IP Library Granted Patent US 9,472,787
Granted Patent B2
US 9,472,787 · App. 14/117,436 · Granted Oct 18, 2016

Fabrication apparatus for fabricating a patterned layer

Inventors: Christoph Rickers (Aachen, DE); Pieter Gijsbertus Maria Kruijt (Eindhoven, NL)
Assignee: OLEDWorks GmbH
H01L51/56H01L21/02104H01L51/0023H01L51/50
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Quick Facts
Patent No.
US 9,472,787
App. No.
14/117,436
Granted
Oct 18, 2016
Kind
B2
Abstract

The invention relates to a fabrication apparatus for fabricating a patterned layer ( 18 ) on a substrate ( 14 ). Protective material ( 17 ) is applied in second regions on the substrate ( 14 ) and liquid layer material ( 18 ) is then printed in first regions being different to the second regions on the substrate ( 14 ). The layer material ( 18 ) is dried by heating the layer material ( 18 ) to a drying temperature being smaller than a melting temperature of the protective material ( 17 ), before removing the protective material ( 17 ) from the substrate ( 14 ) by using a removing temperature being larger than the melting temperature of the protective material ( 17 ). A patterned layer ( 18 ) can therefore be produced, without using, for example, a costly photolithography process, and because of the use of the protective material ( 17 ) the layer material ( 18 ) is present in the desired first regions only and not in the second regions. This improves the quality of the patterned layer, which may be used for producing an OLED.

Claims (12)

1. A fabrication method for fabricating a patterned layer on a substrate that is coated with a conductive layer, wherein the substrate comprises first regions, in which layer material forming the layer is to be applied, and second regions, in which the layer material is not to be applied, the fabrication method comprising:

applying protective material in the second regions on the substrate,

printing liquid layer material in the first regions on the substrate,

drying the layer material by heating the layer material to a drying temperature being smaller than a melting temperature of the protective material ,

ablating the conductive layer through at least one of the protective material and the applied layer material for generating a patterned conductive layer, and

removing the protective material from the substrate by using a removing temperature being larger than the melting temperature of the protective material.

2. The fabrication method according to claim 1 , wherein the protective material is applied by printing.

3. The fabrication method according to claim 1 , wherein the protective material is wax.

4. The fabrication method according to claim 1 , wherein the layer material is metal.

5. The fabrication method according to claim 1 , wherein the protective material is removed using heated water.

6. The fabrication method according to claim 1 , further comprising the step of sintering the layer material.

7. The fabrication method according to claim 1 , further comprising the step of applying insulating material on the layer material after the protective material has been removed.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 25, 2016
From: KONINKLIJKE PHILIPS ELECTRONICS N V
To: OLEDWORKS GMBH
Reel/Frame 037573/0303 →
CORRECTIVE ASSIGNMENT TO CORRECT THE SECOND INVENTOR'S NAME PREVIOUSLY RECORDED AT REEL: 031592 FRAME: 0157. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Jun 11, 2014
From: KRUIJT, PIETER GIJSBERTUS MARIA
To: KONINKLIJKE PHILIPS ELECTRONICS N V
Reel/Frame 033134/0091 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 13, 2013
From: RICKERS, CHRISTOPH; KRUIJT, PIEFER GIJSBERTUS MARIA
To: KONINKLIJKE PHILIPS ELECTRONICS N V
Reel/Frame 031592/0157 →
Priority Claims (1)
EP 11167070 · May 23, 2011 · regional
Continuity (1)
Related Publication 20140203250A1 · Jul 24, 2014