor arrangement of claim 9 , wherein the first device is a first resistor and the second device is a second resistor.

14. The semiconductor arrangement of claim 9 , the first power supply corresponding to a positive voltage power supply and the second power supply corresponding to at least one of a negative voltage power supply or ground.

15. The semiconductor arrangement of claim 9 , comprising:

an ESD device coupled to the ESD pad.

16. The semiconductor arrangement of claim 9 , wherein the first substrate and the second substrate are in a stacked configuration.

17. A semiconductor arrangement comprising:

a first substrate comprising:

a first PMOS device, comprising:

a first source/drain region coupled to a first power supply supplying a first voltage; and

a second source/drain region; and

a first NMOS device, comprising:

a first source/drain region coupled to a second power supply supplying a second voltage different than the first voltage; and

a second source/drain region;

a second substrate comprising:

a first resistor having a first terminal coupled to the second source/drain region of the first PMOS device; and

a second resistor having a first terminal coupled to the second source/drain region of the first NMOS device; and

an electrostatic discharge (ESD) pad coupled to a second terminal of the first resistor and a second terminal of the second resistor.

18. The semiconductor arrangement of claim 17 , wherein there is no current path between the ESD pad and a gate of the first PMOS device or a gate of the first NMOS device.

19. The semiconductor arrangement of claim 17 , wherein there is no current path between the ESD pad and a gate of the first PMOS device and there is no current path between the ESD pad and a gate of the first NMOS device.

20. The semiconductor arrangement of claim 17 , wherein the first substrate and the second substrate are in a stacked configuration.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 6, 2015
From: CHEN, CHIA-HUI; MA, WEI YU; CHEN, KUO-JI
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED
Reel/Frame 034640/0092 →
Continuity (1)
Related Publication 20150221636A1 · Aug 6, 2015